Results 41 to 50 of about 113,972 (245)
The nanoimprinting of polymer solar cells via soft lithography is an attractive approach for enhancing light absorption in the active layer. Many efficient polymer solar cells utilize a high boiling point solvent additive such as 1,8-diiodooctane (DIO ...
Chao Wang+3 more
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A stacked prism lens concept for next generation hard X-ray telescopes [PDF]
Effective collecting area, angular resolution, field of view and energy response are fundamental attributes of X-ray telescopes. The performance of state-of-the-art telescopes is currently restricted by Wolter optics, especially for hard X-rays. In this paper, we report the development of a new approach - the Stacked Prism Lens, which is lightweight ...
arxiv +1 more source
In the last 20 years, requirements for x-ray lithography, space technology and ICF process diagnosis, the x-ray imaging technology has been developed.
Lingling Zhao, Knepper Jon
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EUV/Soft X-Ray Interference Lithography [PDF]
Based on the coherent radiation from an undulator source, extreme UV interference lithography (EUV-IL) technology is considered as the leading candidate for future nodes of high-volume semiconductor manufacturing. The throughput of this technique is much
Wu, Yanqing, Yang, Shumin
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Generating Electron Beam Lithography Write Parameters from the FORTIS Holographic Grating Solution [PDF]
The Far-UV Off Rowland-circle Telescope for Imaging and Spectroscopy (FORTIS) has been successful in maturing technologies for carrying out multi-object spectroscopy in the far-UV, including: the successful implementation of the Next Generation of Microshutter Arrays; large-area microchannel plate detectors; and an aspheric "dual-order" holographically
arxiv +1 more source
Fabrication of Spiral Micro Coil Lines for Electromagnetic Actuators
With the recent progress in downsizing and the sophistication of various industrial products, the need for more compact actuators is increasing. Actuators account for the larger percentage of volume and weight of a product compared with other parts and ...
Masaru SETOMOTO+4 more
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The Mo/Si multilayer mirror has been widely used in EUV astronomy, lithography, microscopy and other fields because of its high reflectivity at the wavelength around 13.5 nm.
Xiangyue Liu+8 more
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Limiting Spectral Resolution of a Reflection Grating Made via Electron-Beam Lithography [PDF]
Gratings enable dispersive spectroscopy from the X-ray to the optical, and feature prominently in proposed flagships and SmallSats alike. The exacting performance requirements of these future missions necessitate assessing whether the present state-of-the-art in grating manufacture will limit spectrometer performance. In this work, we manufacture a 1.5
arxiv +1 more source
Non‐Destructive X‐Ray Imaging of Patterned Delta‐Layer Devices in Silicon
The progress of miniaturization in integrated electronics has led to atomic and nanometer‐sized dopant devices in silicon. Such structures can be fabricated routinely by hydrogen resist lithography, using various dopants such as P and As.
Nicolò D'Anna+13 more
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A classical linear theory is used to compare large synchrotron sources to a rf linear accelerator employed as a VUV/X-ray source. Comparisons are made on a per-pulse basis.
McCrea, Edward, Schill, Robert A., Jr.
core +1 more source