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Nature Reviews Methods PrimersAtomic layer deposition (ALD) is a surface-controlled chemical vapour deposition method, in which materials are prepared one atomic layer at the time. With ALD, film thickness can be controlled very precisely, and it allows the user to cover large areas and surfaces with a complex three-dimensional structure uniformly and conformally.
Erwin Kessels +5 more
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Magnesium Sublimation for Growing Thin Films and Conformal Coatings on 1D Nanostructures
Nanomanufacturing, 2022 A method to conformally coat silica nanosprings with magnesium via sublimation at 450 °C has been developed. In addition, Mg thin films were grown on Si(100) using this method to determine the effects of substrate morphology (nanoscale curvatures vs ...
Aaron J. Austin +7 more
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Material manufacturing from atomic layer
International Journal of Extreme Manufacturing, 2023 Atomic scale engineering of materials and interfaces has become increasingly important in material manufacturing. Atomic layer deposition (ALD) is a technology that can offer many unique properties to achieve atomic-scale material manufacturing ...
Xinwei Wang, Rong Chen, Shuhui Sun
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Nanomaterials, 2021 This paper reports an investigation of the structural, chemical and electrical properties of ultra-thin (5 nm) aluminum nitride (AlN) films grown by plasma enhanced atomic layer deposition (PE-ALD) on gallium nitride (GaN).
Emanuela Schilirò +12 more
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As2S3 thin films deposited by atomic layer deposition [PDF]
, 2017 As2S3 thin films were deposited on glass and silicon (100) substrates by atomic layer deposition from tris(dimethylamino) arsine [(CH3)(2)N)(3)As] and H2S. Amorphous films were deposited at an exceptionally low temperature of 50 degrees C. No film growth
Mizohata, Kenichiro +13 more
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International Journal of Photoenergy, 2022 Atmospheric Pressure Spatial Atomic Layer Deposition (AP-SALD) is an upcoming deposition technique suitable for a variety of materials and combines the benefits of a regular atomic layer deposition with a significantly increased deposition rate at ...
Eugen Zimmermann +6 more
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Atomic layer deposition of functional multicomponent oxides
APL Materials, 2019 Advances in the fabrication of multicomponent oxide thin films are crucial to prepare specific compositions with precise structures and controlled interfaces.
Mariona Coll, Mari Napari
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MethodsX, 2019 This paper reports on light yield enhancement of terbium-doped gadolinium oxysulfide based scintillator screens achieved by coating their substrates with thin layers of a high density and high atomic number material.
Jan Crha +4 more
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Influence of NiO ALD Coatings on the Field Emission Characteristic of CNT Arrays
Nanomaterials, 2022 The paper presents a study of a large-area field emitter based on a composite of vertically aligned carbon nanotubes covered with a continuous and conformal layer of nickel oxide by the atomic layer deposition method.
Maksim A. Chumak +6 more
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PbI2 nanocrystal growth by atomic layer deposition of Pb(tmhd)2 and HI
, 2022 Atomic layer deposition (ALD) allows for a great level of control over the thickness and stoichiometry of materials. ALD provides a suitable route to deposit lead halides, which can further be converted to perovskite for photovoltaics, photoemission, and
Juan-Pablo, Correa-Baena +8 more
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