Results 241 to 250 of about 2,842,309 (291)
Synthesis of heteroleptic [Sr(ddemap)(tmhd)]<sub>2</sub> and its use in atomic layer deposition of low carbon SrO thin films. [PDF]
RSC AdvLee Y +11 more
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DFT mechanistic insights into the atomic layer deposition of β-Ga<sub>2</sub>O<sub>3</sub>. [PDF]
RSC AdvYang J +7 more
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Boosting the Mechanical Strength and Photocatalytic Activity of 3D-Printed Titania Aerogels by Atomic Layer Deposition and Heat Treatment. [PDF]
ACS Mater AuSchmidt MM +7 more
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Semiconductor Science and Technology, 2012
The growth method of atomic layer deposition (ALD) was introduced in Finland by Suntola under the name of atomic layer epitaxy (ALE). The method was originally used for deposition of thin films of sulphides (ZnS, CaS, SrS) activated with manganese or rare-earth ions.
Antonio Aliano +43 more
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The growth method of atomic layer deposition (ALD) was introduced in Finland by Suntola under the name of atomic layer epitaxy (ALE). The method was originally used for deposition of thin films of sulphides (ZnS, CaS, SrS) activated with manganese or rare-earth ions.
Antonio Aliano +43 more
+4 more sources
JOT Journal für Oberflächentechnik, 2011
A method of depositing a material on a substrate using an atomic layer deposition process, wherein the deposition process comprises a first deposition step, a second deposition step subsequent to the first deposition step, and a delay of at least one minute between the first deposition step and the second deposition step. Each deposition step comprises
Bernd Szyszka, Hugo Tholense
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A method of depositing a material on a substrate using an atomic layer deposition process, wherein the deposition process comprises a first deposition step, a second deposition step subsequent to the first deposition step, and a delay of at least one minute between the first deposition step and the second deposition step. Each deposition step comprises
Bernd Szyszka, Hugo Tholense
openaire +2 more sources
2001 6th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.01EX443), 2002
The current status of ALD technology will be reviewed. In addition, engineered nanolaminate or alloy films of both dielectric and metal materials will be demonstrated and their applications discussed.
Mikko Ritala, Markku Leskelä
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The current status of ALD technology will be reviewed. In addition, engineered nanolaminate or alloy films of both dielectric and metal materials will be demonstrated and their applications discussed.
Mikko Ritala, Markku Leskelä
openaire +2 more sources
2017
Over the course of this semester understanding of the theory and application of Atomic Layer Deposition [ALD] was pursued, all in preparation for further research focusing on the charge carrier type, density, and mobility in ultrathin film ZnO. At the beginning of the semester a wide array of scientific articles was read in order to build up a basic ...
Pannock, Daniel, Banerjee, Parag
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Over the course of this semester understanding of the theory and application of Atomic Layer Deposition [ALD] was pursued, all in preparation for further research focusing on the charge carrier type, density, and mobility in ultrathin film ZnO. At the beginning of the semester a wide array of scientific articles was read in order to build up a basic ...
Pannock, Daniel, Banerjee, Parag
openaire +2 more sources
Novel materials by atomic layer deposition and molecular layer deposition
MRS Bulletin, 2011Abstract
Markku Leskelä +2 more
openaire +1 more source