Wafer scale manufacturing of high precision micro-optical components through X-ray lithography yielding 1800 Gray Levels in a fingertip sized chip [PDF]
We present a novel x-ray lithography based micromanufacturing methodology that offers scalable manufacturing of high precision optical components. It is accomplished through simultaneous usage of multiple stencil masks made moveable with respect to one ...
S. M. P. Kalaiselvi +6 more
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The Influence of Mask Modification on Microneedle Strength in Deep X-Ray Lithography [PDF]
Hollow microneedle arrays of different shapes were prepared for blood collection and precise drug delivery. This microneedle array was investigated using shape modification and hole position optimization, and different approaches to increase the strength
Jie Wang, Yigui Li, Lin Du
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Performance of SU-8 Membrane Suitable for Deep X-Ray Grayscale Lithography [PDF]
In combination with tapered-trench-etching of Si and SU-8 photoresist, a grayscale mask for deep X-ray lithography was fabricated and passed a 10-times-exposure test.
Harutaka Mekaru
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A high precision slit in ultra-high vacuum is designed to develop a good performance soft X-ray interference lithography (XIL) beamline at Shanghai Synchrotron Radiation Facility (SSRF). In order to define the secondary source and enhance the performance
Xuepeng Gong, Qipeng Lu, Zhongqi Peng
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Diffractive lenses for neutron techniques [PDF]
Many neutron techniques can greatly benefit from enhanced neutron lenses for focusing and imaging. In this work, we revisit the potential of diffractive optics for neutron beams, building on advanced high-resolution nano-lithography techniques developed ...
Mano raj Dhanalakshmi Veeraraj +9 more
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Nanoscale Resist‐Free Patterning of Halogenated Zeolitic Imidazolate Frameworks by Extreme UV Lithography [PDF]
Advancements in patterning techniques for metal–organic frameworks (MOFs) are crucial for their integration into microelectronics. However, achieving precise nanoscale control of MOF structures remains challenging.
Weina Li +7 more
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Reflective x-ray masks for x-ray lithography
Abstract Application of x-ray multilayers as reflective x-ray masks for x-ray lithography is proposed. The mask is a specially prepared multilayer mirror capable to selectively reflect x-rays. The use of grazing geometry allows a pattern design on the mask to be compressed in one direction.
V S Chumak +4 more
openaire +2 more sources
Two-Step Resist Deposition of E-Beam Patterned Thick Py Nanostructures for X-ray Microscopy
Patterned elements of permalloy (Py) with a thickness as large as 300 nm have been defined by electron beam lithography on X-ray-transparent 50 nm thick membranes in order to characterize their magnetic structure via Magnetic Transmission X-ray ...
Javier Hermosa +8 more
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X-Ray Lithography for Nanofabrication: Is There a Future?
X-ray lithography has been first proposed almost 50 years ago, and the related LIGA process around 25 years ago. It is therefore a good time to make an analysis of the technique, with its pros and cons.
Amardeep Bharti +2 more
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High-efficiency focusing and imaging by dielectric kinoform zone plate lenses with soft X-rays
With fast advances in enhancing the focusing/imaging resolution of Fresnel zone plate lenses toward sub-10 nm, low diffraction efficiency in connection with their rectangular zone shape still remains a big issue in both soft and hard X-ray microscopy. In
Xujie Tong +9 more
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