Results 301 to 310 of about 5,094,043 (324)
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The interpretation of radio-influence voltage profiles
Electric Power Systems Research, 1985Abstract A method for obtaining a radio-influence voltage (RIV) versus applied voltage profile is described. Typical results are presented and suggestions are made for their interpretation. The pass/fail levels given by various national standards and methods for applying atmospheric corrections are discussed.
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Reevaluation of hydropathy profiles of voltage-gated ionic channels
Experientia, 1991A reevaluation of the secondary structure of Na, Ca and K channel proteins led to the following results. Only three segments (S1, S5 and S6) of each repeat are sufficiently hydrophobic to be predicted as transmembrane helices, if a window of 19 amino acids is used.
A, Sawaryn, H, Drouin
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Holographic voltage profiling on 75nm gate architecture CMOS devices
Ultramicroscopy, 2003Voltage profiles of the source-drain region of a CMOS transistor with 75nm gate architecture taken from an off-the-shelf Intel PIII processor are presented. The sample preparation using a dual beam system is discussed as well as details of the electron optical setup of the microscope.
Alexander E, Thesen +2 more
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Capacitance-Voltage Profiling of Multilayer Semiconductor Structures
1991C-V profiling has traditionally found its importance in the determination of semiconductor doping profiles and, more recently, to provide estimates of heterojunction band offsets [1]. It has been recognised [2] that a profile of the free electron concentration n(x) is obtained from C-V techniques rather than that of the doping profile Nd(x).
J. S. Rimmer, B. Hamilton, A. R. Peaker
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Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1994
An accurate doping profile extraction in devices fabricated in semi-insulating GaAs substrates is difficult. The conventional Schottky barrier diode C–V technique is prone to large errors caused by bias dependent series resistance, gate current conduction, deep-level traps, and breakdown of the depletion approximation.
K. Iniewski, M. Liu, C. A. T. Salama
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An accurate doping profile extraction in devices fabricated in semi-insulating GaAs substrates is difficult. The conventional Schottky barrier diode C–V technique is prone to large errors caused by bias dependent series resistance, gate current conduction, deep-level traps, and breakdown of the depletion approximation.
K. Iniewski, M. Liu, C. A. T. Salama
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Improving the voltage profile of a medium voltage grid using distributed generation units
2013 15th European Conference on Power Electronics and Applications (EPE), 2013In this paper the impact of photovoltaic (PV) system connected to the medium voltage distribution grid using three-phase three-level inverter and step-up transformer will be investigated. The PV inverter is capable to control active and reactive power independently.
Georgios Tsengenes +2 more
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Smart batteries and lithium ion voltage profiles
The Twelfth Annual Battery Conference on Applications and Advances, 2002This paper addresses how the smart battery system specifications facilitate battery interchangeability in the light of differences in battery chemistry. Specifically it addresses differences among Li-ion battery manufacturers as well as differences between nickel metal hydride and lithium ion batteries.
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Voltage profile improvement in distribution network by means of voltage regulators
2001Poboljšanje naponskih prilika u distributivnoj mreži otoka Hvara ostvareno je pomoću regulatora napona. Padovi napona na dugačkim distributivnim vodovima hrvatskih otoka u posljednje vrijeme predstavljaju veliki pogonski problem. U radu se prikazuje teorijski i praktični pristup rješenju navedenog problema.
Sutlović, Elis +2 more
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Capacitance-Voltage and Drive-Level–Capacitance Profiling
2018The capacitance–voltage (CV) and drive-level–capacitance-profiling (DLCP) techniques yield information about the density of states in, or near, the depletion region of a diode. This chapter explores the theoretical derivation, assumptions, strengths and limitations, application and analysis of these two related techniques, CV and DLCP. The CV technique
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Voltage Profile Enhancement Using FACTS Devices
2022Akash Sharma, Rajive Tiwari
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