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DACIT device for axon cancer cell interaction testing in 2D and 3D. [PDF]
iScienceVelazquez-Quesada I +9 more
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Dilute Regeneration-Driven Membrane Capacitive Deionization of Synthetic Seawater using Nanopatterned Membranes and Prussian Blue Analog Electrodes. [PDF]
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Polymer Engineering & Science, 1977
The advent of X-ray lithography as a natural compliment to electron beam pattern generation and photolithography seems to be filling a need in the fabrication of submicron devices. The X-ray technique, which is simple for single level devices, lags behind other lithographies in registration techniques.
E. Spille, R. Feder
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The advent of X-ray lithography as a natural compliment to electron beam pattern generation and photolithography seems to be filling a need in the fabrication of submicron devices. The X-ray technique, which is simple for single level devices, lags behind other lithographies in registration techniques.
E. Spille, R. Feder
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Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 1985
X-ray lithography with wavelengths between 0.2 and 5 nm provides both high-structural resolution as good as 0.1 μm and a wide scope of advantages for the application in circuit production. Examples for this better process performance compared to optical techniques are: lower particle and dust sensitivity, applicability of simple single-layer resist ...
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X-ray lithography with wavelengths between 0.2 and 5 nm provides both high-structural resolution as good as 0.1 μm and a wide scope of advantages for the application in circuit production. Examples for this better process performance compared to optical techniques are: lower particle and dust sensitivity, applicability of simple single-layer resist ...
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X‐Ray Lithography and X‐Ray Microscopy
Physikalische Blätter, 1976AbstractPlenarvortrag 40. Physikertagung 1976 in Bonn: Experimental system, Wavelength selection, Resist sensitivity and resolution, Subsequent Processing, Specific Advantages of X‐rays, Biological applications, Future work.
E. Spiller, R. Feder, J. Topalian
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Japanese Journal of Applied Physics, 1977
X-ray lithography has been used in the fabrication of surface-acoustic-wave, bubble-domain, and silicon MOS devices and is well suited for replicating sub-micrometer linewidth patterns. In order to be applied in the commercial exposure of silicon IC devices, however, high power sources, sensitive resists, distortion free masks, multiple mask alignment,
Henry I. Smith, D. C. Flanders
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X-ray lithography has been used in the fabrication of surface-acoustic-wave, bubble-domain, and silicon MOS devices and is well suited for replicating sub-micrometer linewidth patterns. In order to be applied in the commercial exposure of silicon IC devices, however, high power sources, sensitive resists, distortion free masks, multiple mask alignment,
Henry I. Smith, D. C. Flanders
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2001
In this paper we briefly discuss the main concept and details of X-ray Lithography, a parallel lithographic technique belonging to the domain of UV lithography (UVL). The main difference lies on its usage of X-ray photons, which having a much shorter wavelength were supposed to provide for a ‘resolution reserve’ for Moore’s law requirements, long after
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In this paper we briefly discuss the main concept and details of X-ray Lithography, a parallel lithographic technique belonging to the domain of UV lithography (UVL). The main difference lies on its usage of X-ray photons, which having a much shorter wavelength were supposed to provide for a ‘resolution reserve’ for Moore’s law requirements, long after
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2003
X-ray lithography is an important process used in the manufacture of high aspect ratio microstructures. It also represents a promising alternative to ultraviolet optical lithography in the manufacture of large scale integrated circuits with high resolution. The process involves the irradiation of a mask and a photoresist deposited on a substrate. A gas
Raja Nassar, Weizhong Dai
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X-ray lithography is an important process used in the manufacture of high aspect ratio microstructures. It also represents a promising alternative to ultraviolet optical lithography in the manufacture of large scale integrated circuits with high resolution. The process involves the irradiation of a mask and a photoresist deposited on a substrate. A gas
Raja Nassar, Weizhong Dai
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Micromechanics For X-Ray Lithography And X-Ray Lithography For Micromechanics
SPIE Proceedings, 1989X-ray masks are micromechanical structures. They are best fabricated from thin films of low atomic number materials with built-in tensile strain. Optimized low pressure chemical vapor deposited polysilicon films have the desired characteristics for excellent x-ray masks.
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Annual Meeting Optical Society of America, 1989
Any new lithography that purports to produce 1/10-µm features with useful depth of focus will require imaging techniques in the soft x-ray.
D. Berreman +7 more
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Any new lithography that purports to produce 1/10-µm features with useful depth of focus will require imaging techniques in the soft x-ray.
D. Berreman +7 more
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