Results 211 to 220 of about 201,561 (339)
Formic acid-sulfide synergistic aging kinetics and nanometer titanium dioxide modification mechanism in oil-immersed transformer insulation system. [PDF]
Gao Y +5 more
europepmc +1 more source
An intentionally added, chemically formed LixAlSy coating stabilizes the lithium–electrolyte interface in solid‐state Li–S batteries. The layer suppresses side reactions, preserves smooth charge transfer, and improves ion transport from the start. This approach offers a practical route to more durable solid‐state batteries and a clearer understanding ...
Xinyi Wang +4 more
wiley +1 more source
Self‐assembled CoO nanobeads on the Van der Waals surface of PtTe2 were synthesized through simple thermal annealing utilizing the residual oxygen in the annealing chamber. In this study, the electrocatalytic effect for oxygen evolution reaction from CoO nanobeads on conducting PtTe2 was confirmed, elucidating the new pathway to design a ...
Minhyuk Choi +9 more
wiley +1 more source
Palladium nanoparticles stabilized on the BPA-functionalized Fe<sub>3</sub>O<sub>4</sub> as the recoverable catalysts for synthesis of aromatic sulfide by C-S coupling reactions. [PDF]
Asiri M +9 more
europepmc +1 more source
Spectroscopic ellipsometry in the Kretschmann‐Raether configuration (KRSE) is employed to characterize a DNA‐functionalized platform for viral sequence recognition. By merging SE with surface plasmon resonance, KRSE outperforms conventional SE, achieving nanomolar targeting through resonance wavelength shifts (δλ) measurements. Its enhanced interfacial
Silvia Maria Cristina Rotondi +4 more
wiley +1 more source
Thiofunctionalization of Silyl Enol Ether: An Efficient Approach for the Synthesis of <i>β</i>-Keto Sulfides. [PDF]
Zhao X, Ye H, Fu Y, Liu H, Bi X.
europepmc +1 more source
Atomic Layer Deposition of Highly Conducting NiS2 Thin Films from Elemental Sulfur
A simple new atomic layer deposition (ALD) process yields in‐situ crystalline and electrically conducting nickel disulfide thin films. This deposition process is based on two solid and safe precursors, nickel acetylacetonate and elemental sulfur. ABSTRACT A novel atomic layer deposition (ALD) process for highly conducting nickel disulfide thin films is
Juha Linjala +5 more
wiley +1 more source
Direct Activation of Sulfides by C-H Oxidation with Photoexcited Nitroarenes: Formal Manipulations of the C─S Bond. [PDF]
Cuomo VD, Romano C, Procter DJ.
europepmc +1 more source

