Results 231 to 240 of about 280,313 (347)

Using a Heavy Inert Diffusion Additive for Superconformal Atomic Layer Deposition. [PDF]

J Phys Chem Lett
Choolakkal AH, Mpofu P, Niiranen P, Birch J, Pedersen H.   +4 more
europepmc   +1 more source

Pentacene-Thin Film Transistors with ZrO[sub 2] Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition [PDF]

, 2007
Sun Jin Yun, Jae Bon Koo, Jung Wook Lim, Seong Hyun Kim   +3 more
openalex   +1 more source

Versatile Green Transfer of Magnetoelectronics with Loss‐Free Performance and High Adhesion for Interactive Electronics

Advanced Functional Materials, EarlyView.
An environmentally friendly transfer printing method of nm‐thick giant magnetoresistive (GMR) sensors is demonstrated. This method, relying on water and biocompatible polyvinyl alcohol (PVA) polymer without the need of complex treatments, allows transferring thin films to a wide range of biological, organic, and inorganic substrates.
Olha Bezsmertna, Rui Xu, Eduardo Sergio Oliveros Mata, Stanislav Avdoshenko, Clemens Voigt, Sindy Mosch, Mykola Vinnichenko, Denys Makarov   +7 more
wiley   +1 more source

Application of ultra-thin aluminum oxide etch mask made by atomic layer deposition technique [PDF]

, 2007
Kestutis Grigoras, Lauri Sainiemi, Jouni Tiilikainen, Antti Säynätjoki, V-M. Airaksinen, Sami Franssila   +5 more
openalex   +1 more source

Understanding and Addressing the Performance Asymmetry Issue in Semitransparent Laminated Organic Photovoltaic Devices

Advanced Functional Materials, EarlyView.
This work addresses the challenge of current–voltage asymmetry in scalable laminated semitransparent organic photovoltaics (OPVs) for indoor applications. Vertical stratification of materials is shown to create an energy barrier, leading to performance differences under different illumination directions.
Gulzada Beket, Anton Zubayer, Leonie Pap, Huagui Lai, Samiran Bairagi, Nakul Jain, Jochen Stahn, Fan Fu, Kenneth Järrendahl, Fredrik Eriksson, Xabier Rodríguez‐Martínez, Olle Inganäs, Uli Würfel, Thomas Österberg, Jonas Bergqvist, Feng Gao   +15 more
wiley   +1 more source

Pulsed Laser and Atomic Layer Deposition of CMOS-Compatible Vanadium Dioxide: Enabling Ultrathin Phase-Change Films. [PDF]

ACS Appl Electron Mater
Varini A, Masserey C, Conti V, Saadat Somaehsofla Z, Ansari E, Stolichnov I, Ionescu AM.   +6 more
europepmc   +1 more source

Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition [PDF]

, 2007
John Hoang, T. T. Van, Monica Sawkar-Mathur, Bram Hoex, M. C. M. van de Sanden, W. M. M. Kessels, Roman Ostroumov, K. L. Wang, J. Bargar, Jane P. Chang   +9 more
openalex   +1 more source

MnI‐Functionalized Covalent Organic Framework as Efficient Electrocatalyst for CO2 Reduction in a Catholyte‐Free Zero‐Gap Electrolyzer

Advanced Functional Materials, EarlyView.
This work demonstrates the successful integration of a phenanthroline‐based 2D COF with MnI catalytic sites into a catholyte‐free membrane‐electrode‐assembly cell for CO2 electroreduction. The crystalline COF actively suppresses Mn⁰–Mn⁰ dimerization, achieving a turnover frequency of 617 h⁻¹ at 2.8 V (full‐cell potential), and enabling stable operation.
Laura Spies, Marcos Eduardo G. Carmo, Gonçalves J. Marrenjo, Stephan Reuther, Patrick Ganswindt, Antonio Otavio T. Patrocinio, Thomas Bein, Osmando F. Lopes, Jenny Schneider   +8 more
wiley   +1 more source

Al1‐xScxN‐Based Ferroelectric Domain‐Wall Memristors

Advanced Functional Materials, EarlyView.
(a) Conductive atomic force microscopy (CAFM) image of the initial state bidomain structure of the Al0.85Sc0.15N (a) showing an enhanced conductivity of the head‐to‐head domain boundary. (b) CAFM image of the same area after application of several −65 V, 1 s voltage pulses showing lower conductivity of the generated tail‐to‐tail domain walls.
Haidong Lu, Georg Schönweger, Niklas Wolff, Ziming Ding, Adrian Petraru, Isabel Streicher, Hermann Kohlstedt, Christian Kübel, Stefano Leone, Lorenz Kienle, Simon Fichtner, Alexei Gruverman   +11 more
wiley   +1 more source

Re-Evaluating the Stability of Al₂O₃ Barriers Prepared by Atomic Layer Deposition under Electrochemical Conditions. [PDF]

ACS Appl Mater Interfaces
Bagnall AJ, Zhao Z, Cheah MH, Sekretareva A.   +3 more
europepmc   +1 more source