Results 61 to 70 of about 86,737 (303)

Thermodynamic Pathways of Nonequilibrium Solidification in Wire‐Arc Additive Manufacturing Fe‐Based Multicomponent Alloy Structures

Advanced Engineering Materials, EarlyView.
Geometry‐driven thermal behavior in wire‐arc additive manufacturing (WAAM) influences microstructural evolution during nonequilibrium solidification of a chemically complex Fe–Cr–Nb–W–Mo–C nanocomposite system. By comparing different deposits configurations, distinct entropy–cooling rate correlations, segregation, and carbide evolution are revealed ...
Blanca Palacios, Anthony Gonzalez, Aleksander Aleman, Tyler Dolmetsch, Tanaji Paul, Arvind Agarwal   +5 more
wiley   +1 more source

Composition‐Tuned Enhancement of the Anomalous Nernst Effect in FeCo–Pt Thin Films on Rigid and Flexible Substrates

Advanced Engineering Materials, EarlyView.
Disordered (Fe50Co50)1−xPtx thin films exhibit a pronounced anomalous Nernst effect (ANE) with a strong composition dependence on both rigid and flexible substrates. The transverse thermoelectric response peaks near 22.5 at.% Pt, accompanied by enhanced αxy/σxy scaling, thermal transport, and ANE sensitivity.
Mojtaba Mohammadi, Hiroyuki Awano, Kenji Tanabe   +2 more
wiley   +1 more source

Atomic Layer Deposition for Novel Dye-Sensitized Solar Cells

Herein we present the latest fabrication and characterization techniques for atomic layer deposition of Al2O3, ZnO, SnO2, Nb2O5, HfO2, Ga2O3 and TiO2 for research on dye-sensitized solar cell.
Stefik, M., Tetreault, N., Labouchere, P. P., Graetzel, M., Heiniger, L.-P., Ozin, G. A., Nazeeruddin, N. K., Arsenault, E.   +7 more
core   +1 more source

Area-Selective Deposition of Ruthenium by Combining Atomic Layer Deposition and Selective Etching [PDF]

, 2019
Area-Selective Deposition of Ruthenium by Combining Atomic Layer Deposition and Selective ...
Sonali N. Chopra (2011129), Kessels, Wilhelmus M.M., Agarwal, Sumit, Ekerdt, John G., Marcel A. Verheijen (1661299), Martijn F. J. Vos (5773643), Verheijen, Marcel A., Vos, Martijn F.J., Sumit Agarwal (494662), John G. Ekerdt (1313991), Wilhelmus M. M. Kessels (1365807), Chopra, Sonali N., Adriaan J. M. Mackus (1817290), Mackus, Adriaan J.M.   +13 more
core   +1 more source

Removing Oxide Layers and Retaining Oxide‐Free Steel Surfaces by Polishing in Oxygen‐Free Atmosphere

Advanced Engineering Materials, EarlyView.
In this study, the efficacy of wet mechanical polishing under an oxygen‐free atmosphere for deoxidation and the retention of an oxide‐free steel surface are elucidated using X‐ray photoelectron spectroscopy. The methodology proved successful; however, the results were highly dependent on the preparation of the solvents used to clean the samples after ...
Friedrich Bürger, Lienhard Wegewitz, Wolfgang Maus‐Friedrichs   +2 more
wiley   +1 more source

Atomic layer processing for Ångström-scale precision in 3D-integrated semiconductor manufacturing

International Journal of Extreme Manufacturing
For decades, conventional geometric scaling has driven performance improvements in the semiconductor industry. However, the continued reduction in technology nodes has increasingly become decoupled from simple dimensional shrinkage, instead reflecting ...
Hae Lin Yang, Min Chan Kim, Gi-Beom Park, Ji-Yeon Park, Hyein Park, Jihoon Shin, Jinho Ahn, Jin-Seong Park   +7 more
doaj   +1 more source

Al–Cu Composite Casting of Laser‐Deoxidized Copper: Bonding, Interfacial Chemistry, and Thermal Conductivity

Advanced Engineering Materials, EarlyView.
This study investigates laser‐based oxide removal of Cu inserts in oxygen‐free conditions and examines long‐term oxidation kinetics and surface chemistry under different atmospheres via X‐ray photoelectron spectroscopy. Al–Cu compound casting with differently oxidized surfaces is performed, and intermetallic phase formation, morphology, and thermal ...
Timon Steinhoff, Finn‐Lennard Janthur, Sascha Zimmermann, Sarah Seffer, Jörg Hermsdorf, René Gustus, Ludger Overmeyer, Wolfgang Maus‐Friedrichs, Hans Jürgen Maier, Christian Klose   +9 more
wiley   +1 more source

Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2011
Atomic layer deposition (ALD) is a technique capable of producing ultrathin conformal films with atomic level control over thickness. A major drawback of ALD is its low deposition rate, making ALD less attractive for applications that require high throughput processing.
Poodt, P.W.G., Cameron, D.C., Dickey, E., George, S.M., Kuznetsov, V., Parsons, G.N., Roozeboom, F., Sundaram, G., Vermeer, A.   +8 more
openaire   +3 more sources

Luminescent YbVO₄ by atomic layer deposition [PDF]

Dalton Transactions, 2017
Thin films of YbVO4 displaying UV to NIR down conversion have been deposited by atomic layer deposition and crystallized through a flux aided process.
Michael Getz, Per-Anders Hansen, Mohammed A. K. Ahmed, Helmer Fjellvåg, Ola Nilsen   +4 more
openaire   +3 more sources

Assessing Altered Coating Adhesion on Plasma‐Deoxidized Surfaces Under Oxygen‐Free Conditions

Advanced Engineering Materials, EarlyView.
This study demonstrates the effectiveness of atmospheric pressure plasma pretreatment in modifying silicon and stainless steel surfaces to improve adhesion. Argon‐hydrogen plasma increases surface roughness and improves adhesion strength, whereas pure argon results in smoother surfaces and structural changes.
Selina Raumel, Lara Kuhr, Khemais Barienti, Sebastian Herbst, Florian Nürnberger, Hans Jürgen Maier, Marc C. Wurz   +6 more
wiley   +1 more source