Results 111 to 120 of about 113,972 (245)
Lateral shearing interferometry for high-NA EUV wavefront metrology [PDF]
, 2018 We present a lateral shearing interferometer suitable for high-NA EUV wavefront metrology. In this interferometer, a geometric model is used to accurately characterize and predict systematic errors that come from performing interferometry at high NA ...
Chen, L +3 more
core
25-Fold Resolution Enhancement of X-ray Microscopy Using Multipixel Ghost Imaging [PDF]
arXivHard x-ray imaging is indispensable across diverse fields owing to its high penetrability. However, the resolution of traditional x-ray imaging modalities, such as computed tomography (CT) systems, is constrained by factors including beam properties, the absence of optical components, and detection resolution.
arxiv
Nano ExpressMetal-assisted chemical etching of silicon, especially in the vapour phase, is a highly promising technique for fabricating nanostructures with high aspect ratios.
Hanna Ohlin +3 more
doaj +1 more source
Theoretical and Applied Mechanics Letters, 2018 : In this study, an etched-SiO-film grating fabrication technique based on solute-solvent separation soft lithography is developed. By using this new technique, high temperature grating with frequency of 600 lines/mm is successfully fabricated on the ...
Bozhao Fan, Huimin Xie
doaj
APL MaterialsArtificial spin-ice systems are patterned arrays of magnetic nanoislands arranged into frustrated geometries and provide insight into the physics of ordering and emergence. The majority of these systems have been realized in two-dimensions, mainly due to
Edward Harding +10 more
doaj +1 more source
Nanometer table-top proximity x-ray lithography with liquid-target laser-plasma source [PDF]
, 1997 Lennart Malmqvist +3 more
openalex +1 more source
Fabrication of Tapered Micropillars with High Aspect-Ratio Based on Deep X-ray Lithography. [PDF]
Materials (Basel), 2019 Park JM +6 more
europepmc +1 more source
Conventional magnet storage rings for x-ray lithography
, 1986 M. Bassetti +9 more
openalex +2 more sources
A High-Flux Compact X-ray Free-Electron Laser for Next-Generation Chip Metrology Needs
InstrumentsRecently, considerable work has been directed at the development of an ultracompact X-ray free-electron laser (UCXFEL) based on emerging techniques in high-field cryogenic acceleration, with attendant dramatic improvements in electron beam brightness and
James B. Rosenzweig +35 more
doaj +1 more source
Fabrication of Polymer Microstructures of Various Angles via Synchrotron X-Ray Lithography Using Simple Dimensional Transformation. [PDF]
Materials (Basel), 2018 Park K, Kim K, Lee SC, Lim G, Kim JH.
europepmc +1 more source