Results 21 to 30 of about 9,708 (287)
Trapezoid-kinoform zone plate lens – a solution for efficient focusing in hard X-ray optics
X-ray microscopes are powerful tools in the nano-inspection of materials owing to their ultra-high resolution at the molecular level. However, the focusing efficiency of binary zone plate lenses as key components in such probes is merely 5% in practice ...
Xujie Tong+9 more
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High-throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography
Fresnel zone plates (FZP) are diffractive photonic devices used for high-resolution imaging and lithography at short wavelengths. Their fabrication requires nano-machining capabilities with exceptional precision and strict tolerances such as those ...
Kahraman Keskinbora+5 more
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Extreme Ultraviolet Radiation Sources from Dense Plasmas
The concept of dense and hot plasmas can be used to build up powerful and brilliant radiation sources in the soft X-ray and extreme ultraviolet spectral range.
Klaus Bergmann
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Microfabrication of Ni-Fe Mold Insert via Hard X-ray Lithography and Electroforming Process
In this research, a Ni-Fe mold insert for the efficient replication of high aspect-ratio microstructure arrays was fabricated via hard X-ray lithography and an electroforming process.
Jae Man Park+7 more
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In the last 20 years, requirements for x-ray lithography, space technology and ICF process diagnosis, the x-ray imaging technology has been developed.
Lingling Zhao, Knepper Jon
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The nanoimprinting of polymer solar cells via soft lithography is an attractive approach for enhancing light absorption in the active layer. Many efficient polymer solar cells utilize a high boiling point solvent additive such as 1,8-diiodooctane (DIO ...
Chao Wang+3 more
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Fabrication of Spiral Micro Coil Lines for Electromagnetic Actuators
With the recent progress in downsizing and the sophistication of various industrial products, the need for more compact actuators is increasing. Actuators account for the larger percentage of volume and weight of a product compared with other parts and ...
Masaru SETOMOTO+4 more
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The Mo/Si multilayer mirror has been widely used in EUV astronomy, lithography, microscopy and other fields because of its high reflectivity at the wavelength around 13.5 nm.
Xiangyue Liu+8 more
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Non‐Destructive X‐Ray Imaging of Patterned Delta‐Layer Devices in Silicon
The progress of miniaturization in integrated electronics has led to atomic and nanometer‐sized dopant devices in silicon. Such structures can be fabricated routinely by hydrogen resist lithography, using various dopants such as P and As.
Nicolò D'Anna+13 more
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Tunable atomic force microscopy bias lithography on electron beam induced carbonaceous platforms
Tunable local electrochemical and physical modifications on the carbonaceous platforms are achieved using Atomic force microscope (AFM) bias lithography.
Narendra Kurra
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