Machine learning for enhancing the ablation outcomes using recurrence quantification analysis in human persistent atrial fibrillation. [PDF]
Qaqos NN, Schlindwein FS, Ng GA, Li X.
europepmc +1 more source
Melt electrofibrillation (MEF) enables the fabrication of nanofibrillar PCL scaffolds with defined architectures that guide cellular alignment and retention during cartilage tissue engineering. Unlike conventional melt electrowriting, MEF consistently directs collagen type II‐rich extracellular matrix organization, providing a tunable platform to ...
Alba Pueyo Moliner +10 more
wiley +1 more source
Experimental and analytical geodetic accuracy assessment of terrestrial laser scanning for deformation monitoring under static and dynamic conditions. [PDF]
Beshr AAA +3 more
europepmc +1 more source
Nonplanar Bouligand Architectures for Enhanced Mechanical Performance in Cementitious Composites
Inspired by the impact region of the Mantis shrimp dactyl club, nonplanar additive manufacturing translates sinusoidal Bouligand architectures into cementitious composites. Printing‐induced anisotropy and architected interfaces promote distributed damage and arrest crack propagation, enhancing strength and energy absorption.
Yu Wang +7 more
wiley +1 more source
Predicting vault after implantable collamer lens implantation using intraoperative OCT: establishment and application of models. [PDF]
Du X, Yan H.
europepmc +1 more source
Plasmon‐Enhanced Second‐Harmonic Generation in Atomically Thin Crystalline Silver Nanostructures
Atomically thin crystalline silver films combine vertical quantum confinement with lateral plasmonic field enhancement to boost second‐harmonic generation. Nanoribbon and nanotriangle arrays enable geometry‐tunable infrared plasmon resonances, producing strong SHG from deeply subwavelength metallic volumes compatible with silicon‐based nanophotonics ...
Saad Abdullah +10 more
wiley +1 more source
Robust Image Stitching for Railway Wagon Inspection in Uncontrolled Outdoor Environments. [PDF]
Diaz-Diaz A, Parrilla F, Bergasa LM.
europepmc +1 more source
Recent Advances in Plasma‐Enhanced Atomic Layer Etching for Next‐Generation Nanofabrication
Continued semiconductor miniaturization demands atomic‐scale patterning and ultralow surface roughness beyond the capabilities of conventional reactive ion etching. This review highlights advances in isotropic and anisotropic plasma‐enhanced atomic layer etching since 2020, covering fundamental mechanisms, applications across major semiconductor ...
Shih‐Nan Hsiao
wiley +1 more source

