Results 91 to 100 of about 86,737 (303)
Current Status and Challenges in Data Collection for Aerospace Coatings Deposited by Plasma Spraying
Advanced Engineering Materials, EarlyView.An innovative approach has been integrated into the GRENAT project to optimize plasma spraying and coating performance. Raw materials are accelerated and melted in the plasma generated by torches, creating coatings. Monitoring sensors collect process data which are combined with ex situ characterization data.
Lila Randriamananjara +8 more
wiley +1 more source
Scalable Production of Nanostructured Particles using Atomic Layer Deposition
KONA Powder and Particle Journal, 2014 Core-shell nanoparticles and other nanostructured particles have high potential in applications such as heterogeneous catalysis and energy conversion and storage.
Aristeidis Goulas, J. Ruud van Ommen
doaj +1 more source
A Short History of Atomic Layer Deposition: Tuomo Suntola's Atomic Layer Epitaxy [PDF]
Chemical Vapor Deposition, 2014 AbstractAtomic layer deposition (ALD) is a thin film growth technique based on the repeated use of separate, saturating gas‐solid reactions. The principle of ALD has been discovered twice; in the 1960s under the name “molecular layering” in the Soviet Union, and in the 1970s under the name “atomic layer epitaxy” (ALE) in Finland.
openaire +2 more sources
Electrical characteristics of top-down ZnO nanowire transistors using remote plasma ALD
Top-down fabrication is used to produce ZnO nanowires by remote plasma atomic layer deposition over a SiO2 pillar and anisotropic dry etching. Nanowire field-effect transistors (FETs), with channel lengths in the range of 1.3–18.6 µm, are then fabricated
Masaud, T.B. +9 more
core +1 more source
Enhanced Strength and Corrosion Resistance of Ti‐13Nb‐12Ta‐10Zr‐4Sn Alloy by Aging Treatment
Advanced Engineering Materials, EarlyView.This work systematically investigates the effect of aging treatment on mechanical properties and corrosion behavior of vacuum arc‐melted Ti‐13Nb‐12Ta‐10Zr‐4Sn alloy. Owing to the increased α″ martensite, strength and corrosion resistance were significantly enhanced by aging treatment.
Yuhua Li +5 more
wiley +1 more source
Surface Ligand Removal in Atomic Layer Deposition of GaN Using Triethylgallium
, 2020 Gallium nitride (GaN) is one of the most important semiconductor materials in modern electronics. While GaN films are routinely deposited by chemical vapor deposition at around 1000 °C, low-temperature routes for GaN deposition need to be better ...
Chih-Wei, Hsu +4 more
core +1 more source
Long Live(d) CsPbBr3 Superlattices: Colloidal Atomic Layer Deposition for Structural Stability
, 2023 Metal halide perovskite nanocrystals self-assemble under slow solvent evaporation leading to formation of superlattices that are interesting because of their collective photophysical properties, such as superfluorescence. These collective properties are,
Philippe, Green +4 more
core +1 more source
Advanced Engineering Materials, EarlyView.Graphene nanoplatelet (0.1 wt.%) reinforcement significantly enhances the performance of β Ti‐28Nb‐35.4Zr alloy. Grain refinement, reduced water contact angle, and improved surface characteristics promote osteoblast adhesion and complete surface coverage after 7 days.
Khurram Munir +5 more
wiley +1 more source
Advanced Materials InterfacesAtomic layer deposition (ALD) has emerged as a promising method for surface modification of functional nanoparticles, enabling the versatile applications in energy, catalysis, and human health.
Guanghui Yan +6 more
doaj +1 more source