Fabrication of x-ray masks using evaporated electron sensitive layers for back patterning of membranes [PDF]
, 2002 : A process aimed at fabricating proximity x-ray lithography masks is presented. In this technique, the Ta absorber layer is deposited and patterned on the back side of the membrane and nonspin-coated electron sensitive layers were used in order to ...
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Trapezoid-kinoform zone plate lens – a solution for efficient focusing in hard X-ray optics
Journal of Synchrotron Radiation, 2022 X-ray microscopes are powerful tools in the nano-inspection of materials owing to their ultra-high resolution at the molecular level. However, the focusing efficiency of binary zone plate lenses as key components in such probes is merely 5% in practice ...
Xujie Tong +9 more
doaj +1 more source
Focused Electron Beam Induced Processing, a Technology to Develop and Produce Miniaturized Electron-, IR, THz-, X-ray Sources, High Resolution Detectors and Sensors for IR-and X-ray Tomography [PDF]
, 2012 FEBIP –focused electron beam induced processing- is a novel technology which renders outstanding advantages compared to other miniaturization techniques, like electron beam lithography, deep X-ray lithography, or 3D construction by optical polymerization.
Koops, Hans W.P.
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Extreme Ultraviolet Radiation Sources from Dense Plasmas
Atoms, 2023 The concept of dense and hot plasmas can be used to build up powerful and brilliant radiation sources in the soft X-ray and extreme ultraviolet spectral range.
Klaus Bergmann
doaj +1 more source
X-ray verification of sol-gel resist shrinkage in substrate-conformal imprint lithography for a replicated blazed reflection grating [PDF]
, 2020 Surface-relief gratings fabricated through nanoimprint lithography (NIL) are prone to topographic distortion induced by resist shrinkage. Characterizing the impact of this effect on blazed diffraction efficiency is particularly important for applications in astrophysical spectroscopy at soft x-ray wavelengths ($\lambda \approx 0.5 - 5$~nm) that call ...
arxiv +1 more source
Fabrication of astronomical x-ray reflection gratings using thermally activated selective topography equilibration [PDF]
Journal of Vacuum Science and Technology B: Nanotechnology and
Microelectronics, volume 36 (2018), p. 06JA01, 2021 Thermally activated selective topography equilibration (TASTE) enables the creation of 3D structures in resist using grayscale electron-beam lithography followed by a thermal treatment to induce a selective polymer reflow. A blazed grating topography can be created by reflowing repeating staircase patterns in resist into wedge-like structures ...
arxiv +1 more source
High-throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography
Beilstein Journal of Nanotechnology, 2018 Fresnel zone plates (FZP) are diffractive photonic devices used for high-resolution imaging and lithography at short wavelengths. Their fabrication requires nano-machining capabilities with exceptional precision and strict tolerances such as those ...
Kahraman Keskinbora +5 more
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Microfabrication of Ni-Fe Mold Insert via Hard X-ray Lithography and Electroforming Process
Metals, 2020 In this research, a Ni-Fe mold insert for the efficient replication of high aspect-ratio microstructure arrays was fabricated via hard X-ray lithography and an electroforming process.
Jae Man Park +7 more
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Fabrication of High-Aspect Ratio Nanogratings for Phase-based X-ray Imaging [PDF]
, 2022 Diffractive optical elements such as periodic gratings are fundamental devices in X-ray imaging - a technique that medical, material science and security scans rely upon. Fabrication of such structures with high aspect ratios at the nanoscale creates opportunities to further advance such applications, especially in terms of relaxing X-ray source ...
arxiv +1 more source
Alignment System for X-Ray Lithography. [PDF]
, 1994 Among the various contenders for VLSI lithography below 0.1 $\mu$m, proximity x-ray printing is the most promising one and has been investigated for many years.
Zhou, Hao
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