Results 221 to 230 of about 4,243 (267)

Sintering of highly dispersed titanium diboride and composite titanium diboride-calcium hexaboride powders

Powder Metallurgy and Metal Ceramics, 1997
The sintering behavior in vacuum of ultrafine nonmilled titanium boride powder and a composite of the latter with CaB6 was investigated. It was shown that such titanium boride powders and TiB2−CaB6 composites poses better sinterability than conventional powders; the temperature of rapid densification was approximately 200°C lower.
T. I. Serebryakova, E. N. Martynenko
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Mechanosynthesis of Nanodispersed Titanium Diboride

Powder Metallurgy and Metal Ceramics, 2015
Structural and morphological changes of titanium during intensive milling of titanium and boron powder mixtures in an AIR-015M planetary-ball mill are investigated. It is shown that the structural transformations in titanium lead to the formation of cluster precipitates (like Guinier–Preston zones) of titanium and boron atoms that are regularly ...
M. P. Saviak, A. B. Mel’nik, Yu. M. Solonin, A. V. Kotko, I. I. Timofeeva, I. V. Uvarova   +5 more
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Vacuum sintering of titanium diboride

Soviet Powder Metallurgy and Metal Ceramics, 1970
The results obtained lead to the conclusion that, at low temperatures (up to 1100°C), the increase of contact surfaces between the titanium diboride particles is linked with surface diffusion processes. At temperatures in excess of 1800°C, the evaporation and condensation mechanism contributed appreciably toward mass transfer.
P. S. Kislyi, O. V. Zaverukha
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Microwave sintering of titanium diboride

Journal of Materials Science, 1991
Using a 2.45 GHz, 6 kW microwave furnace adapted for inert gas sintering, titanium diboride (TiB2) can be rapidly microwave-sintered to >90% of theoretical density with sintering temperatures of 1900 to 2100 °C and soak times of 30 min or less. Densification behaviour with low-level additives was evaluated; 3 wt% chromium diboride (CrB2) was an ...
C. E. Holcombe, N. L. Dykes
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Preparation of titanium diboride nanopowder

Inorganic Materials, 2010
We have studied the reaction between NaBH4 and TiCl4 at elevated temperatures in the range 570–1020 K and pressures of up to 10 MPa, with no solvent. The results indicate that nanoparticulate titanium diboride forms at temperatures above 820 K. According to electron microscopy data, the titanium diboride powder obtained at 1020 K consists of spherical ...
S. E. Kravchenko, V. I. Torbov, S. P. Shilkin   +2 more
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Titanium diboride copper-matrix composites

Journal of Materials Science, 1997
Copper-matrix titanium diboride platelet (3–5 μm) composites containing 15–60 vol% TiB2, were fabricated by powder metallurgy, using copper-coated TiB2 (60 vol% TiB2) and various amounts of copper powder. The porosity was ≤0.5% when TiB2 was ≤48 vol%. Above 48 vol% TiB2, the porosity increased abruptly with increasing TiB2 content, reaching 6.7% at 60 ...
P YIH, D. D. L CHUNG
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Microstructural characterization of titanium diboride

Materials Characterization, 1993
A wide range of microstructural and microanalytical techniques has been used to follow the effects of heat treatment on a commercial sample of titanium diboride. The effects of the interplay of grain size with microchemical changes, the initial distribution of pores, and the microcracks that develop on heat treatment are demonstrated.
Kwang Bo Shim, Jerzy Kwiencinski, Mohan J. Edirisinghe, Brian Ralph   +3 more
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Pyrolytic Synthesis of Titanium Diboride

Journal of the American Ceramic Society, 1963
Titanium diboride was synthesized by the vaporphase reaction of the chlorides of titanium and boron on a heated substrate. Under certain described conditions, the resulting deposit was found to have a preferred atomic arrangement which could be described as alternating layers of titanium and boron atoms perpendicular to the plane of deposition.
R. E. GANNON, R. C. FOLWEILER, T. VASILOS   +2 more
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MORPHOLOGY OF CHEMICAL VAPOR DEPOSITED TITANIUM DIBORIDE

Journal of Crystal Growth, 1975
Titanium diboride has been chemical vapor deposited from TiCl4, BCl3, and H3 gases on a heated graphite substrate. The morphologies of the deposits were correlated with the deposition parameters of substrate temperature, total pressure, B: Ti atomic ratio, Cl: H atomic ratio, and total flow rate.
T.M. Besmann, K.E. Spear
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Reactive sputtering of titanium diboride and titanium disilicide

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1997
Nanocomposite films of titanium nitride in either boron nitride or silicon nitride matrices were prepared by reactive sputtering of titanium diboride or titanium disilicide targets in a nitrogen plasma. These films were expected to have high dielectric constants and in the case of the silicon nitride matrix high hardness.
L. Maya, C. E. Vallet, J. N. Fiedor
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