Results 111 to 120 of about 86,737 (303)

Atomic layer deposition and properties of ZrO2/Fe2O3 thin films

open access: yesBeilstein Journal of Nanotechnology, 2018
Thin solid films consisting of ZrO2 and Fe2O3 were grown by atomic layer deposition (ALD) at 400 °C. Metastable phases of ZrO2 were stabilized by Fe2O3 doping.
Kristjan Kalam   +11 more
doaj   +1 more source

Thermally induced permittivity enhancement in La-doped ZrO2 grown by atomic layer deposition on Ge(100)

open access: yes, 2009
International audienceLa-doped ZrO2 thin films grown by O3-based atomic layer deposition directly on Ge(100) exhibit a dielectric constant of 29.
Perego, M.   +15 more
core   +1 more source

Designing Polymer Nanocomposites for X‐Ray Shielding: Mechanisms, Architectures, and Scalable Processing

open access: yesAdvanced Engineering Materials, EarlyView.
This review highlights advances in lightweight, lead‐free polymer nanocomposites for diagnostic X‐ray shielding. By linking filler chemistry, dispersion, architecture, and photon interaction mechanisms, it establishes structure–performance relationships guiding material design.
Aklilu G. Messele   +2 more
wiley   +1 more source

Process Practice and its Effects on Surface Defects on Flexible PV Barrier Films

open access: yes, 2013
To the present day, there is still an increasing interest in the development of Cu (In, Ga) Se2 (CIGS) thin film solar cells on flexible polyimide substrates. These cells offer advantages of low cost, light weight and excellent radiation hardness as well
Elrawemi, Mohamed   +2 more
core  

Atomic layer deposition of LaxZr1-xO2-delta (x=0.25) high-k dielectrics for advanced gate stacks

open access: yes, 2009
International audienceThin LaxZr1−xO2−δ (x=0.25) high permittivity (k) films are grown on Si(100) by atomic layer deposition at 300 °C using (PirCp)3La, (MeCp)2ZrMe(OMe) and O3 species. Their properties are studied by grazing incidence x-ray diffraction,
D. Tsoutsou   +15 more
core   +1 more source

Feasibility of Nitrogen as a Carrier Gas for Inconel Cold Spray in Hydropower Application

open access: yesAdvanced Engineering Materials, EarlyView.
N2, despite being nearly two orders of magnitude cheaper than He, is a feasible carrier gas for cold spray Inconel coatings in hydropower repair applications when higher gas temperature and pressure are used. Reducing powder size significantly improved cavitation resistance, while the addition of fine chromium carbide particles further enhanced erosion
Tianhao Wang   +4 more
wiley   +1 more source

Atomic layer deposition of TiO2-nanomembrane-based photocatalysts with enhanced performance

open access: yesAIP Advances, 2016
In this study, TiO2 and TiO2-ZnO nanomembranes were fabricated by atomic layer deposition using the three-dimensionally porous template and their photocatalytic properties were investigated.
Riyanto Edy   +5 more
doaj   +1 more source

Development of the basis for in process metrology for roll to roll production of flexible photovoltaics

open access: yes, 2013
This paper reports on the recent work carried out as part of the EU funded NanoMend project. The project seeks to develop integrated process inspection, cleaning, repair and control systems for thin films on flexible PV films.
Robbins, David   +5 more
core  

Enhancing Low‐Temperature Performance of Sodium‐Ion Batteries via Anion‐Solvent Interactions

open access: yesAdvanced Functional Materials, EarlyView.
DOL is introduced into electrolytes as a co‐solvent, increasing slat solubility, ion conductivity, and the de‐solvent process, and forming an anion‐rich solvent shell due to its high interaction with anion. With the above virtues, the batteries using this electrolyte exhibit excellent cycling stability at low temperatures. Abstract Sodium‐ion batteries
Cheng Zheng   +7 more
wiley   +1 more source

Nanoscale Assembly for Molecular Electronics and In Situ Characterization during Atomic Layer Deposition

open access: yes, 2009
The work in this dissertation consists of a two-part study concerning molecular-based electronics and atomic layer deposition (ALD). As conventional “top-down†silicon-based technology approaches its expected physical and technical limits ...
Na, Jeong-Seok
core  

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