Results 41 to 50 of about 2,842,309 (291)

Metastasis on pause: How dormant tumor cells stay hidden within the tumor microenvironment and evade immune surveillance

Molecular Oncology, EarlyView.
Dormant cancer cells can hide in distant organs for years, evading treatment and the immune system. This review highlights how signals from the surrounding tissue and immune environment keep these cells inactive or trigger their reawakening. Understanding these mechanisms may help develop therapies to eliminate or control dormant cells and prevent ...
Kanishka Tiwary, Jose Javier Bravo‐Cordero   +1 more
wiley   +1 more source

Atomic-Scale Structure and its Impact on Chemical Properties of Aluminum Oxide Layers Prepared by Atomic Layer Deposition on Silica [PDF]

, 2021
We report the atomic-scale structure of alumina layers obtained by atomic layer deposition (ALD) of trimethylaluminium onto partially dehydroxylated silica.
Pierre, Florian, César, Leroy, Christoph, Müller, Alexey, Fedorov, Anne, Lesage, Monu, Kaushik, Christophe, Copéret, Zixuan, Chen, Elena, Willinger, Franck, Fayon, David, Gajan, Dominique, Massiot   +11 more
core   +1 more source

Unraveling the epigenetic code in cancer cell–tumor microenvironment crosstalk

Molecular Oncology, EarlyView.
Epigenetic regulation is a key driver of cancer development and progression. Diverse epigenetic alterations in cancer cells and components of the tumor microenvironment (TME) orchestrate their communication through multiple mechanisms. We discuss how the epigenetic code coordinates bidirectional cancer cell–TME crosstalk to promote cancer progression ...
Ji Hoon Park, Mi‐Young Kim
wiley   +1 more source

Atomic layer etching : what can we learn from atomic layer deposition? [PDF]

, 2015
Current trends in semiconductor device manufacturing impose extremely stringent requirements on nanoscale processing techniques, both in terms of accurately controlling material properties and in terms of precisely controlling nanometer dimensions.
Kessels, WMM Erwin, Roozeboom, F Fred, Knoops, H.C.M.; id_orcid, Faraz, T Tahsin, Roozeboom, F., Knoops, H.C.M., Knoops, HCM Harm, Kessels, W.M.M., Faraz, T.   +8 more
core   +3 more sources

Advances in atmospheric-pressure particle atomic layer deposition

Gongneng cailiao yu qijian xuebao
Atmospheric pressure particle atomic layer deposition (AP-PALD) shows promising potentials in the fields of energy and catalytic materials due to its ability in precisely modifying the surfaces of functional materials operated at atmospheric or near ...
Guanghui YAN, Gaoshan HUANG, Xueqiang LU, Xueqin ZUO, Dongdong MI, Guoxiang CHEN, Yi OUYANG, Xiangzhong CHEN, Zhihao BAO, Yongfeng MEI, Jianjun SHI   +10 more
doaj   +1 more source

Monitoring Surface Stoichiometry, Work Function and Valance Band of Tungsten Oxide (WO₃), Molybdenum Oxide (MoO₃) and Tin Oxide (SnO₂) Thin Films as a Function of Temperature and Oxygen Partial Pressure with Advanced Surface Sensitive Techniques for Chemical Sensing Applications

Proceedings, 2019
Atomic layer deposition (ALD) is a chemical vapor deposition (CVD) deposition method inwhich high-quality [...]
Engin Ciftyurek, Martin Wilken, David Zanders, Lukas Mai, Anjana Devi, Klaus D. Schierbaum   +5 more
doaj   +1 more source

Arginine methylation as a regulatory ratchet in cancer: From substrate selection to malignant‐state stabilization

Molecular Oncology, EarlyView.
Arginine methylation can be viewed as a persistence‐prone post‐translational modification regulated by a network of PRMTs. Competitive and compensatory interactions among PRMTs can redistribute methylation across substrate pools shaped by sequence, structural, spatial, and environmental layers, reinforcing RNA‐processing, chromatin, and signaling ...
So Hyun Kwon, Ji Min Lee
wiley   +1 more source

Area-Selective Deposition of Ruthenium by Combining Atomic Layer Deposition and Selective Etching [PDF]

, 2019
Area-Selective Deposition of Ruthenium by Combining Atomic Layer Deposition and Selective ...
Sonali N. Chopra (2011129), Kessels, Wilhelmus M.M., Agarwal, Sumit, Ekerdt, John G., Marcel A. Verheijen (1661299), Martijn F. J. Vos (5773643), Verheijen, Marcel A., Vos, Martijn F.J., Sumit Agarwal (494662), John G. Ekerdt (1313991), Wilhelmus M. M. Kessels (1365807), Chopra, Sonali N., Adriaan J. M. Mackus (1817290), Mackus, Adriaan J.M.   +13 more
core   +2 more sources

Atomic Layer Deposition of CeOx Nanoclusters on TiO2 [PDF]

, 2020
Titanium dioxide has a band-gap in the ultra violet region and there have been many efforts to shift light absorption to the visible region. In this regard, surface modification with metal oxide clusters has been used to promote band-gap reduction.
Ji, Liu, Michael, Nolan, J. Ruud van, Ommen, Saeed, Saedy, Rakshita, Verma   +4 more
core   +1 more source

Plasma-Enhanced Atomic Layer Deposition-Based Ferroelectric Field-Effect Transistors

IEEE Journal of the Electron Devices Society
The use of the plasma-enhanced atomic layer deposition (ALD) technique for the deposition of HfO2-based ferroelectrics has received attention in recent years primarily due to wake-up free operation.
Chinsung Park, Prasanna Venkat Ravindran, Dipjyoti Das, Priyankka Gundlapudi Ravikumar, Chengyang Zhang, Nashrah Afroze, Lance Fernandes, Yu Hsin Kuo, Jae Hur, Hang Chen, Mengkun Tian, Winston Chern, Shimeng Yu, Asif Islam Khan   +13 more
doaj   +1 more source