Results 131 to 140 of about 9,708 (287)

Functionalized SU-8 patterned with x-ray lithography [PDF]

, 2005
S. Balslev, Filippo Romanato
openalex   +1 more source

Sputtered Amorphous Boron Nitride‐Silicon Oxide Composite Toward Thickness‐Scalable Low‐k Interlayer Dielectric Applications

Advanced Materials Technologies, EarlyView.
Amorphous boron nitride (aBN) crystallizes into turbostratic BN as the thickness increases, leading to a higher dielectric constant (k‐value), increased leakage current density, and reduced breakdown field. Incorporating SiOx layers effectively prevents this crystallization.
Chih‐Pin Hsu, Chien‐Ting Wu, Yu‐Chuan Lin, Yu‐Hsuan Lin, Ming‐Chun Hong, Wei‐Yen Woon, Szuya Liao, Tuo‐Hung Hou   +7 more
wiley   +1 more source

Synchrotron radiation sources and condensers for projection x-ray lithography [PDF]

, 1992
J.B. Murphy, A. A. MacDowell, D. L. White, O. R. Wood   +3 more
openalex  

Beamline and exposure station for deep x-ray lithography at the advanced photon source

, 1996
Barry Lai, Derrick C. Mancini, Wenbing Yun, E. Gluskin   +3 more
openalex   +2 more sources

Fabrication of a Si stencil mask for the X-ray lithography using a dry etching technique [PDF]

, 2006
Harutaka Mekaru, Takayuki Takano, Koichi Awazu, Ryutaro Maeda   +3 more
openalex   +1 more source

High‐Endurance and Energy‐Efficient All‐Optical Programming of Scalable Silicon Waveguides with Integrated Phase‐Change Material Patches

Advanced Optical Materials, EarlyView.
Phase change materials are integrated into silicon photonic circuits via 200 mm industrial wafer processes. Interferometric optical characterization reveals switching thresholds, transmission modulation, phase shifts, and record endurance (>108 cycles).
Rajath Sawant, Anthony Albanese, Arnaud Rogemont, Gregorio Gonzalez‐Cortes, Yoann Brûlé, Lara Karam, Jean‐Baptiste Jager, Stephane Malhouitre, Benoit Charbonnier, Aurélien Coillet, Pierre Noé, Benoit Cluzel   +11 more
wiley   +1 more source

Large-scale self-assembled nanophotonic scintillators for X-ray imaging. [PDF]

Nat Commun
Martin-Monier L, Pajovic S, Abebe MG, Chen J, Vaidya S, Min S, Choi S, Kooi SE, Maes B, Hu J, Soljačić M, Roques-Carmes C.   +11 more
europepmc   +1 more source

Initial development of efficient, low-debris laser targets for the Sandia soft x-ray projection lithography effort

, 1997
Paul D. Rockett, John Hunter, Glenn D. Kubiak   +2 more
openalex   +2 more sources

Mechanically Tunable Optical Response in Silicon Nanosphere Metasurface Fabricated via Bottom‐Up Process

Advanced Optical Materials, EarlyView.
A large area mechano‐tunable square lattice array of silicon nanospheres is fabricated by a bottom‐up process, and the capability to tune the lattice resonances by external strain is demonstrated. Spectrally overlapping the electric and magnetic dipole lattice resonances by mechanical strain induces the lattice Kerker effect and strongly suppresses the
Yongan Hu, Patrick T. Probst, Mojtaba Karimi Habil, Hiroshi Sugimoto, Minoru Fujii   +4 more
wiley   +1 more source

Advancements in Lithography Techniques and Emerging Molecular Strategies for Nanostructure Fabrication. [PDF]

Int J Mol Sci
Basu P, Verma J, Abhinav V, Ratnesh RK, Singla YK, Kumar V.   +5 more
europepmc   +1 more source