Results 31 to 40 of about 5,812,653 (293)
Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films [PDF]
ECS Meeting Abstracts, 2013 Abstract not Available.
Ozgit-Akgun, Çağla +2 more
openaire +2 more sources
Plasma-enhanced atomic layer deposition for plasmonic TiN (Erratum) [PDF]
Nanophotonic Materials XIII, 2020 Publisher’s Note: This paper, originally published on 3 October 2016, was replaced with a corrected version on 12 May 2020. If you downloaded the original PDF but are unable to access the revision, please contact SPIE Digital Library Customer Service for assistance.
Lauren M. Otto +7 more
openaire +1 more source
Low temperature plasma-enhanced atomic layer deposition of metal oxide thin films [PDF]
, 2010 Many reported atomic layer deposition (ALD) processes are carried out at elevated temperatures (>150°C), which can be problematic for temperature-sensitive substrates.
Sanden, MCM Richard van de +11 more
core +2 more sources
Nanomaterials, 2023 In the presented study, a novel approach for thermal atomic layer deposition (ALD) of Al2O3 thin films using plasma-activated water (PAW) as a co-reactant, replacing traditionally employed deionized (DI) water, is introduced.
João Chaves +6 more
doaj +1 more source
Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
Crystals, 2020 Direct plasma enhanced-atomic layer deposition (PE-ALD) is adopted for the growth of ZnO on c-Si with native oxide at room temperature. The initial stages of growth both in terms of thickness evolution and crystallization onset are followed ex-situ by a ...
Alberto Perrotta +4 more
doaj +1 more source
Current Directions in Biomedical Engineering, 2021 High quality recording of neuronal activities and electrical stimulation require neurotechnical implants with appropriate electrode material. Iridium oxide (IrOx) is an excellent choice of material due to its biocompatibility, low electrochemical ...
Simon Nicolai +3 more
doaj +1 more source
Journal of Materials Research and Technology, 2023 Aluminum nitride (AlN) film is a promising material which is used in various fields. In this study, AlN films with different plasma powers were grown by remote plasma atomic layer deposition.
Xiao-Ying Zhang +12 more
doaj +1 more source
The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
Nanomaterials, 2021 With the development of industrial civilization, advanced manufacturing technology has attracted widespread concern, including in the aerospace industry.
Guibai Xie +7 more
doaj +1 more source
Plasma atomic layer deposition [PDF]
, 2017 Plasma atomic layer deposition (ALD) is optimized through modulation of the gas residence time during an excited species phase, wherein activated reactant is supplied such as from a plasma.
core +2 more sources
Plasma-enhanced atomic layer deposition of vanadium nitride
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2019 This work describes process development and associated characterization of a plasma-enhanced atomic layer deposition process for vanadium nitride (VN) using tetrakis(dimethylamido)vanadium and nitrogen plasma over a deposition temperature range from 150 to 300 °C.
Alexander C. Kozen +7 more
openaire +1 more source