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Pattern‐Aware Intelligence Enables Nondestructive, Rapid Quantification of High‐Aspect‐Ratio Silicon Etching

open access: yesAdvanced Science, EarlyView.
Pattern‐dependent etching is converted into a physical prior for intelligent reconstruction of high‐aspect‐ratio silicon structures. Combining YOLO‐Pose feature extraction with a topography network, the framework retrieves depth, sidewall angle, and scallop texture from minimal destructive observations, enabling accurate cross‐scale metrology and near ...
Shuyan He   +4 more
wiley   +1 more source

Design and Implementation of a Quartz Cilia MEMS Vector Hydrophone. [PDF]

open access: yesMicromachines (Basel)
Ren Z   +5 more
europepmc   +1 more source
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Ubiquitous Acoustic Sensing on Commodity IoT Devices: A Survey

IEEE Communications Surveys and Tutorials, 2022
Jun Luo, Chao Cai, Rong Zheng
exaly  

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