Structural investigation of uniform ensembles of self-catalyzed GaAs nanowires fabricated by a lithography-free technique [PDF]
, 2017 Structural analysis of self-catalyzed GaAs nanowires (NWs) grown on lithography-free oxide patterns is described with insight on their growth kinetics. Statistical analysis of templates and NWs in different phases of the growth reveals extremely high dimensional uniformity due to a combination of uniform nucleation sites, lack of secondary nucleation ...
arxiv +1 more source
Synchrotron-based X-ray microimaging facility for biomedical research
Journal of Radiation and Cancer Research, 2017 This paper reports the development of an X-ray imaging facility on Indus-2, synchrotron source at RRCAT, India and its potential applications in biomedical imaging. Indus-2 is country's first third-generation synchrotron source operating at energy of 2.5
Ashish Kumar Agrawal +4 more
doaj +1 more source
Ptychographic characterization of polymer compound refractive lenses manufactured by additive technology [PDF]
, 2018 The recent success in the development of high precision printing techniques allows one to manufacture free-standing polymer structures of high quality. Two-photon polymerization lithography is a mask-less technique with down to 100 {\mu}m resolution that provides full geometric freedom.
arxiv +1 more source
Extreme Ultraviolet (EUV) Sources for Lithography based on Synchrotron Radiation [PDF]
, 2001 The study presented here was initiated by a discussion to investigate the possibility of using synchrotron radiation as a source for the Next Generation Lithography (NGL) based on the EUV-concept (Extreme Ultra-Violet; here 13.5 nm or 11.3 nm radiation ...
Andrea Doria +31 more
core +3 more sources
Distortion analysis of crystalline and locally quasicrystalline 2D photonic structures with GISAXS [PDF]
J. Appl. Cryst. 52, 322-331. (2019), 2019 In this study, grazing incidence small-angle X-ray scattering (GISAXS) is used to collect statistical information on dimensional parameters in an area of 20 mm x 15 mm on photonic structures produced by nanoimprint lithography. The photonic structures are composed of crystalline and locally quasicrystalline two-dimensional patterns with structure sizes
arxiv +1 more source
Scaling of the coercivity with the geometrical parameters in epitaxial Fe antidot arrays [PDF]
, 2012 We studied a series of square lattice antidot arrays, with diameter and lattice parameter from hundreds of nanometers to some microns, fabricated using two lithography techniques in epitaxial Fe(001) films.
Cebollada Baratas, Federico Alberto +5 more
core +2 more sources
Submicrosecond X-ray lithography
Electronics Letters, 1978 X-rays from laser-heated plasmas were used to replicate features as fine as 750 nm in the positive resist polybutene-1-sulfone (p.b.s.). The measured sensitivities of p.b.s. to pulsed and d.c. X-rays (≈ 109 ratio in exposure rate) are similar (no reciprocity loss). Laser-plasma X-rays produced only small (0.25 V) flat-band shifts in m.o.s.
D. J. Nagel +4 more
openaire +2 more sources
State-of-the-art Nanofabrication in Catalysis
CHIMIA, 2017 We present recent developments in top–down nanofabrication that have found application in catalysis research. To unravel the complexity of catalytic systems, the design and use of models with control of size, morphology, shape and inter-particle
Waiz Karim +5 more
doaj +1 more source
Sub-$\mu$ structured Lotus Surfaces Manufacturing [PDF]
, 2008 Sub-micro structured surfaces allow modifying the behavior of polymer films or components. Especially in micro fluidics a lotus-like characteristic is requested for many applications.
Fugier, Pascal +9 more
core +3 more sources
Extraordinary Transmission in the UV Range from Sub-wavelength Slits on Semiconductors [PDF]
, 2009 In this paper we describe a way to achieve the extraordinary transmission regime from sub-wavelength slits carved on semiconductor substrates. Unlike metals, the dielectric permittivity of typical semiconductors like GaAs or GaP is negative beginning in the extreme UV range (lambda <= 270nm).
arxiv +1 more source