Results 11 to 20 of about 9,708 (287)
High-efficiency focusing and imaging by dielectric kinoform zone plate lenses with soft X-rays
With fast advances in enhancing the focusing/imaging resolution of Fresnel zone plate lenses toward sub-10 nm, low diffraction efficiency in connection with their rectangular zone shape still remains a big issue in both soft and hard X-ray microscopy. In
Xujie Tong+9 more
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Evolution in Lithography Techniques: Microlithography to Nanolithography
In this era, electronic devices such as mobile phones, computers, laptops, sensors, and many more have become a necessity in healthcare, for a pleasant lifestyle, and for carrying out tasks quickly and easily.
Ekta Sharma+6 more
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Miniaturized Sulfite-Based Gold Bath for Controlled Electroplating of Zone Plate Nanostructures
X-ray zone plates made from gold are common optical components used in X-ray imaging experiments. These nanostructures are normally fabricated using a combination of electron-beam lithography and gold electroplating with cyanide gold baths. In this study,
Hanna Ohlin+3 more
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(Invited) X-Ray Lithography [PDF]
An X-ray exposure system has been built aiming at 1 µm pattern replication, which will operated automatically. On the basis of X-ray attenuation analysis, Si–K radiation was chosen. A high power (more than 20 kW input) X-ray source has been equipped with a water cooled rotary target.
Shin'ichi Yamazaki, Toa Hayasaka
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Multilayer Reflective Coatings for BEUV Lithography: A Review
The development of microelectronics is always driven by reducing transistor size and increasing integration, from the initial micron-scale to the current few nanometers.
Paul C. Uzoma+4 more
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Fabrication of the X-Ray Mask using the Silicon Dry Etching
The X-ray lithography of uses synchrotron radiation is one of the microprocessing structure fabrication technology. In X-ray lithography, precision of the fabricated structure is influenced by precision of the X-ray mask considerably. Conventionally, the
Hiroshi TSUJII+5 more
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Mesoporous materials feature ordered tailored structures with uniform pore sizes and highly accessible surface areas, making them an ideal host for functional organic molecules or nanoparticles for analytical and sensing applications.
Benedetta Marmiroli+6 more
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Chemical and Molecular Variations in Commercial Epoxide Photoresists for X-ray Lithography
The quality of high aspect ratio microstructures fabricated by deep X-ray lithography is highly dependent on the photoresist material used and the process parameters applied.
Vitor Vlnieska+5 more
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The incorporation of interface passivation structures in ultrathin Cu(In,Ga)Se2 based solar cells is shown. The fabrication used an industry scalable lithography technique—nanoimprint lithography (NIL)—for a 15 × 15 cm2 dielectric layer patterning ...
T. S. Lopes+23 more
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A two-dimensional array of compound refractive lenses (2D array of CRLs) designed for hard X-ray imaging with a 3.5 mm2 large field of view is presented.
Talgat Mamyrbayev+7 more
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