Results 1 to 10 of about 23,511 (291)

Patterned deposition by plasma enhanced spatial atomic layer deposition

Physica Status Solidi - Rapid Research Letters, 2011
AbstractAn atmospheric pressure plasma enhanced atomic layer deposition reactor has been developed, to deposit Al2O3 films from trimethyl aluminum and an He/O2 plasma. This technique can be used for 2D patterned deposition in a single in‐line process by making use of switched localized plasma sources.
Paul Poodt, F Roozeboom
exaly   +5 more sources

Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide [PDF]

Nanoscale Research Letters, 2019
In this work, we report the successful growth of high-quality SiO2 films by low-temperature plasma-enhanced atomic layer deposition using an oxidant which is compatible with moisture/oxygen sensitive materials.
Zhen Zhu, Perttu Sippola, Oili M. E. Ylivaara, Chiara Modanese, Marisa Di Sabatino, Kenichiro Mizohata, Saoussen Merdes, Harri Lipsanen, Hele Savin   +8 more
doaj   +4 more sources

Effect of atomic layer annealing in plasma-enhanced atomic layer deposition of aluminum nitride on silicon

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 2023
The effect of adding an atomic layer annealing step to a plasma-enhanced atomic layer deposition process of aluminum nitride was investigated with commonly available materials. The refractive index, crystallinity, stoichiometry, and impurity concentrations were studied from films grown from trimethylaluminum and ammonia precursors at 300°C on Si(111 ...
Heli Seppänen, Igor Prozheev, Christoffer Kauppinen   +2 more
exaly   +5 more sources

Atomistic Simulations of Plasma-Enhanced Atomic Layer Deposition. [PDF]

Materials (Basel), 2019
Plasma-enhanced atomic layer deposition (PEALD) is a widely used, powerful layer-by-layer coating technology. Here, we present an atomistic simulation scheme for PEALD processes, combining the Monte Carlo deposition algorithm and structure relaxation using molecular dynamics.
Becker M, Sierka M.
europepmc   +4 more sources

Compact Ga₂O₃ Thin Films Deposited by Plasma Enhanced Atomic Layer Deposition at Low Temperature [PDF]

Nanomaterials, 2022
Amorphous Gallium oxide (Ga2O3) thin films were grown by plasma-enhanced atomic layer deposition using O2 plasma as reactant and trimethylgallium as a gallium source.
Yue Yang, Xiao-Ying Zhang, Chen Wang, Fang-Bin Ren, Run-Feng Zhu, Chia-Hsun Hsu, Wan-Yu Wu, Dong-Sing Wuu, Peng Gao, Yu-Jiao Ruan, Shui-Yang Lien, Wen-Zhang Zhu   +11 more
doaj   +2 more sources

Plasma enhanced atomic layer deposition on powders [PDF]

ECS Transactions, 2014
During the last decades atomic layer deposition (ALD) gained a lot of interest for coating three dimensional structures with ultrathin conformal films. Although mainly applied on silicon wafers in microelectronics and solar, experimental efforts confirmed the technique is also applicable to powders and particles.
Rampelberg, Geert, Detavernier, Christophe   +1 more
core   +4 more sources

Dataset for TiN Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(dimethylamino)titanium (TDMAT) and Titanium Tetrachloride (TiCl4) Precursor [PDF]

Data in Brief, 2020
A dataset in this report is regarding an article “Ultrathin Effective TiN Protective Films Prepared by Plasma-Enhanced Atomic Layer Deposition for High Performance Metallic Bipolar Plates of Polymer Electrolyte Membrane Fuel Cells” [1].
Woo-Jae Lee, Eun-Young Yun, Han-Bo-Ram Lee, Suck Won Hong, Se-Hun Kwon   +4 more
doaj   +2 more sources

Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2021
In this work, we focus on the development of topographically selective deposition (TSD) leading to local deposition on the vertical sidewalls of 3D structures. A proof of concept is provided for the TSD of Ta2O5. The TSD process relies on plasma-enhanced atomic layer deposition (PEALD) alternating with quasi-atomic layer etching (ALE).
Jaffal, Moustapha, Yeghoyan, Taguhi, Lefèvre, Gauthier, Gassilloud, Rémy, Possémé, Nicolas, Vallée, Christophe, Bonvalot, Marceline   +6 more
openaire   +4 more sources

Plasma-Enhanced Atomic Layer Deposition of TiN Thin Films as an Effective Se Diffusion Barrier for CIGS Solar Cells [PDF]

Nanomaterials, 2021
Plasma-enhanced atomic layer deposition (PEALD) of TiN thin films were investigated as an effective Se diffusion barrier layer for Cu (In, Ga) Se2 (CIGS) solar cells.
Hyun-Jae Woo, Woo-Jae Lee, Eun-Kyong Koh, Seung Il Jang, Shinho Kim, Hyoungseok Moon, Se-Hun Kwon   +6 more
doaj   +2 more sources

Plasma-Enhanced Atomic Layer Deposition of AlF₃ Antireflective Coatings via Pulse-Time Control of Fluorine Radical Reactions [PDF]

Nanomaterials
Plasma-enhanced atomic layer deposition (PEALD) is used to grow high-quality aluminum fluoride (AlF3) antireflective coatings via a safe, HF-free route using trimethylaluminum and SF6 plasma.
Jing Zhang, Zhixuan Zhang, Chia-Hsun Hsu, Peng Gao, Yu Qiu, Yuqi Lin, Shui-Yang Lien   +6 more
doaj   +2 more sources