Wafer scale manufacturing of high precision micro-optical components through X-ray lithography yielding 1800 Gray Levels in a fingertip sized chip [PDF]
Scientific Reports, 2022 We present a novel x-ray lithography based micromanufacturing methodology that offers scalable manufacturing of high precision optical components. It is accomplished through simultaneous usage of multiple stencil masks made moveable with respect to one ...
S. M. P. Kalaiselvi +6 more
doaj +2 more sources
Ion beam lithography for Fresnel zone plates in X-ray microscopy [PDF]
Opt. Express 2013, 21 (10), 11747-11756, 2013 Fresnel Zone Plates (FZP) are to date very successful focusing optics for X-rays. Established methods of fabrication are rather complex and based on electron beam lithography (EBL).
Achim Nadzeyka +49 more
core +2 more sources
Chemical and Molecular Variations in Commercial Epoxide Photoresists for X-ray Lithography [PDF]
Applied Sciences, 2018 The quality of high aspect ratio microstructures fabricated by deep X-ray lithography is highly dependent on the photoresist material used and the process parameters applied.
Vitor Vlnieska +5 more
doaj +4 more sources
Exploiting atomic layer deposition for fabricating sub-10 nm X-ray lenses [PDF]
, 2018 Moving towards significantly smaller nanostructures, direct structuring techniques such as electron beam lithography approach fundamental limitations in feature size and aspect ratios.
Belkhou, Rachid +14 more
core +2 more sources
High aspect ratio silicon structures by Displacement Talbot lithography and Bosch etching [PDF]
Proc. SPIE 10146, Advances in Patterning Materials and Processes
XXXIV, 101460L (27 March 2017), 2017 Despite the fact that the resolution of conventional contact/proximity lithography can reach feature sizes down to ~0.5-0.6 micrometers, the accurate control of the linewidth and uniformity becomes already very challenging for gratings with periods in ...
Dais, Christian +8 more
core +2 more sources
X-Ray Lithography for Nanofabrication: Is There a Future? [PDF]
Frontiers in Nanotechnology, 2022 X-ray lithography has been first proposed almost 50 years ago, and the related LIGA process around 25 years ago. It is therefore a good time to make an analysis of the technique, with its pros and cons.
Amardeep Bharti +2 more
doaj +2 more sources
The Adone wiggler x-ray lithography beamline [PDF]
Review of Scientific Instruments, 1989 A soft x-ray beamline, utilizing the radiation produced by the six-pole wiggler of the Adone storage ring, has been realized. The beamline allows the exposure of large area resists by means of a double-mirror scanning system or mechanically moving the wafer. The mechanical, geometrical, and spectral characteristics of the beamline will be described.
S. Simeoni +6 more
openaire +4 more sources
Development of Ground-testable Phase Fresnel Lenses in Silicon [PDF]
Exper.Astron.20:299-306,2005, 2006 Diffractive/refractive optics, such as Phase Fresnel Lenses (PFL's), offer the potential to achieve excellent imaging performance in the x-ray and gamma-ray photon regimes.
B. Morgan +14 more
core +2 more sources
Development of an Array of Compound Refractive Lenses for Sub-Pixel Resolution, Large Field of View, and Time-Saving in Scanning Hard X-ray Microscopy [PDF]
Applied Sciences, 2020 A two-dimensional array of compound refractive lenses (2D array of CRLs) designed for hard X-ray imaging with a 3.5 mm2 large field of view is presented.
Talgat Mamyrbayev +7 more
doaj +3 more sources
X‐Ray Multibeam Ptychography at up to 20 keV: Nano‐Lithography Enhances X‐Ray Nano‐Imaging [PDF]
Advanced ScienceHard X‐rays are needed for non‐destructive nano‐imaging of solid matter. Synchrotron radiation facilities (SRF) provide the highest‐quality images with single‐digit nm resolution using advanced techniques such as X‐ray ptychography.
Tang Li +8 more
doaj +2 more sources