Results 291 to 300 of about 345,165 (330)
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MRS Proceedings, 1998
AbstractAn existing test system for recording the stress-strain curves of metal microspecimens has been used to measure the strength of the ultrathick photoresist SU-8. The microspecimens are 3 mm long with a gage section 0.2 mm wide. The SU-8-25 specimens were 0.08 mm thick with an average strength of nearly 120 MPa, and the SU-8-50 specimens were 0 ...
A. Mcaleavey +3 more
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AbstractAn existing test system for recording the stress-strain curves of metal microspecimens has been used to measure the strength of the ultrathick photoresist SU-8. The microspecimens are 3 mm long with a gage section 0.2 mm wide. The SU-8-25 specimens were 0.08 mm thick with an average strength of nearly 120 MPa, and the SU-8-50 specimens were 0 ...
A. Mcaleavey +3 more
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Microphotonic systems utilizing SU-8
SPIE Proceedings, 2004SU-8 is a negative-tone photoresist that can serve as a complete optical bench for micro-photonic systems. Functional optical devices and passive alignment structures can all be formed in the same material system with common processing steps. Many interrelated process parameters control the final geometry of structures formed in SU-8, but all can be ...
Rumpf, Raymond C., Johnson, Eric G.
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Highly Flexible SU-8 Microstructures
TRANSDUCERS 2007 - 2007 International Solid-State Sensors, Actuators and Microsystems Conference, 2007This paper outlines the testing of SU-8 structures subjected to high deformations in bending. Six 'dog-bone' test structures were fabricated with flexible sections comprising of variations of 25 mum thick beams, and tested using a novel method to bend the structures through very small radii.
J. P. F. Spratley +2 more
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SU-8 cantilever chip interconnection
Journal of Micromechanics and Microengineering, 2006The polymer SU-8 is becoming widely used for all kinds of micromechanical and microfluidic devices, not only as a photoresist but also as the constitutional material of the devices. Many of these polymeric devices need to include a microfluidic system as well as electrical connection from the electrodes on the SU-8 chip to a printed circuit board. Here,
A Johansson +5 more
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Diffusion of water into SU-8 microcantilevers
Physical Chemistry Chemical Physics, 2010We present a method to monitor the diffusion of liquid molecules in polymers. A microdrop of water is deposited by a piezoelectric drop generator onto the upper surface of a cantilever made of SU-8 based photoresist. In response, the cantilever bends in the opposite direction.
Liu, C. +8 more
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SU-8 for Microsystem Fabrication
2014SU-8 is a negative-tone photoresist that can be used to fabricate thick, high aspect ratio structures. The thickness of SU-8 structures ranges from several micrometers to several hundred micrometers or up to millimeters by direct spin coating or stacking of multiple layers of dry films.
Yi Chiu, Yu-Ting Cheng
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Su-8-based nanocomposites for acoustical matching layer
IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control, 2009SU-8, an epoxy-based photoresist, was introduced as the acoustical matching layer between silicon and water for lab-on-chip applications integrating acoustic characterization. Acoustical performances, including the acoustic longitudinal wave velocity and attenuation of the SU-8-based matching layer, were characterized at a frequency of 1 GHz at room ...
Wang, S. +8 more
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Physical Review D, 1978
We demonstrate that the mass relations among 1/2/sup +/ baryons predicted in quark models can be obtained in SU(8) symmetry, by adding higher-order effects or by including spin-triplet mass breaking. The masses of 3/2/sup +/ isobars are also discussed.
Ramesh C. Verma, M. P. Khanna
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We demonstrate that the mass relations among 1/2/sup +/ baryons predicted in quark models can be obtained in SU(8) symmetry, by adding higher-order effects or by including spin-triplet mass breaking. The masses of 3/2/sup +/ isobars are also discussed.
Ramesh C. Verma, M. P. Khanna
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Thick SU-8 photolithography for BioMEMS
SPIE Proceedings, 2003SU-8, negative-tone epoxy base, photoresist has a great potential for ultra-thick high aspect ratio structures in low cost micro-fabrication technologies. Commercial formulation of NanoTM SU-8 2075 is investigate, process limitations are discuss. Good layer uniformity (few %) for single layer up to 200 μm could be obtained in a covered RC8 (Suss ...
Marc Rabarot +5 more
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SU-8 inkjet patterning for microfabrication
Polymer, 2019Abstract Controlled SU-8 inkjet printing constitutes an attractive approach to realize electronic microstructures, MEMS, microfluidic devices or transducers. Indeed, inkjet printing is the most promising low-cost manufacturing process capable of depositing functional materials with high resolution, making this technique attractive for micrometric ...
Bernasconi R. +4 more
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