Results 251 to 260 of about 53,343 (301)
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Metal Science and Heat Treatment, 1973
Nitriding at pressures from 300 to 10−2 mm Hg with the nitrogen inflow cut off and holding at low pressure is the best method of obtaining a case of substantial depth, with satisfactory mechanical properties of the base metal.
V. I. Murav'ev, A. A. Govorov
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Nitriding at pressures from 300 to 10−2 mm Hg with the nitrogen inflow cut off and holding at low pressure is the best method of obtaining a case of substantial depth, with satisfactory mechanical properties of the base metal.
V. I. Murav'ev, A. A. Govorov
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Surface Science Spectra, 1998
Titanium nitride (TiN) coatings have been deposited on polished steel substrates by a plasma-beam sputtering technique in a Sputron apparatus (Balzers A. G.) at 200 °C. A thin intermediate layer of Ti (0.08 μm) was deposited between the substrate and the 2.8 μm thick TiN coating.
Ingrid Milošev +3 more
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Titanium nitride (TiN) coatings have been deposited on polished steel substrates by a plasma-beam sputtering technique in a Sputron apparatus (Balzers A. G.) at 200 °C. A thin intermediate layer of Ti (0.08 μm) was deposited between the substrate and the 2.8 μm thick TiN coating.
Ingrid Milošev +3 more
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1952
Abstract : Several compositions of cermets based on titanium nitride were investigated. The cermets were tested for strength in cross bending, resistance to oxidation, and resistance to thermal shock. The differences of the various compositions are noted as well as the effect of different processing techniques.
G. Edwin Lorey +2 more
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Abstract : Several compositions of cermets based on titanium nitride were investigated. The cermets were tested for strength in cross bending, resistance to oxidation, and resistance to thermal shock. The differences of the various compositions are noted as well as the effect of different processing techniques.
G. Edwin Lorey +2 more
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Titanium Nitride PVD Coating Technology
Surface Engineering, 1985The latest techniques to become widely available commercially to design engineers and others who specify surface coatings are those for ionization assisted physical vapour deposition; titanium nitride being the main coating material at this time. The background to this new technology is outlined and information is provided about the main commercial ...
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Defect and Diffusion Forum, 2011
Gas nitriding of a commercial purity Grade 4 titanium at 1120°C for 5 h formed hard TiN layer (2450 HV) on the surface with a thickness of about 35 m. When compared to the as-received state, nitrided titanium exhibited excellent wear resistance along with a relatively low coefficient of friction (CoF) against Al2O3 ball under dry sliding conditions.
Fared Seahjani, H. Çimenoğlu
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Gas nitriding of a commercial purity Grade 4 titanium at 1120°C for 5 h formed hard TiN layer (2450 HV) on the surface with a thickness of about 35 m. When compared to the as-received state, nitrided titanium exhibited excellent wear resistance along with a relatively low coefficient of friction (CoF) against Al2O3 ball under dry sliding conditions.
Fared Seahjani, H. Çimenoğlu
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Titanium amide molecular precursors for titanium nitride
Polyhedron, 1994Abstract The reaction of titanium tetrachloride in toluene at −78°C with 2 equivalents of N,N′,N″-trimethylethylenediamine yields a monomeric titanium tetrachloride adduct, [TiCl4(Me2NCH2CH2MNeH)] (1). The complex [TiCl2(Me2NCH2CH2NMeH)2] (2) is prepared by the reaction of titanium tetrachloride with 4 equivalents of N,N′,N″-trimethylethylenediamine ...
Simon R. Drake +3 more
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Corrosion Behavior of Coatings of Titanium Nitride and Titanium-Titanium Nitride on Steel Substrates
Corrosion, 2006It is well known that titanium nitride (TiN) coatings produced by physical vapor deposition (PVD) have a limited corrosion resistance, as a result of their intrinsic porosity. Some attempts have been made to improve corrosion resistance, by such measures as increasing film thickness.
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Synthesis of Nanocrystalline Titanium Nitride Powders by Direct Nitridation of Titanium Oxide
Journal of the American Ceramic Society, 2001Nanocrystalline TiN powder has been synthesized by the direct nitridation of nanocrystalline TiO 2 powder. Powder XRD patterns indicated that the TiN nanocrystalline powder could be obtained by nitridation at 800°C for 5 h.
Jingguo Li +5 more
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Titanium Nitride Process Development
1992Titanium nitride was reactively sputtered on silicon, silicon dioxide and sapphire wafers. Taguchi-method was used for the experimental design. TiN- and TiN/Al-films were patterned and etched in reactive ion etcher. Electrical and structural measurements of these TiN-films will be reported.
J. M. Molarius, M. Orpana
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Mononuclear and Terminally Bound Titanium Nitrides
Journal of the American Chemical Society, 2015The Ti(III) azido complex (PN)2Ti(N3) (PN(-) = (N-(2-(diisopropylphosphino)-4-methylphenyl)-2,4,6-trimethylanilide), can be reduced with KC8 to afford the nitride salt [μ2-K(OEt2)]2[(PN)2Ti≡N]2 in excellent yield. While treatment of the dimer with 18-crown-6 yields a mononuclear nitride, complete encapsulation of the alkali metal with cryptand provides
Maria E, Carroll +3 more
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