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Evaluation of the gas puff z pinch as an x‐ray lithography and microscopy source
, 1982Soft x rays (100–10 000 eV), due to their short wavelength (0.1–10 nm) can play an important role in high resolution microscopy and lithography. The gas puff Z pinch is an intense source of soft x rays.
J. Bailey+3 more
semanticscholar +1 more source
Journal of Surface Investigation X-ray Synchrotron and Neutron Techniques, 2018
N. Salashchenko+2 more
semanticscholar +1 more source
N. Salashchenko+2 more
semanticscholar +1 more source
Multibeam X-ray lithography to form deep regular microstructures
Journal of Surface Investigation X-ray Synchrotron and Neutron Techniques, 2016B. Goldenberg+4 more
semanticscholar +1 more source
Characterization method for new resist formulations for HAR patterns made by X-ray lithography
, 2014D. Kunka+12 more
semanticscholar +1 more source
Fabrication of high aspect ratio comb-drive actuator using deep X-ray lithography at Indus-2
, 2014R. Shukla+6 more
semanticscholar +1 more source