Results 31 to 40 of about 86,737 (303)
Special Issue “ALD Technique for Functional Coatings of Nanostructured Materials”
Nanomaterials, 2022 Atomic layer deposition (ALD) is a vapor-phase technique that consists of the alternation of separated self-limiting surface reactions, which enable film thickness to be accurately controlled at the angstrom level, based on the former atomic layer ...
Javier Garcia Fernández +2 more
doaj +1 more source
Nanomaterials, 2023 Hf0.5Zr0.5O2 (HZO) thin film exhibits ferroelectric properties and is presumed to be suitable for use in next-generation memory devices because of its compatibility with the complementary metal–oxide–semiconductor (CMOS) process.
Da Hee Hong +6 more
doaj +1 more source
Characterization and Quality Control of Aluminium-Oxide Layers Prepared by Atomic Layer Deposition
, 2022 In this thesis, the deposition temperature effects on thin films produced using Atomic Layer deposition (ALD) are studied, as well as some of the most commonly used methods in the university to characterize this films.
Gil Rendon, David
core
Molecules, 2022 Alkali metals (lithium, sodium, and potassium) are promising as anodes in emerging rechargeable batteries, ascribed to their high capacity or abundance.
Matthew Sullivan +2 more
doaj +1 more source
Application of atomic layer deposition in nanophotonics [PDF]
SPIE Proceedings, 2014 We review our recent results on using Atomic Layer Deposition (ALD) in fabrication of nanophotonic waveguide devices. ALD is a unique thin film deposition method providing atomic level control of film composition and thickness, perfect step coverage, and large-area uniformity. We employ the advantages of ALD in connection with Sinanophotonics.
Karvonen, Lasse +5 more
openaire +4 more sources
, 2014 Transparent barrier films such as Al2O3 used for prevention of oxygen and/or water vapour permeation are the subject of increasing research interest when used for the encapsulation of flexible photovoltaic modules.
Robbins, David +5 more
core +1 more source
Atomic layer deposition of ZnS nanotubes [PDF]
Nanotechnology, 2009 We report on growth of high-aspect-ratio ($\gtrsim300$) zinc sulfide nanotubes with variable, precisely tunable, wall thicknesses and tube diameters into highly ordered pores of anodic alumina templates by atomic layer deposition (ALD) at temperatures as low as 75 $^{\circ}$C.
Farhangfar, Sh. +3 more
openaire +3 more sources
Molecular Oncology, EarlyView.Dormant cancer cells can hide in distant organs for years, evading treatment and the immune system. This review highlights how signals from the surrounding tissue and immune environment keep these cells inactive or trigger their reawakening. Understanding these mechanisms may help develop therapies to eliminate or control dormant cells and prevent ...
Kanishka Tiwary +1 more
wiley +1 more source
Atomic layer deposition for biosensing applications [PDF]
Biosensors and Bioelectronics, 2018 Atomic layer deposition (ALD) is a thin film deposition technique currently used in various nanofabrication processes for microelectronic applications. The ability to coat high aspect ratio structures with a wide range of materials, the excellent conformality, and the exquisite thickness control have made ALD an essential tool for the fabrication of ...
Graniel, Octavio +4 more
openaire +5 more sources
, 2013 Surface topography analysis plays a very significant role in determining the functional performance for many engineering surfaces. In this paper, feature characterisation techniques, based on the ‘Wolf pruning’ method are implemented to characterise ...
Sweeney, Francis +7 more
core +1 more source