Results 21 to 30 of about 1,977,084 (391)
High-efficiency focusing and imaging by dielectric kinoform zone plate lenses with soft X-rays
Journal of Synchrotron Radiation, 2023 With fast advances in enhancing the focusing/imaging resolution of Fresnel zone plate lenses toward sub-10 nm, low diffraction efficiency in connection with their rectangular zone shape still remains a big issue in both soft and hard X-ray microscopy. In
Xujie Tong +9 more
doaj +1 more source
High-Resolution Kinoform X-Ray Optics Printed via 405 nm 3D Laser Lithography [PDF]
, 2022 Efficient focusing of X-rays is essential for high-resolution X-ray microscopy. Diffractive X-ray optics called kinoforms offer the highest focusing efficiencies in theory.
Kern, C. +7 more
core +3 more sources
Evolution in Lithography Techniques: Microlithography to Nanolithography
Nanomaterials, 2022 In this era, electronic devices such as mobile phones, computers, laptops, sensors, and many more have become a necessity in healthcare, for a pleasant lifestyle, and for carrying out tasks quickly and easily.
Ekta Sharma +6 more
doaj +1 more source
Miniaturized Sulfite-Based Gold Bath for Controlled Electroplating of Zone Plate Nanostructures
Micromachines, 2022 X-ray zone plates made from gold are common optical components used in X-ray imaging experiments. These nanostructures are normally fabricated using a combination of electron-beam lithography and gold electroplating with cyanide gold baths. In this study,
Hanna Ohlin +3 more
doaj +1 more source
(Invited) X-Ray Lithography [PDF]
Japanese Journal of Applied Physics, 1980 An X-ray exposure system has been built aiming at 1 µm pattern replication, which will operated automatically. On the basis of X-ray attenuation analysis, Si–K radiation was chosen. A high power (more than 20 kW input) X-ray source has been equipped with a water cooled rotary target.
Shin'ichi Yamazaki, Toa Hayasaka
openaire +2 more sources
Multilayer Reflective Coatings for BEUV Lithography: A Review
Nanomaterials, 2021 The development of microelectronics is always driven by reducing transistor size and increasing integration, from the initial micron-scale to the current few nanometers.
Paul C. Uzoma +4 more
doaj +1 more source
Fabrication of the X-Ray Mask using the Silicon Dry Etching
Journal of Advanced Mechanical Design, Systems, and Manufacturing, 2008 The X-ray lithography of uses synchrotron radiation is one of the microprocessing structure fabrication technology. In X-ray lithography, precision of the fabricated structure is influenced by precision of the X-ray mask considerably. Conventionally, the
Hiroshi TSUJII +5 more
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Dependence of magnetic domain patterns on plasma-induced differential oxidation of CoPd thin films [PDF]
, 2021 We demonstrate the evolution of the micro-patterned magnetic domains in CoPd thin films pretreated with e-beam lithography and O2 plasma. During the days-long oxidation, significantly different behaviors of the patterned magnetic domains under magnetization reversal are observed via magneto-optic Kerr effect microscopy on different days.
arxiv +1 more source
Frontiers in Materials, 2021 Mesoporous materials feature ordered tailored structures with uniform pore sizes and highly accessible surface areas, making them an ideal host for functional organic molecules or nanoparticles for analytical and sensing applications.
Benedetta Marmiroli +6 more
doaj +1 more source
npj Flexible Electronics, 2023 The incorporation of interface passivation structures in ultrathin Cu(In,Ga)Se2 based solar cells is shown. The fabrication used an industry scalable lithography technique—nanoimprint lithography (NIL)—for a 15 × 15 cm2 dielectric layer patterning ...
T. S. Lopes +23 more
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