Results 81 to 90 of about 282,530 (298)

Ultrathin Amorphous Silica Membrane Enhances Proton Transfer across Solid-to-Solid Interfaces of Stacked Metal Oxide Nanolayers while Blocking Oxygen [PDF]

, 2020
A large jump of proton transfer rates across solid-to-solid interfaces by inserting an ultrathin amorphous silica layer into stacked metal oxide nanolayers is discovered using electrochemical impedance spectroscopy and Fourier-transform infrared ...
Frei, H, Jo, WJ, Katsoukis, G
core   +2 more sources

Composition‐Tuned Enhancement of the Anomalous Nernst Effect in FeCo–Pt Thin Films on Rigid and Flexible Substrates

Advanced Engineering Materials, EarlyView.
Disordered (Fe50Co50)1−xPtx thin films exhibit a pronounced anomalous Nernst effect (ANE) with a strong composition dependence on both rigid and flexible substrates. The transverse thermoelectric response peaks near 22.5 at.% Pt, accompanied by enhanced αxy/σxy scaling, thermal transport, and ANE sensitivity.
Mojtaba Mohammadi, Hiroyuki Awano, Kenji Tanabe   +2 more
wiley   +1 more source

Removing Oxide Layers and Retaining Oxide‐Free Steel Surfaces by Polishing in Oxygen‐Free Atmosphere

Advanced Engineering Materials, EarlyView.
In this study, the efficacy of wet mechanical polishing under an oxygen‐free atmosphere for deoxidation and the retention of an oxide‐free steel surface are elucidated using X‐ray photoelectron spectroscopy. The methodology proved successful; however, the results were highly dependent on the preparation of the solvents used to clean the samples after ...
Friedrich Bürger, Lienhard Wegewitz, Wolfgang Maus‐Friedrichs   +2 more
wiley   +1 more source

Al2O3 on WSe2 by ozone based atomic layer deposition: Nucleation and interface study

APL Materials, 2017
In this work, the atomic layer deposition process using ozone and trimethylaluminum (TMA) for the deposition of Al2O3 films on WSe2 was investigated. It was found that the ozone-based atomic layer deposition enhanced the nucleation of Al2O3 in comparison
Angelica Azcatl, Qingxiao Wang, Moon J. Kim, Robert M. Wallace   +3 more
doaj   +1 more source

Atomic layer deposition of HfO2 on graphene from HfCl4 and H20

, 2010
Atomic layer deposition of ultrathin HfO2 on unmodified graphene from HfCl4 and H2O was investigated. Surface RMS roughness down to 0.5 nm was obtained for amorphous, 30 nm thick hafnia film grown at 180 degrees C.
A.M. Oijen van, D.J. Miller, E. Hofmann, F.J. Kleima, K.P. Hewaparakrama, M. Baba, Q. Wu, S. Mackowski, S. Mackowski, S. Moehl, S. Wörmke, S. Wörmke, T. Schulte   +12 more
core   +1 more source

Al–Cu Composite Casting of Laser‐Deoxidized Copper: Bonding, Interfacial Chemistry, and Thermal Conductivity

Advanced Engineering Materials, EarlyView.
This study investigates laser‐based oxide removal of Cu inserts in oxygen‐free conditions and examines long‐term oxidation kinetics and surface chemistry under different atmospheres via X‐ray photoelectron spectroscopy. Al–Cu compound casting with differently oxidized surfaces is performed, and intermetallic phase formation, morphology, and thermal ...
Timon Steinhoff, Finn‐Lennard Janthur, Sascha Zimmermann, Sarah Seffer, Jörg Hermsdorf, René Gustus, Ludger Overmeyer, Wolfgang Maus‐Friedrichs, Hans Jürgen Maier, Christian Klose   +9 more
wiley   +1 more source

Atomic Layer Deposition of ZrO2 on Titanium Inhibits Bacterial Adhesion and Enhances Osteoblast Viability

International Journal of Nanomedicine, 2021
Yujin Jo,1 Yong Tae Kim,2 Hoonsung Cho,2 Min-Kyung Ji,3 Jaeyeong Heo,2,3 Hyun-Pil Lim1 1Department of Prosthodontics, School of Dentistry, Chonnam National University, Gwangju, Korea; 2Department of Materials Science and Engineering, Chonnam National ...
Jo Y, Kim YT, Cho H, Ji MK, Heo J, Lim HP   +5 more
doaj  

Copper reduction and atomic layer deposition by oxidative decomposition of formate by hydrazine [PDF]

, 2014
We have used density functional theory (DFT) to study the mechanism of three step atomic layer deposition (ALD) of copper via formate and hydrazine.
Dey, Gangotri, Elliott, Simon D.
core   +1 more source

Assessing Altered Coating Adhesion on Plasma‐Deoxidized Surfaces Under Oxygen‐Free Conditions

Advanced Engineering Materials, EarlyView.
This study demonstrates the effectiveness of atmospheric pressure plasma pretreatment in modifying silicon and stainless steel surfaces to improve adhesion. Argon‐hydrogen plasma increases surface roughness and improves adhesion strength, whereas pure argon results in smoother surfaces and structural changes.
Selina Raumel, Lara Kuhr, Khemais Barienti, Sebastian Herbst, Florian Nürnberger, Hans Jürgen Maier, Marc C. Wurz   +6 more
wiley   +1 more source

Atomic Layer Deposition of Molybdenum Carbide Thin Films

Advanced Materials Interfaces
The development of deposition processes for metal carbide thin films is rapidly advancing, driven by their potential for applications including catalysis, batteries, and semiconductor devices.
Paloma Ruiz Kärkkäinen, Georgi Popov, Timo Hatanpää, Antti Kemppinen, Katja Kohopää, Mohammad Bagheri, Hannu‐Pekka Komsa, Mikko Heikkilä, Kenichiro Mizohata, Mykhailo Chundak, Petro Deminskyi, Anton Vihervaara, Mário Ribeiro, Joel Hätinen, Joonas Govenius, Matti Putkonen, Mikko Ritala   +16 more
doaj   +1 more source