Results 81 to 90 of about 2,842,309 (291)
Scandium (Sc)‐doped AlCoCrFeMo HEA coatings are fabricated via flame spraying with 0.1, 0.3, and 0.5 wt% Sc additions. Among these, the HEA‐Sc0.3 coating exhibits the highest corrosion resistance, indicated by a more positive corrosion potential and lower current density.
Pankaj Kumar +7 more
wiley +1 more source
Atomic Layer Deposition of Molybdenum Carbide Thin Films
The development of deposition processes for metal carbide thin films is rapidly advancing, driven by their potential for applications including catalysis, batteries, and semiconductor devices.
Paloma Ruiz Kärkkäinen +16 more
doaj +1 more source
Research status and development trend of area selective atomic layer deposition
In recent years, with manufacturing technology advancing into the atomic age, significant progress has been achieved in nano-manufacturing technologies.
Xiaorui WU +4 more
doaj +1 more source
Scalable Production of Nanostructured Particles using Atomic Layer Deposition
Core-shell nanoparticles and other nanostructured particles have high potential in applications such as heterogeneous catalysis and energy conversion and storage.
Aristeidis Goulas, J. Ruud van Ommen
doaj +1 more source
This study applies machine learning regression to predict chromium layer thickness in decorative trivalent chromium electroplating, using 441 experiments from laboratory‐scale (1L) and pilot‐scale (14L) setups. Tree‐based models, particularly CatBoost, outperformed linear regression by capturing nonlinear parameter interactions (R2$R^2$ up to 0.77 ...
Christoph Baumer +4 more
wiley +1 more source
Experiments and thermophysical simulations were conducted to investigate the electron beam powder bed fusion electron beam (PBF‐EB/M) process for the γ′‐strengthened nickel‐based superalloy Inconel 738LC. The results demonstrate the impact of process‐induced microstructural variations on high‐temperature mechanical behavior, providing a basis for ...
Jan Niklas Petenati +11 more
wiley +1 more source
On the early history of atomic layer deposition: most significant works and applications
Atomic layer deposition (ALD) is a technique that has been instrumental in enabling the semiconductor industry to maintain its adherence to Moore’s Law, and is becoming a gamechanger in several other fields. A worldwide voluntary effort called “Virtual
Anatoly, Malkov +47 more
core
2038The atomic layer deposition (ALD) of copper oxide films from [(nBu3P)2Cu(acac)] and wet oxygen on SiO2 and TaN has been studied in detail by spectroscopic ellipsometry and atomic force microscopy. The results suggest island growth on SiO2, along with
Waechtler, T. +9 more
core +1 more source
Toward 3D Solid-State Batteries via Atomic Layer Deposition Approach
3D solid-state batteries are receiving great attentions as on-board power supply systems for small-dimension devices, due to their high power and energy densities.
Jian Liu +2 more
doaj +1 more source

