Results 51 to 60 of about 86,737 (303)

Planar Solid‐State Nanopores Toward Scalable Nanofluidic Integration Based on CMOS Technology

open access: yesAdvanced Engineering Materials, EarlyView.
We present a scalable silicon‐based fabrication strategy for planar solid‐state nanopores to enable their integration with complex nanofluidic systems. Prototype devices demonstrate normal voltage‐current characteristics, good noise performance, and appreciable streaming currents. Our CMOS‐compatible fabrication process offers precise geometric control
Ngan Hoang Pham   +7 more
wiley   +1 more source

Atomic Layer Deposition of Rhenium Disulfide [PDF]

open access: yesAdvanced Materials, 2018
Abstract2D materials research is advancing rapidly as various new “beyond graphene” materials are fabricated, their properties studied, and materials tested in various applications. Rhenium disulfide is one of the 2D transition metal dichalcogenides that has recently shown to possess extraordinary properties such as that it is not limited by the strict
Jani Hämäläinen   +7 more
openaire   +3 more sources

Chemical vapor deposition and atomic layer deposition for advanced lithium ion batteries and supercapacitors

open access: yes, 2015
Applications of the non-line-of-sight vapor deposition techniques, such as chemical vapor deposition (CVD) and atomic layer deposition (ALD), offer unique opportunities to produce well-defined high surface area current collectors, thin films or various ...
Wang, Xinran   +3 more
core   +1 more source

Copper oxide ALD from a Cu(I) beta-diketonate: Growth studies and application as seed layers for electrochemical copper deposition

open access: yes, 2022
2038The atomic layer deposition (ALD) of copper oxide films from [(nBu3P)2Cu(acac)] and wet oxygen on SiO2 and TaN has been studied in detail by spectroscopic ellipsometry and atomic force microscopy. The results suggest island growth on SiO2, along with
Waechtler, T.   +9 more
core   +1 more source

Innovative Processing of Compacted Waste Aluminum Alloy Powders via Controlled Remelting and Solidification

open access: yesAdvanced Engineering Materials, EarlyView.
This study demonstrates an efficient recycling route for out‐of‐spec AlSi10Mg atomized powders through compaction and arc remelting followed by suction casting. By correlating compaction load, cooling rate, and resulting microstructure, we show that intermediate pressures (50–80 kN) and rapid cooling refine dendrites, reduce porosity, and enhance ...
Mila Christy de Oliveira   +4 more
wiley   +1 more source

Enhancing Water Treatment Performance of Porous Polysulfone Hollow Fiber Membranes through Atomic Layer Deposition

open access: yesMolecules, 2023
Polysulfone (PSF) is one of the most used polymers for water treatment membranes, but its intrinsic hydrophobicity can be detrimental to the membranes’ performances.
Jeanne Casetta   +4 more
doaj   +1 more source

Atomic layer etching : what can we learn from atomic layer deposition? [PDF]

open access: yes, 2015
Current trends in semiconductor device manufacturing impose extremely stringent requirements on nanoscale processing techniques, both in terms of accurately controlling material properties and in terms of precisely controlling nanometer dimensions.
Kessels, WMM Erwin   +8 more
core   +1 more source

Oxide‐Free Titanium Coatings by Wire Arc Spraying in a Silane‐Doped Inert Atmosphere

open access: yesAdvanced Engineering Materials, EarlyView.
A silane‐doped argon atmosphere enables the production of oxide‐free titanium coatings via twin‐wire arc spraying at ambient pressure. This innovative approach eliminates residual oxygen, creating process conditions that prevent oxidation and nitride formation.
Manuel Rodriguez Diaz   +4 more
wiley   +1 more source

Recent Advances in Seeded and Seed-Layer-Free Atomic Layer Deposition of High-K Dielectrics on Graphene for Electronics

open access: yesC, 2019
Graphene (Gr) with its distinctive features is the most studied two-dimensional (2D) material for the new generation of high frequency and optoelectronic devices. In this context, the Atomic Layer Deposition (ALD) of ultra-thin high-k insulators on Gr is
Emanuela Schilirò   +3 more
doaj   +1 more source

Atomic Layer Deposition of CeOx Nanoclusters on TiO2

open access: yes, 2020
Titanium dioxide has a band-gap in the ultra violet region and there have been many efforts to shift light absorption to the visible region. In this regard, surface modification with metal oxide clusters has been used to promote band-gap reduction.
Ji, Liu   +4 more
core   +1 more source

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