Results 101 to 110 of about 86,737 (303)

Toward 3D Solid-State Batteries via Atomic Layer Deposition Approach

open access: yesFrontiers in Energy Research, 2018
3D solid-state batteries are receiving great attentions as on-board power supply systems for small-dimension devices, due to their high power and energy densities.
Jian Liu   +2 more
doaj   +1 more source

On the early history of atomic layer deposition: most significant works and applications

open access: yes, 2016
Atomic layer deposition (ALD) is a technique that has been instrumental in enabling the semiconductor industry to maintain its adherence to Moore’s Law, and is becoming a gamechanger in several other fields. A worldwide voluntary effort called “Virtual
Anatoly, Malkov   +47 more
core  

Top-down fabricated ZnO nanowire transistors for application in biosensors

open access: yes, 2012
Top-down ZnO nanowire FETs have been fabricated using mature photolithography, ZnO atomic layer deposition (ALD) and plasma etching. This paper investigates the effects of oxygen adsorption by measuring FET characteristics at different gate bias sweep ...
Ashburn, Peter   +9 more
core   +1 more source

Electrochemical Behavior of Flame‐Sprayed Sc‐Doped AlCoCrFeMo High‐Entropy Alloy Coatings in 3.5% Sodium Chloride Solution

open access: yesAdvanced Engineering Materials, EarlyView.
Scandium (Sc)‐doped AlCoCrFeMo HEA coatings are fabricated via flame spraying with 0.1, 0.3, and 0.5 wt% Sc additions. Among these, the HEA‐Sc0.3 coating exhibits the highest corrosion resistance, indicated by a more positive corrosion potential and lower current density.
Pankaj Kumar   +7 more
wiley   +1 more source

Cathodic Cage Plasma Deposition of Nanostructured Cu–Fe–Se Coatings on Poly(methyl Methacrylate)

open access: yesAdvanced Engineering Materials, EarlyView.
Nanostructured Cu–Fe–Se coatings are deposited on PMMA by a modified cathodic cage plasma process, enabling low‐temperature deposition on polymer substrates. A transition from discontinuous to compact morphology is observed with temperature, with optimal properties at 200°C, where improved CuFeSe2‐type bonding, lowest sheet resistance, and favorable ...
V. S. S. Sobrinho   +8 more
wiley   +1 more source

An Experimental High‐Throughput Approach for the Screening of Hard Magnet Materials

open access: yesAdvanced Engineering Materials, EarlyView.
An entire workflow for the high‐throughput characterization and analysis of compositionally graded magnetic films is presented. Characterization protocols, data management tools and data analysis approaches are illustrated with test case Sm(Fe, V)12 based films.
William Rigaut   +16 more
wiley   +1 more source

Stabilization of Ni-YSZ Anodes in Solid Oxide Fuel Cells using an ALD-Grown Aluminum Titanate Interlayer

open access: yesECS Advances
The effect of an Al _2 TiO _5 (ALT) interlayer between Ni and YSZ on enhancing the thermal stability of Ni-YSZ solid oxide fuel cell was examined. Atomic layer deposition (ALD) was used to provide precise control of the structure and thickness of the ALT
Zhuoming Feng   +3 more
doaj   +1 more source

Characterisation of Titanium-Oxide Thin Films for Efficient pH Sensing in Low-Power Electrochemical Systems

open access: yesSensors
A compact electrochemical sensor module for pH detection was developed for potential integration into specialized devices used for live cell or tissue incubation, for applications in highly parallelized cell culture analysis, by incorporating Organ-on ...
Zsombor Szomor   +10 more
doaj   +1 more source

Encyclopedia of 2D β′‐In2Se3 Growth Using Chemical Vapor Deposition: The Effects of Synthesis Parameters Onto Material Quality

open access: yesAdvanced Engineering Materials, EarlyView.
A distinct semi‐confined inner‐tube chemical vapor deposition geometry enables reproducible, large‐area growth of phase‐pure 2D β′‐In2Se3 from InI + Se precursors. Engineering local vapor transport and optimizing precursor delivery and temperature–time conditions yield uniform continuous films.
Dasun P. W. Guruge   +8 more
wiley   +1 more source

Plasma atomic layer deposition

open access: yes, 2017
Plasma atomic layer deposition (ALD) is optimized through modulation of the gas residence time during an excited species phase, wherein activated reactant is supplied such as from a plasma.

core   +1 more source

Home - About - Disclaimer - Privacy