Results 291 to 300 of about 53,277 (339)

X-ray lithography for VLSI

Proceedings of the IEEE, 1983
In order for any lithography to become the preferred technique for the production of very large scale integrated circuit (VLSI) devices, the technique will have to 1) achieve the required resolution and registration and 2) become more cost effective in this capacity for large volume production than its competitors.
B.B. Triplett, R.F. Hollman
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Rethinking X-ray lithography

IEEE Spectrum, 1992
A viable alternative to synchrotron-based fabrication lines is discussed. These are collimated point X-ray sources that will cost a fraction of the price of synchrotrons. The two basic configurations for X-ray lithography-proximity and projection-are explained.
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Prospects for x-ray lithography

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1992
The essentials of proximity x-ray lithography (XRL) have been established and successful alternative implementations have been demonstrated in academic and industrial laboratories worldwide. Results continue to show that XRL can provide simpler and more robust processes than optical or electron beam alternatives.
D. Fleming, J. R. Maldonado, M. Neisser
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Synchrotrom radiation X-ray lithography

Nuclear Instruments and Methods in Physics Research, 1984
Abstract X-ray lithography is a shadow printing technique which uses X-rays to transfer a pattern from a mask into a resist-coated wafer. Synchrotron radiation from a storage ring has advantages over the radiation from conventional X-ray sources for this purpose, since it is 2 to 4 orders of magnitude more intense and its natural collimation ...
R.P. Haelbich, J.P. Silverman, J.M. Warlaumont   +2 more
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X-Ray Lithography and Microscopy

1979
X-rays have considerably shorter wavelengths than visible light and offer, therefore, the potential of drastically improved resolution. However, due to the fact that all materials are absorbing and that all refractive indices are very close to one in the x-ray region, conventional lenses cannot be fabricated for x-rays and magnification and ...
Eberhard Spiller, Ralph Feder, David Sayre   +2 more
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X-ray lithography for microelectronics

Physica Scripta, 1996
The modern information revolution, which is transforming our societies so rapidly, is based upon silicon integrated circuits. The fabrication of these circuits utilizes the planar-fabrication process, the basic step of which is exposure of a radiation sensitive film, known as the resist, to a pattern of radiation.
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Status of x-ray lithography

1980 International Electron Devices Meeting, 1980
This paper will review some of the current approaches to x-ray lithography technology for device and circuit fabrication. Recent results in source, mask, process, and alignment research will be surveyed. A special emphasis will be placed on the differences in approach using full wafer, conventional source systems compared with those which are based on ...
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X-Ray Lithography

Extended Abstracts of the 1979 International Conference on Solid State Devices, 1979
Shin'ichi YAMAZAKI, Toa HAYASAKA
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Photolithography and X-ray Lithography

1984
Very intense technological efforts to increase the integration density of semiconductor devices have been made in the development of new and economical lithography methods for structures below 2 µm. The lithography methods now used for modern fabrication lines are optical projection systems in the wavelength range of 400 to 250 nm, based on high ...
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X-Ray Lithography

1991
William B. Glendinning, Franco Cerrina
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