Results 21 to 30 of about 2,842,309 (291)

Defect Detection in Thin-film Photovoltaics; Towards Improved Efficiency and Longevity [PDF]

open access: yes, 2014
The photovoltaic (PV) industry is seeking to increase efficiency and functional lifetime of PV modules manufactured on polymer substrates. High resolution and high speed surface inspection for the quality control of the manufacture of large area flexible
Robbins, David   +15 more
core   +1 more source

PbI2 nanocrystal growth by atomic layer deposition of Pb(tmhd)2 and HI [PDF]

open access: yes, 2022
Atomic layer deposition (ALD) allows for a great level of control over the thickness and stoichiometry of materials. ALD provides a suitable route to deposit lead halides, which can further be converted to perovskite for photovoltaics, photoemission, and
Juan-Pablo, Correa-Baena   +8 more
core   +1 more source

Particle atomic layer deposition [PDF]

open access: yesJournal of Nanoparticle Research, 2019
The functionalization of fine primary particles by atomic layer deposition (particle ALD) provides for nearly perfect nanothick films to be deposited conformally on both external and internal particle surfaces, including nanoparticle surfaces. Film thickness is easily controlled from several angstroms to nanometers by the number of self-limiting ...
openaire   +2 more sources

Further Development of Surface Metrology Methods for Predicting the Functional Performance of Flexible PV Barrier Films [PDF]

open access: yes, 2013
Surface topography analysis plays a very significant role in determining the functional performance for many engineering surfaces. In this paper, feature characterisation techniques, based on the ‘Wolf pruning’ method are implemented to characterise ...
Sweeney, Francis   +7 more
core   +1 more source

Magnesium Sublimation for Growing Thin Films and Conformal Coatings on 1D Nanostructures

open access: yesNanomanufacturing, 2022
A method to conformally coat silica nanosprings with magnesium via sublimation at 450 °C has been developed. In addition, Mg thin films were grown on Si(100) using this method to determine the effects of substrate morphology (nanoscale curvatures vs ...
Aaron J. Austin   +7 more
doaj   +1 more source

Highly Homogeneous Current Transport in Ultra-Thin Aluminum Nitride (AlN) Epitaxial Films on Gallium Nitride (GaN) Deposited by Plasma Enhanced Atomic Layer Deposition

open access: yesNanomaterials, 2021
This paper reports an investigation of the structural, chemical and electrical properties of ultra-thin (5 nm) aluminum nitride (AlN) films grown by plasma enhanced atomic layer deposition (PE-ALD) on gallium nitride (GaN).
Emanuela Schilirò   +12 more
doaj   +1 more source

Atomic layer deposition of functional multicomponent oxides

open access: yesAPL Materials, 2019
Advances in the fabrication of multicomponent oxide thin films are crucial to prepare specific compositions with precise structures and controlled interfaces.
Mariona Coll, Mari Napari
doaj   +1 more source

Material manufacturing from atomic layer

open access: yesInternational Journal of Extreme Manufacturing, 2023
Atomic scale engineering of materials and interfaces has become increasingly important in material manufacturing. Atomic layer deposition (ALD) is a technology that can offer many unique properties to achieve atomic-scale material manufacturing ...
Xinwei Wang, Rong Chen, Shuhui Sun
doaj   +1 more source

Light Yield Enhancement of 157-Gadolinium Oxysulfide Scintillator Screens for the High-Resolution Neutron Imaging

open access: yesMethodsX, 2019
This paper reports on light yield enhancement of terbium-doped gadolinium oxysulfide based scintillator screens achieved by coating their substrates with thin layers of a high density and high atomic number material.
Jan Crha   +4 more
doaj   +1 more source

As2S3 thin films deposited by atomic layer deposition [PDF]

open access: yes, 2017
As2S3 thin films were deposited on glass and silicon (100) substrates by atomic layer deposition from tris(dimethylamino) arsine [(CH3)(2)N)(3)As] and H2S. Amorphous films were deposited at an exceptionally low temperature of 50 degrees C. No film growth
Mizohata, Kenichiro   +13 more
core   +1 more source

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