Results 31 to 40 of about 282,530 (298)
Enhancing of catalytic properties of vanadia via surface doping with phosphorus using atomic layer deposition [PDF]
, 2015 This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in J. Vac. Sci. Technol.
Drieß, Matthias +7 more
core +2 more sources
Positive exchange bias in ferromagnetic La0.67Sr0.33MnO3 / SrRuO3 bilayers [PDF]
, 2004 Epitaxial La0.67Sr0.33MnO3 (LSMO)/ SrRuO3 (SRO) ferromagnetic bilayers have been grown on (001) SrTiO3 (STO) substrates by pulsed laser deposition with atomic layer control. We observe a shift in the magnetic hysteresis loop of the LSMO layer in the same
C. B. Eom +4 more
core +1 more source
Magnesium Sublimation for Growing Thin Films and Conformal Coatings on 1D Nanostructures
Nanomanufacturing, 2022 A method to conformally coat silica nanosprings with magnesium via sublimation at 450 °C has been developed. In addition, Mg thin films were grown on Si(100) using this method to determine the effects of substrate morphology (nanoscale curvatures vs ...
Aaron J. Austin +7 more
doaj +1 more source
Material manufacturing from atomic layer
International Journal of Extreme Manufacturing, 2023 Atomic scale engineering of materials and interfaces has become increasingly important in material manufacturing. Atomic layer deposition (ALD) is a technology that can offer many unique properties to achieve atomic-scale material manufacturing ...
Xinwei Wang, Rong Chen, Shuhui Sun
doaj +1 more source
Nanomaterials, 2021 This paper reports an investigation of the structural, chemical and electrical properties of ultra-thin (5 nm) aluminum nitride (AlN) films grown by plasma enhanced atomic layer deposition (PE-ALD) on gallium nitride (GaN).
Emanuela Schilirò +12 more
doaj +1 more source
GaAs interfacial self-cleaning by atomic layer deposition [PDF]
, 2008 The reduction and removal of surface oxides from GaAs substrates by atomic layer deposition (ALD) of Al2O3 and HfO2 are studied using in situ monochromatic x-ray photoelectron spectroscopy.
A. M. Sonnet +12 more
core +1 more source
International Journal of Photoenergy, 2022 Atmospheric Pressure Spatial Atomic Layer Deposition (AP-SALD) is an upcoming deposition technique suitable for a variety of materials and combines the benefits of a regular atomic layer deposition with a significantly increased deposition rate at ...
Eugen Zimmermann +6 more
doaj +1 more source
Atomic layer deposition of functional multicomponent oxides
APL Materials, 2019 Advances in the fabrication of multicomponent oxide thin films are crucial to prepare specific compositions with precise structures and controlled interfaces.
Mariona Coll, Mari Napari
doaj +1 more source
MethodsX, 2019 This paper reports on light yield enhancement of terbium-doped gadolinium oxysulfide based scintillator screens achieved by coating their substrates with thin layers of a high density and high atomic number material.
Jan Crha +4 more
doaj +1 more source
Influence of NiO ALD Coatings on the Field Emission Characteristic of CNT Arrays
Nanomaterials, 2022 The paper presents a study of a large-area field emitter based on a composite of vertically aligned carbon nanotubes covered with a continuous and conformal layer of nickel oxide by the atomic layer deposition method.
Maksim A. Chumak +6 more
doaj +1 more source