Results 211 to 220 of about 53,277 (339)

Cryo-electron tomography reconstructs polymer in liquid film for fab-compatible lithography. [PDF]

Nat Commun
Zheng L, Xia Y, Jia X, Gao M, Liu N, Song J, Li X, Zhao X, Gao X, Zhou W, Kang W, Yang L, Wang Q, Gao Y, Wang HW, Peng H.   +15 more
europepmc   +1 more source

Room Temperature Synthesis and Photopatterning of Mesoporous Titanium Dioxide Thin Films

Advanced Materials Technologies, EarlyView.
A nanofabrication strategy combining deep‐UV photolithography with block copolymer self‐assembly enables direct patterning and mineralization of mesoporous TiO2 thin films at room temperature. Photocatalytic titanium oxo‐clusters promote polymer degradation under UV irradiation, enabling multiscale control over porosity, film thickness, and lateral ...
Youssef Ghossoub, Laurent Noel, Dominique Berling, Victor Malgras, David Grosso, Olivier Soppera   +5 more
wiley   +1 more source

Geometry-induced spin chirality in a non-chiral ferromagnet at zero field. [PDF]

Nat Nanotechnol
Xu M, Deenen AJM, Guo H, Morales-Fernández P, Wintz S, Zhakina E, Weigand M, Donnelly C, Grundler D.   +8 more
europepmc   +1 more source

X‐Ray Multibeam Ptychography at up to 20 keV: Nano‐Lithography Enhances X‐Ray Nano‐Imaging (Adv. Sci. 30/2024) [PDF]

Tang Li, Maik Kahnt, Thomas L. Sheppard, Runqing Yang, Ken Vidar Falch, Roman Zvagelsky, Pablo Villanueva‐Perez, Martin Wegener, Mikhail Lyubomirskiy   +8 more
openalex   +1 more source

X-ray lithography in synchrotron radiation beams [PDF]

, 1979
Yu.M. Aleksandrov, A.D. Krivospitskii, M.N. Yakimenko   +2 more
openalex   +1 more source

Programmable Dimensional Lithography with Digital Micromirror Devices for Multifunctional Microarchitectures

Advanced Materials Technologies, EarlyView.
This review explores recent advances in digital micromirror device (DMD)‐based lithography, focusing on its programmable light modulation, multi‐material compatibility, and dimensional patterning strategies. It highlights innovations from optical system design to materials integration and multifunctional applications, positioning DMD lithography as a ...
Yubin Lee, Byungcheon Yoo, Chaeyeong Ryu, Jongwon Oh, Dahye Baek, Jiseok Lee   +5 more
wiley   +1 more source

Wafer-scale uniform epitaxy of transferable 2D single crystals for gate-all-around nanosheet field effect transistors. [PDF]

Nat Commun
Xue C, Tan C, Gao X, Tang J, Sun W, Yin Y, Wang M, Gao X, An H, Fu B, Liu W, Wang Y, Li Y, Ding F, Peng H.   +14 more
europepmc   +1 more source

High speed hydraulic scanner for deep x-ray lithography

, 1997
J. C. Milne, E. Johnson
openalex   +1 more source

Molecular Layer Deposited Aluminum‐Based Hybrid Resist for High‐Resolution Nanolithography and Direct Ultra‐High Aspect Ratio Pattern Transfer

Advanced Materials Technologies, EarlyView.
This study demonstrates an aluminum‐based hybrid photoresist synthesized via molecular layer deposition (MLD) using trimethylaluminum and hydroquinone. The resist achieves sub‐20 nm resolution and virtually infinite silicon etch selectivity, enabling 40 nm‐wide, micrometer‐tall nanostructures.
Won‐Il Lee, Dan N. Le, Matthew Yen, Melinda Lin, Ashwanth Subramanian, Xiao Tong, Nikhil Tiwale, Jiyoung Kim, Chang‐Yong Nam   +8 more
wiley   +1 more source

Reflection grating fabrication for the Rockets for Extended-source X-ray Spectroscopy. [PDF]

Exp Astron (Dordr)
Miles DM, McCurdy R, Labella M, McEntaffer RL, Grisé F, McCoy J, Tutt JH.   +6 more
europepmc   +1 more source