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2001
In this paper we briefly discuss the main concept and details of X-ray Lithography, a parallel lithographic technique belonging to the domain of UV lithography (UVL). The main difference lies on its usage of X-ray photons, which having a much shorter wavelength were supposed to provide for a ‘resolution reserve’ for Moore’s law requirements, long after
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In this paper we briefly discuss the main concept and details of X-ray Lithography, a parallel lithographic technique belonging to the domain of UV lithography (UVL). The main difference lies on its usage of X-ray photons, which having a much shorter wavelength were supposed to provide for a ‘resolution reserve’ for Moore’s law requirements, long after
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2010
The regulations on the handling of X rays are very similar to the regulations on standard radiation protection. The X-ray regulations in the European Union apply to those X-ray tubes and X-ray installations in which electrons are accelerated at least to 5 keV and in which they are limited to a maximum energy of 1 MeV.
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The regulations on the handling of X rays are very similar to the regulations on standard radiation protection. The X-ray regulations in the European Union apply to those X-ray tubes and X-ray installations in which electrons are accelerated at least to 5 keV and in which they are limited to a maximum energy of 1 MeV.
openaire +1 more source