Results 1 to 10 of about 9,708 (287)

Wafer scale manufacturing of high precision micro-optical components through X-ray lithography yielding 1800 Gray Levels in a fingertip sized chip [PDF]

open access: yesScientific Reports, 2022
We present a novel x-ray lithography based micromanufacturing methodology that offers scalable manufacturing of high precision optical components. It is accomplished through simultaneous usage of multiple stencil masks made moveable with respect to one ...
S. M. P. Kalaiselvi   +6 more
doaj   +2 more sources

X-Ray Lithography for Nanofabrication: Is There a Future? [PDF]

open access: goldFrontiers in Nanotechnology, 2022
X-ray lithography has been first proposed almost 50 years ago, and the related LIGA process around 25 years ago. It is therefore a good time to make an analysis of the technique, with its pros and cons.
Amardeep Bharti   +2 more
doaj   +2 more sources

The Adone wiggler x-ray lithography beamline [PDF]

open access: greenReview of Scientific Instruments, 1989
A soft x-ray beamline, utilizing the radiation produced by the six-pole wiggler of the Adone storage ring, has been realized. The beamline allows the exposure of large area resists by means of a double-mirror scanning system or mechanically moving the wafer. The mechanical, geometrical, and spectral characteristics of the beamline will be described.
S. Simeoni   +6 more
openaire   +4 more sources

Evaluation of resist sensitivity in extreme ultraviolet/soft x-ray region for next-generation lithography [PDF]

open access: goldAIP Advances, 2011
At and below the 11 nm node, shortening the exposure wavelength to >10 nm (extreme ultraviolet (EUV)/soft x-ray region), especially at 6.6-6.8 nm, has been discussed as next-generation EUV lithography. In this study, dose/sensitivities of typical resists
Tomoko Gowa Oyama   +3 more
doaj   +2 more sources

Performance of SU-8 Membrane Suitable for Deep X-Ray Grayscale Lithography [PDF]

open access: goldMicromachines, 2015
In combination with tapered-trench-etching of Si and SU-8 photoresist, a grayscale mask for deep X-ray lithography was fabricated and passed a 10-times-exposure test.
Harutaka Mekaru
doaj   +2 more sources

X-ray lenses fabricated by deep x-ray lithography [PDF]

open access: greenSPIE Proceedings, 2002
Refractive x-ray lenses have been fabricated using deep x-ray lithography. Lenses were produced directly in 1- to 6-mm-thick sheets of polymethylmethacrylate (PMMA) with as many as 100 cylindrical lenses along the optical axis. The fabrication process consists of exposing the PMMA sheets to high-energy synchrotron radiation through a mask of 50-micron ...
Mancini, D. C.   +4 more
openaire   +4 more sources

Diffractive lenses for neutron techniques [PDF]

open access: yesScientific Reports
Many neutron techniques can greatly benefit from enhanced neutron lenses for focusing and imaging. In this work, we revisit the potential of diffractive optics for neutron beams, building on advanced high-resolution nano-lithography techniques developed ...
Mano raj Dhanalakshmi Veeraraj   +9 more
doaj   +2 more sources

Nanoscale Resist‐Free Patterning of Halogenated Zeolitic Imidazolate Frameworks by Extreme UV Lithography [PDF]

open access: yesAdvanced Science
Advancements in patterning techniques for metal–organic frameworks (MOFs) are crucial for their integration into microelectronics. However, achieving precise nanoscale control of MOF structures remains challenging.
Weina Li   +7 more
doaj   +2 more sources

Optimization of Soft X-Ray Fresnel Zone Plate Fabrication Through Joint Electron Beam Lithography and Cryo-Etching Techniques [PDF]

open access: yesNanomaterials
The ability to manufacture complex 3D structures with nanometer-scale resolution, such as Fresnel Zone Plates (FZPs), is crucial to achieve state-of-the-art control in X-ray sources for use in a diverse range of cutting-edge applications.
Maha Labani   +5 more
doaj   +2 more sources

Two-Step Resist Deposition of E-Beam Patterned Thick Py Nanostructures for X-ray Microscopy

open access: yesMicromachines, 2022
Patterned elements of permalloy (Py) with a thickness as large as 300 nm have been defined by electron beam lithography on X-ray-transparent 50 nm thick membranes in order to characterize their magnetic structure via Magnetic Transmission X-ray ...
Javier Hermosa   +8 more
doaj   +1 more source

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