Results 31 to 40 of about 53,277 (339)

Fabrication of Spiral Micro Coil Lines for Electromagnetic Actuators

Journal of Advanced Mechanical Design, Systems, and Manufacturing, 2008
With the recent progress in downsizing and the sophistication of various industrial products, the need for more compact actuators is increasing. Actuators account for the larger percentage of volume and weight of a product compared with other parts and ...
Masaru SETOMOTO, Yoshifumi MATSUMOTO, Shuhei YAMASHITA, Daiji NODA, Tadashi HATTORI   +4 more
doaj   +1 more source

Exploiting atomic layer deposition for fabricating sub-10 nm X-ray lenses

, 2018
Moving towards significantly smaller nanostructures, direct structuring techniques such as electron beam lithography approach fundamental limitations in feature size and aspect ratios.
Belkhou, Rachid, Bosgra, Jeroen, David, Christian, Döring, Florian, Fink, Rainer H., Guzenko, Vitaliy A., Kirk, Eugenie, Koch, Frieder, Meyer, Markus, Ornelas, Joshua L., Raabe, Jörg, Rösner, Benedikt, Stanescu, Stefan, Swaraj, Sufal, Watts, Benjamin   +14 more
core   +1 more source

Comparative Study on Microstructure of Mo/Si Multilayers Deposited on Large Curved Mirror with and without the Shadow Mask

Micromachines, 2023
The Mo/Si multilayer mirror has been widely used in EUV astronomy, lithography, microscopy and other fields because of its high reflectivity at the wavelength around 13.5 nm.
Xiangyue Liu, Zhe Zhang, Hongxuan Song, Qiushi Huang, Tonglin Huo, Hongjun Zhou, Runze Qi, Zhong Zhang, Zhanshan Wang   +8 more
doaj   +1 more source

Self-organization on surfaces: foreword [PDF]

, 2005
After decades of work, the growth of continuous thin films, i.e., two-dimensional structures, is progressively becoming a technological issue more than a field of fundamental research.
Arakawa, Asada, Bardottia, Bauer, Berger, Brune, Brune, Bruno, Burton, Capellinia, Chaudret, Cheng, Eymery, Frank, Fruchart, Gambardella, Gambardella, Gambardella, Gradmann, Guinier, Henry, Lalatonne, Liz-Marzán, Mariette, Metzger, Michler, Müller, Néel, Pierre-Louis, Pileni, Pimpinelli, Reithmaier, Rousset, Rousset, Schmidbauer, Schülli, Shchukin, Springholz, Springholz, Stangl, Stranski, Teichert, Tersoff, Toneguzzo, Tromp, Volmer, Weller, Xie, Yu, Zangwill   +49 more
core   +3 more sources

Tunable atomic force microscopy bias lithography on electron beam induced carbonaceous platforms

AIP Advances, 2013
Tunable local electrochemical and physical modifications on the carbonaceous platforms are achieved using Atomic force microscope (AFM) bias lithography.
Narendra Kurra
doaj   +1 more source

Development of Ground-testable Phase Fresnel Lenses in Silicon

, 2006
Diffractive/refractive optics, such as Phase Fresnel Lenses (PFL's), offer the potential to achieve excellent imaging performance in the x-ray and gamma-ray photon regimes.
B. Morgan, B. Morgan, Brian Morgan, D. Jerius, G. Skinner, G. Skinner, Gerry Skinner, H. Dammann, J. Kirz, John Krizmanic, Keith Gendreau, Neil Gehrels, Reza Ghodssi, Robert Streitmatter, Zaven Arzoumanian   +14 more
core   +1 more source

Ion beam lithography for Fresnel zone plates in X-ray microscopy

, 2013
Fresnel Zone Plates (FZP) are to date very successful focusing optics for X-rays. Established methods of fabrication are rather complex and based on electron beam lithography (EBL).
Achim Nadzeyka, Baciocchi, Baglin, Bionta, Bourzac, Bruchhaus, Chao, Chao, Cho, Corinne Grévent, Eberhard Goering, Falcone, Fuchs, Gelb, Gerd Schneider, Gierak, Gierak, Gisela Schütz, Guilherme, Hanfei Yan, Ice, Ilinski, Joan Vila-Comamala, Joy, Kahraman Keskinbora, Kaulich, Kuyumchyan, Lloyd Peto, Mangles, Markus Weigand, Maser, Mayer, Michael Bechtel, Nachtrab, Nadzeyka, Popmintchev, Rehbein, Rolf Follath, Rudolph, Sakdinawat, Stefan Rehbein, Stiglian, Surpi, Tseng, Vila-Comamala, Vladimirsky, Wu, Yan, Yi, Zschech   +49 more
core   +1 more source

Quantum Emitters in Hexagonal Boron Nitride: Principles, Engineering and Applications

Advanced Functional Materials, EarlyView.
Quantum emitters in hexagonal boron nitride have emerged as a promising candidate for quantum information science. This review examines the fundamentals of these quantum emitters, including their level structures, defect engineering, and their possible chemical structures.
Thi Ngoc Anh Mai, Md Shakhawath Hossain, Nhat Minh Nguyen, Yongliang Chen, Chaohao Chen, Xiaoxue Xu, Quang Thang Trinh, Toan Dinh, Toan Trong Tran   +8 more
wiley   +1 more source

X‐Ray Multibeam Ptychography at up to 20 keV: Nano‐Lithography Enhances X‐Ray Nano‐Imaging

Advanced Science
Hard X‐rays are needed for non‐destructive nano‐imaging of solid matter. Synchrotron radiation facilities (SRF) provide the highest‐quality images with single‐digit nm resolution using advanced techniques such as X‐ray ptychography.
Tang Li, Maik Kahnt, Thomas L. Sheppard, Runqing Yang, Ken V. Falch, Roman Zvagelsky, Pablo Villanueva‐Perez, Martin Wegener, Mikhail Lyubomirskiy   +8 more
doaj   +1 more source

Non‐Destructive X‐Ray Imaging of Patterned Delta‐Layer Devices in Silicon

Advanced Electronic Materials, 2023
The progress of miniaturization in integrated electronics has led to atomic and nanometer‐sized dopant devices in silicon. Such structures can be fabricated routinely by hydrogen resist lithography, using various dopants such as P and As.
Nicolò D'Anna, Dario Ferreira Sanchez, Guy Matmon, Jamie Bragg, Procopios C. Constantinou, Taylor J.Z. Stock, Sarah Fearn, Steven R. Schofield, Neil J. Curson, Marek Bartkowiak, Y. Soh, Daniel Grolimund, Simon Gerber, Gabriel Aeppli   +13 more
doaj   +1 more source