Changes in the near edge X-ray absorption fine structure of hybrid organic-inorganic resists upon exposure [PDF]
, 2018 We report on the near edge X-ray absorption fine structure (NEXAFS) spectroscopy of hybrid organic-inorganic resists. These materials are nonchemically amplified systems based on Si, Zr, and Ti oxides, synthesized from organically modified precursors and
Brigo, Laura +6 more
core +2 more sources
Evaluation of resist sensitivity in extreme ultraviolet/soft x-ray region for next-generation lithography [PDF]
AIP Advances, 2011 At and below the 11 nm node, shortening the exposure wavelength to >10 nm (extreme ultraviolet (EUV)/soft x-ray region), especially at 6.6-6.8 nm, has been discussed as next-generation EUV lithography. In this study, dose/sensitivities of typical resists
Tomoko Gowa Oyama +3 more
doaj +2 more sources
Performance of SU-8 Membrane Suitable for Deep X-Ray Grayscale Lithography [PDF]
Micromachines, 2015 In combination with tapered-trench-etching of Si and SU-8 photoresist, a grayscale mask for deep X-ray lithography was fabricated and passed a 10-times-exposure test.
Harutaka Mekaru
doaj +2 more sources
Diffractive lenses for neutron techniques [PDF]
Scientific ReportsMany neutron techniques can greatly benefit from enhanced neutron lenses for focusing and imaging. In this work, we revisit the potential of diffractive optics for neutron beams, building on advanced high-resolution nano-lithography techniques developed ...
Mano raj Dhanalakshmi Veeraraj +9 more
doaj +2 more sources
Nanoscale Resist‐Free Patterning of Halogenated Zeolitic Imidazolate Frameworks by Extreme UV Lithography [PDF]
Advanced ScienceAdvancements in patterning techniques for metal–organic frameworks (MOFs) are crucial for their integration into microelectronics. However, achieving precise nanoscale control of MOF structures remains challenging.
Weina Li +7 more
doaj +2 more sources
X-ray lenses fabricated by deep x-ray lithography [PDF]
SPIE Proceedings, 2002 Refractive x-ray lenses have been fabricated using deep x-ray lithography. Lenses were produced directly in 1- to 6-mm-thick sheets of polymethylmethacrylate (PMMA) with as many as 100 cylindrical lenses along the optical axis. The fabrication process consists of exposing the PMMA sheets to high-energy synchrotron radiation through a mask of 50-micron ...
Mancini, D. C. +4 more
openaire +4 more sources
Evaluation of the X-ray/EUV Nanolithography Facility at AS through wavefront propagation simulations [PDF]
Journal of Synchrotron RadiationSynchrotron light sources can provide the required spatial coherence, stability and control to support the development of advanced lithography at the extreme ultraviolet and soft X-ray wavelengths that are relevant to current and future fabricating ...
Jerome B. M. Knappett +4 more
doaj +2 more sources
Optimization of Soft X-Ray Fresnel Zone Plate Fabrication Through Joint Electron Beam Lithography and Cryo-Etching Techniques [PDF]
NanomaterialsThe ability to manufacture complex 3D structures with nanometer-scale resolution, such as Fresnel Zone Plates (FZPs), is crucial to achieve state-of-the-art control in X-ray sources for use in a diverse range of cutting-edge applications.
Maha Labani +5 more
doaj +2 more sources
High-Resolution Kinoform X-Ray Optics Printed via 405 nm 3D Laser Lithography [PDF]
, 2022 Efficient focusing of X-rays is essential for high-resolution X-ray microscopy. Diffractive X-ray optics called kinoforms offer the highest focusing efficiencies in theory.
Kern, C. +7 more
core +5 more sources
Two-Step Resist Deposition of E-Beam Patterned Thick Py Nanostructures for X-ray Microscopy
Micromachines, 2022 Patterned elements of permalloy (Py) with a thickness as large as 300 nm have been defined by electron beam lithography on X-ray-transparent 50 nm thick membranes in order to characterize their magnetic structure via Magnetic Transmission X-ray ...
Javier Hermosa +8 more
doaj +1 more source