Results 101 to 110 of about 113,972 (245)

Nanopatterned electron beams for temporal coherence and deterministic phase control of x-ray free-electron lasers [PDF]

arXiv, 2019
We demonstrate the ability to create electron beams with high-contrast, nanometer-scale density modulations as a first step toward developing full control of the phase fronts of an x-ray free-electron laser. The nanopatterned electron beams are produced by diffracting electrons through thin single-crystal silicon membranes that are lithographically ...
arxiv  

Use of trilevel resists for high-resolution soft-x-ray projection lithography [PDF]

, 1990
Dwight W. Berreman, J. E. Bjorkholm, Marco Becker, L. Eichner, R. R. Freeman, T. E. Jewell, W Mansfield, Alastair A. MacDowell, M. L. O’Malley, E. L. Raab, W. T. Silfvast, L. H. Szeto, D. M. Tennant, W. K. Waskiewicz, D. L. White, David L. Windt, O. R. Wood   +16 more
openalex   +1 more source

<title>Cost of ownership for soft x-ray projection lithography</title> [PDF]

, 1994
Kathleen Early, William H. Arnold
openalex   +1 more source

Controlled synthesis of periodic arrays of ZnO nanostructures combining e-beam lithography and solution-based processes leveraged by micro X-ray fluorescence spectroscopy

Micro and Nano Engineering, 2020
In this work, a comprehensive study on how to combine purely chemical, bottom-up solution-based synthesis with advanced e-beam lithography for the controllable production of ZnO-nanostructure periodic arrays on Si and SiO2 substrates is presented.
G.P. Papageorgiou, A.G. Karydas, G. Papageorgiou, V. Kantarelou, E. Makarona   +4 more
doaj  

Estimation of resist sensitivity for extreme ultraviolet lithography using an electron beam

AIP Advances, 2016
It is a challenge to obtain sufficient extreme ultraviolet (EUV) exposure time for fundamental research on developing a new class of high sensitivity resists for extreme ultraviolet lithography (EUVL) because there are few EUV exposure tools that are ...
Tomoko Gowa Oyama, Akihiro Oshima, Seiichi Tagawa   +2 more
doaj   +1 more source

Upgrade to the SHARP EUV mask microscope [PDF]

, 2019
The Sharp High-NA Actinic Reticle review Project (SHARP) is a synchrotron-based, extreme ultraviolet (EUV) microscope dedicated to photomask research. A potential upgrade to the SHARP microscope is presented.
Benk, M, Chao, W, Goldberg, K, Miyakawa, R, Naulleau, P   +4 more
core  

High efficiency and low absorption Fresnel compound zone plates for hard X-ray focusing

, 2005
Circular and linear zone plates have been fabricated on the surface of silicon crystals for the energy of 8 keV by electron beam lithography and deep ion plasma etching methods.
Aristov, V., Ishikawa, T., Isoyan, A., Kondratenkov, M., Kuyumchyan, A., Shulakov, E., Snigirev, A., Snigireva, I., Souvorov, A., Tamasaku, K., Trouni, K., Yabashi, M.   +11 more
core   +1 more source

Inverse Tomo-Lithography for Making Microscopic 3D Parts [PDF]

According to a proposal, basic x-ray lithography would be extended to incorporate a technique, called inverse tomography, that would enable the fabrication of microscopic three-dimensional (3D) objects.
White, Victor, Wiberg, Dean
core   +1 more source

Development of hard X-ray photoelectron spectroscopy in liquid cells using optimized microfabricated silicon nitride membranes

Journal of Synchrotron Radiation
We present first hard X-ray photoelectron spectroscopy (HAXPES) results of aqueous salt solutions and dispersions of gold nanoparticles in liquid cells equipped with specially designed microfabricated thin silicon nitride membranes, with thickness in the
F. Capone, O. Muntada, J. C. Ramírez, M. J. Esplandiu, R. Dedryvère, A. Grimaud, B. Lassalle-Kaiser, D. Céolin, F. Pérez-Murano, J.-P. Rueff, Jordi Fraxedas   +10 more
doaj   +1 more source

Orbit calculations and lattice parameters for the BNL (Brookhaven National Laboratory) SXLS (Superconducting X-Ray Lithography Source)

, 1990
L. Blumberg, J.B. Murphy, S. Sidhu
openalex   +4 more sources