Results 71 to 80 of about 86,737 (303)
Advanced Atomic Layer Deposition Technologies for Micro-LEDs and VCSELs
In recent years, the process requirements of nano-devices have led to the gradual reduction in the scale of semiconductor devices, and the consequent non-negligible sidewall defects caused by etching.
Yen-Wei Yeh +10 more
doaj +1 more source
Layer-by-layer assembly of organic films and their application to multichannel surface plasmon resonance sensing [PDF]
This thesis provides a study of a single chip, multi-channel surface plasmon resonance (SPR) imaging system. The equipment has no moving parts and uses a single sensor "chip" onto which multiple channels can be incorporated.
Palumbo, Marco, Marco Palumbo, Dott
core
This work explores the reduction of nickel oxide layers using dielectric barrier discharge plasma in an argon–hydrogen atmosphere. The results reveal a strong temperature dependence, enabling complete reduction of thick oxide layers at 200°C within seconds.
Maria Argirusi +5 more
wiley +1 more source
Preventing unwanted atomic layer deposition by liquid sealing
Atomic layer deposition (ALD) is an essential thin film fabrication technique widely used in electronic and energy systems, but avoiding ALD in untargeted areas has been a long-standing challenge that excludes the possibility of creating patterns through
Haochuan Wang +10 more
doaj +1 more source
This study demonstrates how optimizing laser power, scanning speed, and hatching distance in laser powder bed fusion can boost the productivity of Inconel 718 manufacturing by up to 29% while maintaining mechanical integrity. The work delivers a validated process window and cost–time analysis, offering industry‐ready guidelines for efficient additive ...
Amir Behjat +7 more
wiley +1 more source
The subject of this work is the development of a corrosion‐protective coating on steel sheets for form hardening. Rapid heating in an extreme high vacuum (XHV)‐adequate atmosphere is a useful method to prevent oxidation during alloying of 22MnB5 and aluminum to obtain a metallurgical bonding.
Lorenz Albracht +5 more
wiley +1 more source
Al2O3 on WSe2 by ozone based atomic layer deposition: Nucleation and interface study
In this work, the atomic layer deposition process using ozone and trimethylaluminum (TMA) for the deposition of Al2O3 films on WSe2 was investigated. It was found that the ozone-based atomic layer deposition enhanced the nucleation of Al2O3 in comparison
Angelica Azcatl +3 more
doaj +1 more source
Studies on enhanced OLED performance using Al2O3 buffer layer by atomic layer deposition
It has been found that introduction of buffer layers between organic holes transport layer and anode layer plays an important role in improving device stability and hole injection efficiency.
Z. Cui(崔铮) +2 more
core
Toward epitaxial ternary oxide multilayer device stacks by atomic layer deposition [PDF]
The authors demonstrate multilayer epitaxial films by atomic layer deposition and postdeposition annealing. Their example features two ABO(3) type perovskite oxide films with different materials properties-a conductor (LaNiO3) and an insulator (SrTiO3 ...
Mizohata, Kenichiro +15 more
core +1 more source
Selenium was incorporated into a sol–gel‐derived bioactive glass to enable sustained therapeutic ion release. The selenium‐containing glass preserved bioactivity while selectively inducing cytotoxicity in osteosarcoma cells and maintaining osteoblastic viability.
Breno Rocha Barrioni +7 more
wiley +1 more source

