Results 71 to 80 of about 282,530 (298)

Heteroepitaxy of Group IV-VI Nitrides by Atomic Layer Deposition

, 2013
Heteroepitaxial growth of selected group IV-VI nitrides on various orientations of sapphire (\alpha-Al2O3) is demonstrated using atomic layer deposition.
Becker, Nicholas G., Cao, Chaoyue, Groll, Nickolas R., Klug, Jeffrey A., Pellin, Michael J., Proslier, Thomas, Weimer, Matthew S., Zasadzinski, John F.   +7 more
core   +1 more source

Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition [PDF]

, 2016
We report the design of a mobile setup for synchrotron based in situ studies during atomic layer processing. The system was designed to facilitate in situ grazing incidence small angle x-ray scattering (GISAXS), x-ray fluorescence (XRF), and x-ray ...
Alessandro Coati, Christophe Detavernier, Dendooven J., Dendooven J., Eduardo Solano, Emiliano Fonda, Giuseppe Portale, Jolien Dendooven, Kevin Van de Kerckhove, Matthias M. Minjauw, Yves Garreau   +10 more
core   +2 more sources

Oxide‐Free Titanium Coatings by Wire Arc Spraying in a Silane‐Doped Inert Atmosphere

Advanced Engineering Materials, EarlyView.
A silane‐doped argon atmosphere enables the production of oxide‐free titanium coatings via twin‐wire arc spraying at ambient pressure. This innovative approach eliminates residual oxygen, creating process conditions that prevent oxidation and nitride formation.
Manuel Rodriguez Diaz, Maik Szafarska, René Gustus, Kai Möhwald, Hans Jürgen Maier   +4 more
wiley   +1 more source

Advanced Atomic Layer Deposition Technologies for Micro-LEDs and VCSELs

Nanoscale Research Letters, 2021
In recent years, the process requirements of nano-devices have led to the gradual reduction in the scale of semiconductor devices, and the consequent non-negligible sidewall defects caused by etching.
Yen-Wei Yeh, Su-Hui Lin, Tsung-Chi Hsu, Shouqiang Lai, Po-Tsung Lee, Shui-Yang Lien, Dong-Sing Wuu, Guisen Li, Zhong Chen, Tingzhu Wu, Hao-Chung Kuo   +10 more
doaj   +1 more source

Atomic Layer Deposition to Fine-Tune the Surface Properties and Diameters of Fabricated Nanopores [PDF]

, 2004
Atomic layer deposition of alumina enhanced the molecule sensing characteristics of fabricated nanopores by fine-tuning their surface properties, reducing 1/f noise, neutralizing surface charge to favor capture of DNA and other negative polyelectrolytes,
Branton, Daniel, Chen, Peng, Farmer, Damon B., Golovchenko, Jene, Gordon, Roy, Mitsui, Toshiyuki   +5 more
core   +1 more source

Spatial Atomic Layer Deposition

, 2021
In conventional atomic layer deposition (ALD), precursors are exposed sequentially to a substrate through short pulses while kept physically separated by intermediate purge steps. Spatial ALD (SALD) is a variation of ALD in which precursors are continuously supplied in different locations and kept apart by an inert gas region or zone.
D., Muñoz-Rojas,, V.H., Nguyen, M.C., de la Huerta, C., Jiménez, D., Bellet   +4 more
openaire   +1 more source

Atomic Layer Deposition of Rhenium Disulfide [PDF]

Advanced Materials, 2018
Abstract2D materials research is advancing rapidly as various new “beyond graphene” materials are fabricated, their properties studied, and materials tested in various applications. Rhenium disulfide is one of the 2D transition metal dichalcogenides that has recently shown to possess extraordinary properties such as that it is not limited by the strict
Jani Hämäläinen, Miika Mattinen, Kenichiro Mizohata, Kristoffer Meinander, Marko Vehkamäki, Jyrki Räisänen, Mikko Ritala, Markku Leskelä   +7 more
openaire   +3 more sources

Thermodynamic Pathways of Nonequilibrium Solidification in Wire‐Arc Additive Manufacturing Fe‐Based Multicomponent Alloy Structures

Advanced Engineering Materials, EarlyView.
Geometry‐driven thermal behavior in wire‐arc additive manufacturing (WAAM) influences microstructural evolution during nonequilibrium solidification of a chemically complex Fe–Cr–Nb–W–Mo–C nanocomposite system. By comparing different deposits configurations, distinct entropy–cooling rate correlations, segregation, and carbide evolution are revealed ...
Blanca Palacios, Anthony Gonzalez, Aleksander Aleman, Tyler Dolmetsch, Tanaji Paul, Arvind Agarwal   +5 more
wiley   +1 more source

Preventing unwanted atomic layer deposition by liquid sealing

Nano Trends
Atomic layer deposition (ALD) is an essential thin film fabrication technique widely used in electronic and energy systems, but avoiding ALD in untargeted areas has been a long-standing challenge that excludes the possibility of creating patterns through
Haochuan Wang, Zhibin Yi, Chun Li, Rui Xia, Yan Shao, Shaohu Zhan, Wenshuai Feng, Rui-Tao Wen, Xing Cheng, Guangfu Luo, Yanhao Yu   +10 more
doaj   +1 more source

Transmission Electron Microscopy on Interface Engineered Superconducting Thin Films [PDF]

, 2003
Transmission electron microscopy is used to evaluate different deposition techniques, which optimize the microstructure and physical properties of superconducting thin films.
Bals, Sara, Blank, Dave H.A., Huijben, Mark, Leca, Victor, Rijnders, Guus, Tendeloo, Gustaav van   +5 more
core   +3 more sources