Results 1 to 10 of about 86 (78)

Tribo-electrochemistry induced artificial solid electrolyte interface by self-catalysis [PDF]

Nature Communications, 2021
Potassium metal is a promising alkali metal anode but formation of dendrites limits its application. Here, the authors report construction of a continuous and compact protective layer on potassium metal anode through a self-catalysis tribo ...
Chichu Qin, Dong Wang, Yumin Liu, Pengkun Yang, Tian Xie, Lu Huang, Haiyan Zou, Guanwu Li, Yingpeng Wu   +8 more
doaj   +5 more sources

Mechanical, Microstructural and Tribo-Electrochemistry Characterization in Aqueous Media of Coatings Vanadium / Vanadium Nitride Used as Functional Coating for Implants

International Journal of Electrochemical Science, 2016
The study presents tribo-electrochemistry properties of multilayers of Vanadium / vanadium nitride [V / VN] n (n = 1, 20, 50 and 100) deposited on surgical grade steel 316LVM through the Physical Vapor Deposition processes (PVD) using Magnetron ...
W. Aperador, J. Duque, E. Delgado
doaj   +2 more sources

Retraction Note to: “A review of lubricating mechanisms from the perspective of tribo-electrophysics and tribo-electrochemistry” [PDF]

Science China Technological Sciences, 2019
The authors have retracted this article [1] due to redundant publication. Upon investigation by the journal’s editorial board, it was found that the majority of the content is a translation of the authors’ previous publication [2], which was not acknowledged nor cited in this current article [1]. All authors agree to this retraction.
ZeQi Jiang, JianHua Fang, YingChun Chen, Jiang Wu, Ping Liu, KeCheng Gu, Zhe Zheng, BoShui Chen, Xin Wang, YanHan Feng   +9 more
openaire   +1 more source

Experimental Strategies for Studying Tribo-Electrochemical Aspects of Chemical–Mechanical Planarization

Lubricants
Chemical–mechanical planarization (CMP) is used to smoothen the topographies of a rough surface by combining several functions of tribology (friction, lubrication), chemistry, and electrochemistry (corrosion, wear, tribo-corrosion).
Kassapa Gamagedara, Dipankar Roy
doaj   +1 more source

Tribo-Electrochemical Considerations for Assessing Galvanic Corrosion Characteristics of Metals in Chemical Mechanical Planarization

Electrochem
The manufacturing of integrated circuits involves multiple steps of chemical mechanical planarization (CMP) involving different materials. Mitigating CMP-induced defects is a main requirement of all CMP schemes.
Kassapa U. Gamagedara, Dipankar Roy
doaj   +1 more source

Mitigating Galvanic Corrosion of Molybdenum Diffusion Barriers in Chemical Mechanical Planarization of Copper Interconnects: A Case Study Using Imidazole in a Citrate Slurry of Neutral pH

Electrochem
Molybdenum (Mo) is currently considered as a potential diffusion barrier material for copper (Cu) interconnects, and these interconnect structures are generally processed using the technique of chemical mechanical planarization (CMP).
Kassapa U. Gamagedara, Dipankar Roy
doaj   +1 more source

Tribo-Electrochemical Characterization of Brush-Scrubbed Post-CMP Cleaning: Results for Tartrate-Supported Removal of Residual Oxides from Copper Films

Lubricants
Wafer cleaning after chemical mechanical planarization (CMP) is a critical processing step for copper metallization in integrated circuits. Post-CMP cleaning (PCMPC) commonly combines surface (electro)chemistry with the tribology of brush scrubbing to ...
Collin M. Reff, Kassapa U. Gamagedara, David R. Santefort, Dipankar Roy   +3 more
doaj   +1 more source

Effect of Ti₃SiC₂ and Ti₃AlC₂ Particles on Microstructure and Wear Resistance of Microarc Oxidation Layers on TC4 Alloy. [PDF]

Materials (Basel), 2022
Gu G, Shang J, Lin D.
europepmc   +1 more source

Hydrogels as Soft Ionic Conductors in Flexible and Wearable Triboelectric Nanogenerators. [PDF]

Adv Sci (Weinh), 2022
Wu Y, Luo Y, Cuthbert TJ, Shokurov AV, Chu PK, Feng SP, Menon C.   +6 more
europepmc   +1 more source

Hydration layer structure modulates superlubrication by trivalent La³⁺ electrolytes. [PDF]

Sci Adv, 2023
Han T, Cao W, Xu Z, Adibnia V, Olgiati M, Valtiner M, Ma L, Zhang C, Ma M, Luo J, Banquy X.   +10 more
europepmc   +1 more source