Results 11 to 20 of about 86,737 (303)
Area-Selective Low-Pressure Thermal Atomic Layer Deposition of Gallium Nitride [PDF]
Bernhard Y. van der Wel +3 more
doaj +2 more sources
Plasma-Assisted Atomic Layer Deposition of IrO2 for Neuroelectronics
In vitro and in vivo stimulation and recording of neuron action potential is currently achieved with microelectrode arrays, either in planar or 3D geometries, adopting different materials and strategies. IrO2 is a conductive oxide known for its excellent
Valerio Di Palma +5 more
doaj +1 more source
Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
In this study, we report on the deposition of a highly crystalline AlN interfacial layer on GaN at 330 °C via plasma-enhanced atomic layer deposition (PEALD). Trimethylaluminum (TMA) and NH3 plasma were used as the Al and N precursors, respectively.
Il-Hwan Hwang +3 more
doaj +1 more source
Development and Prospect of Process Models and Simulation Methods for Atomic Layer Deposition
Thin film deposition is one of the most important processes in IC manufacturing. In this paper, several typical models and numerical simulation methods for thin film deposition and atomic layer deposition are introduced. Several modeling methods based on
Lei Qu +7 more
doaj +1 more source
Particle atomic layer deposition [PDF]
The functionalization of fine primary particles by atomic layer deposition (particle ALD) provides for nearly perfect nanothick films to be deposited conformally on both external and internal particle surfaces, including nanoparticle surfaces. Film thickness is easily controlled from several angstroms to nanometers by the number of self-limiting ...
openaire +2 more sources
Atomic layer deposition for quantum dots based devices
Quantum dots (QDs) are promising candidates for the next-generation optical and electronic devices due to the outstanding photoluminance efficiency, tunable bandgap and facile solution synthesis.
Zhou Binze +4 more
doaj +1 more source
Tuning the Electrical Properties of Titanium Oxide Bilayers Prepared by Atomic Layer Deposition at Different Temperatures [PDF]
Carrier‐selective contacts prepared by atomic layer deposition (ALD) have received significant attention for developing high‐efficiency solar cells. Herein, the electrical properties of titanium oxide (TiOx) prepared by ALD are manipulated by modulating ...
Noritaka Usami +7 more
core +1 more source
Coating strategies for atomic layer deposition
Atomic layer deposition (ALD) is a vapor phase technique capable of producing a variety of materials. It consists of the alternation of separate self-limiting surface reactions, which enables accurate control of film thickness at the Angstrom level.
Hu Liang, Qi Weihong, Li Yejun
doaj +1 more source
Atomic Layer Deposition of Metal Phosphates [PDF]
Since the introduction of lithium iron phosphate (LFP) as an electrode material for Li-ion batteries (LIB’s), metal phosphates in general have become increasingly important. The strong covalency of the P-O bonds typically results in a very good thermal and structural stability, which is one of the main reasons for the success of LFP as a LIB ...
Lowie Henderick +4 more
openaire +2 more sources
Defect Detection in Thin-film Photovoltaics; Towards Improved Efficiency and Longevity [PDF]
The photovoltaic (PV) industry is seeking to increase efficiency and functional lifetime of PV modules manufactured on polymer substrates. High resolution and high speed surface inspection for the quality control of the manufacture of large area flexible
Robbins, David +15 more
core +1 more source

