Results 211 to 220 of about 201,561 (339)

Tailor‐Made Protective LixAlSy Layer for Lithium Anodes to Enhance the Stability of Solid‐State Lithium–Sulfur Batteries

open access: yesAdvanced Materials Interfaces, EarlyView.
An intentionally added, chemically formed LixAlSy coating stabilizes the lithium–electrolyte interface in solid‐state Li–S batteries. The layer suppresses side reactions, preserves smooth charge transfer, and improves ion transport from the start. This approach offers a practical route to more durable solid‐state batteries and a clearer understanding ...
Xinyi Wang   +4 more
wiley   +1 more source

Self‐Assembled Cobalt Oxide Nanobeads on the Conducting Van der Waals Semi‐Metal PtTe2 for Catalytic Heterostructure

open access: yesAdvanced Materials Interfaces, EarlyView.
Self‐assembled CoO nanobeads on the Van der Waals surface of PtTe2 were synthesized through simple thermal annealing utilizing the residual oxygen in the annealing chamber. In this study, the electrocatalytic effect for oxygen evolution reaction from CoO nanobeads on conducting PtTe2 was confirmed, elucidating the new pathway to design a ...
Minhyuk Choi   +9 more
wiley   +1 more source

Label‐Free Sensing of Coronaviral Sequences via Kretschmann‐Configuration Reflectance Spectroscopic Ellipsometry: Sensitivity, Specificity, and Interfacial Effects

open access: yesAdvanced Materials Interfaces, EarlyView.
Spectroscopic ellipsometry in the Kretschmann‐Raether configuration (KRSE) is employed to characterize a DNA‐functionalized platform for viral sequence recognition. By merging SE with surface plasmon resonance, KRSE outperforms conventional SE, achieving nanomolar targeting through resonance wavelength shifts (δλ) measurements. Its enhanced interfacial
Silvia Maria Cristina Rotondi   +4 more
wiley   +1 more source

Atomic Layer Deposition of Highly Conducting NiS2 Thin Films from Elemental Sulfur

open access: yesAdvanced Materials Interfaces, EarlyView.
A simple new atomic layer deposition (ALD) process yields in‐situ crystalline and electrically conducting nickel disulfide thin films. This deposition process is based on two solid and safe precursors, nickel acetylacetonate and elemental sulfur. ABSTRACT A novel atomic layer deposition (ALD) process for highly conducting nickel disulfide thin films is
Juha Linjala   +5 more
wiley   +1 more source

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