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Recent Progress of Atomic Layer Technology in Spintronics: Mechanism, Materials and Prospects
The atomic layer technique is generating a lot of excitement and study due to its profound physics and enormous potential in device fabrication. This article reviews current developments in atomic layer technology for spintronics, including atomic layer ...
Yuanlu Tsai, Zhiteng Li, Shaojie Hu
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Fabrication of β-Ga2O3 Nanotubes via Sacrificial GaSb-Nanowire Templates
β-Ga2O3 nanostructures are attractive wide-band-gap semiconductor materials as they exhibit promising photoelectric properties and potential applications.
Lei Shangguan +9 more
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Atomic Layer Deposition of Nanolayered Carbon Films
In this paper, carbon thin films were grown using the plasma-enhanced atomic layer deposition (PE-ALD). Methane (CH4) was used as the carbon precursor to grow the carbon thin film.
Zhigang Xiao +2 more
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Plasma-Assisted Nanofabrication: The Potential and Challenges in Atomic Layer Deposition and Etching
The growing need for increasingly miniaturized devices has placed high importance and demands on nanofabrication technologies with high-quality, low temperatures, and low-cost techniques.
William Chiappim +9 more
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Atomic layer deposition of Al2O3 process emissions† [PDF]
The ALD process emissions and the associated chemical reaction mechanism in the ALD of the Al2O3 system are studied and reported. In gaseous emissions, 3.22 vol% of CH4 and 6.01 × 10−2 vol% of C2H6 are found.
Lulu Ma +3 more
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Atomic Layer Deposition of Antibacterial Nanocoatings: A Review
In recent years, antibacterial coatings have become an important approach in the global fight against bacterial pathogens. Developments in materials science, chemistry, and biochemistry have led to a plethora of materials and chemical compounds that have
Denis Nazarov +4 more
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The use of computational modelling and simulation methodologies has grown in recent years as researchers try to understand the atomic layer deposition (ALD) process and create new microstructures and nanostructures.
Sibanda David +2 more
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Multiferroic/Polymer Flexible Structures Obtained by Atomic Layer Deposition
The paper considers how a film of bismuth ferrite BiFeO3 (BFO) is formed on a polymeric flexible polyimide substrate at low temperature ALD (250 °C). Two samples of BFO/Polyimide with different thicknesses (42 nm, 77 nm) were studied.
Shikhgasan Ramazanov +5 more
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Plasma-Assisted Atomic Layer Deposition of IrO2 for Neuroelectronics
In vitro and in vivo stimulation and recording of neuron action potential is currently achieved with microelectrode arrays, either in planar or 3D geometries, adopting different materials and strategies. IrO2 is a conductive oxide known for its excellent
Valerio Di Palma +5 more
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Development and Prospect of Process Models and Simulation Methods for Atomic Layer Deposition
Thin film deposition is one of the most important processes in IC manufacturing. In this paper, several typical models and numerical simulation methods for thin film deposition and atomic layer deposition are introduced. Several modeling methods based on
Lei Qu +7 more
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