Results 11 to 20 of about 2,052 (205)

Plasma-Assisted Atomic Layer Deposition of IrO₂ for Neuroelectronics

Nanomaterials, 2023
In vitro and in vivo stimulation and recording of neuron action potential is currently achieved with microelectrode arrays, either in planar or 3D geometries, adopting different materials and strategies. IrO2 is a conductive oxide known for its excellent
Valerio Di Palma, Andrea Pianalto, Michele Perego, Graziella Tallarida, Davide Codegoni, Marco Fanciulli   +5 more
doaj   +1 more source

Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition

Crystals, 2021
In this study, we report on the deposition of a highly crystalline AlN interfacial layer on GaN at 330 °C via plasma-enhanced atomic layer deposition (PEALD). Trimethylaluminum (TMA) and NH3 plasma were used as the Al and N precursors, respectively.
Il-Hwan Hwang, Myoung-Jin Kang, Ho-Young Cha, Kwang-Seok Seo   +3 more
doaj   +1 more source

Development and Prospect of Process Models and Simulation Methods for Atomic Layer Deposition

Journal of Microelectronic Manufacturing, 2019
Thin film deposition is one of the most important processes in IC manufacturing. In this paper, several typical models and numerical simulation methods for thin film deposition and atomic layer deposition are introduced. Several modeling methods based on
Lei Qu, Rui Chen, Xiaoting Li, Jing Zhang, Yanrong Wang, Shuhua Wei, Jiang Yan, Yayi Wei   +7 more
doaj   +1 more source

Atomic layer deposition for quantum dots based devices

Opto-Electronic Advances, 2020
Quantum dots (QDs) are promising candidates for the next-generation optical and electronic devices due to the outstanding photoluminance efficiency, tunable bandgap and facile solution synthesis.
Zhou Binze, Liu Mengjia, Wen Yanwei, Li Yun, Chen Rong   +4 more
doaj   +1 more source

Particle atomic layer deposition [PDF]

Journal of Nanoparticle Research, 2019
The functionalization of fine primary particles by atomic layer deposition (particle ALD) provides for nearly perfect nanothick films to be deposited conformally on both external and internal particle surfaces, including nanoparticle surfaces. Film thickness is easily controlled from several angstroms to nanometers by the number of self-limiting ...
openaire   +2 more sources

Coating strategies for atomic layer deposition

Nanotechnology Reviews, 2017
Atomic layer deposition (ALD) is a vapor phase technique capable of producing a variety of materials. It consists of the alternation of separate self-limiting surface reactions, which enables accurate control of film thickness at the Angstrom level.
Hu Liang, Qi Weihong, Li Yejun
doaj   +1 more source

Magnesium Sublimation for Growing Thin Films and Conformal Coatings on 1D Nanostructures

Nanomanufacturing, 2022
A method to conformally coat silica nanosprings with magnesium via sublimation at 450 °C has been developed. In addition, Mg thin films were grown on Si(100) using this method to determine the effects of substrate morphology (nanoscale curvatures vs ...
Aaron J. Austin, Nathan P. Dice, Elena Echeverria, Ashish Kumar Gupta, Jonathan Risner, Halle C. Helfrich, Ritesh Sachan, David N. McIlroy   +7 more
doaj   +1 more source

Highly Homogeneous Current Transport in Ultra-Thin Aluminum Nitride (AlN) Epitaxial Films on Gallium Nitride (GaN) Deposited by Plasma Enhanced Atomic Layer Deposition

Nanomaterials, 2021
This paper reports an investigation of the structural, chemical and electrical properties of ultra-thin (5 nm) aluminum nitride (AlN) films grown by plasma enhanced atomic layer deposition (PE-ALD) on gallium nitride (GaN).
Emanuela Schilirò, Filippo Giannazzo, Salvatore Di Franco, Giuseppe Greco, Patrick Fiorenza, Fabrizio Roccaforte, Paweł Prystawko, Piotr Kruszewski, Mike Leszczynski, Ildiko Cora, Béla Pécz, Zsolt Fogarassy, Raffaella Lo Nigro   +12 more
doaj   +1 more source

Material manufacturing from atomic layer

International Journal of Extreme Manufacturing, 2023
Atomic scale engineering of materials and interfaces has become increasingly important in material manufacturing. Atomic layer deposition (ALD) is a technology that can offer many unique properties to achieve atomic-scale material manufacturing ...
Xinwei Wang, Rong Chen, Shuhui Sun
doaj   +1 more source

Atomic layer deposition

Nature Reviews Methods Primers
Atomic layer deposition (ALD) is a surface-controlled chemical vapour deposition method, in which materials are prepared one atomic layer at the time. With ALD, film thickness can be controlled very precisely, and it allows the user to cover large areas and surfaces with a complex three-dimensional structure uniformly and conformally.
Erwin Kessels, Anjana Devi, Jin-Seong Park, Mikko Ritala, Angel Yanguas-Gil, Claudia Wiemer   +5 more
  +7 more sources