Results 31 to 40 of about 23,511 (291)

Plasma-Enhanced Molecular Layer Deposition of Phosphane-ene Polymer Films

, 2022
A vapour phase molecular layer deposition (MLD) process generating phosphorus-rich phosphane-ene polymer networks was adapted from known solution phase methods and successfully used in a commercial atomic layer deposition tool.
Christine, McGuiness, Floryan, Decampo, Eden, Goodwin, Paul, Ragogna, Peter, Gordon, Justin, Lomax, Sean, Barry   +6 more
core   +1 more source

Fabrication of Aluminum Oxide Thin-Film Devices Based on Atomic Layer Deposition and Pulsed Discrete Feed Method

Micromachines, 2023
This study demonstrates the low-temperature (
Shih-Chin Lin, Ching-Chiun Wang, Chuen-Lin Tien, Fu-Ching Tung, Hsuan-Fu Wang, Shih-Hsiang Lai   +5 more
doaj   +1 more source

Plasma Enhanced Atomic Layer Deposition of Tantalum (V) Oxide [PDF]

Coatings, 2021
The tantalum oxide thin films are promising materials for various applications: as coatings in optical devices, as dielectric layers for micro and nanoelectronics, and for thin-films solid-state lithium-ion batteries (SSLIBs). This article is dedicated to the Ta-O thin-film system synthesis by the atomic layer deposition (ALD) which allows to deposit ...
Pavel Fedorov, Denis Nazarov, Oleg Medvedev, Yury Koshtyal, Aleksander Rumyantsev, Vladimir Tolmachev, Anatoly Popovich, Maxim Yu Maximov   +7 more
openaire   +1 more source

Surface characterization of plasma-modified low density polyethylene by attenuated total reflectance fourier-transform infrared (ATR-FTIR) spectroscopy combined with chemometrics

Polymer Testing, 2021
Atomic layer deposition (ALD) on polymer substrates often requires a modification of the polymer surface properties. Plasma-enhanced ALD (PE-ALD) process is capable of establishing improved coating/substrate adhesion and layer properties by a plasma pre ...
Réka Lilla Kovács, Máté Csontos, Szilvia Gyöngyösi, János Elek, Bence Parditka, György Deák, Ákos Kuki, Sándor Kéki, Zoltán Erdélyi   +8 more
doaj   +1 more source

Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films [PDF]

ECS Meeting Abstracts, 2013
Abstract not Available.
Ozgit-Akgun, Çağla, Dönmez İnci, Bıyıklı, Necmi   +2 more
openaire   +2 more sources

Plasma-enhanced atomic layer deposition for plasmonic TiN (Erratum) [PDF]

Nanophotonic Materials XIII, 2020
Publisher’s Note: This paper, originally published on 3 October 2016, was replaced with a corrected version on 12 May 2020. If you downloaded the original PDF but are unable to access the revision, please contact SPIE Digital Library Customer Service for assistance.
Lauren M. Otto, Aeron T. Hammack, Shaul Aloni, D. Frank Ogletree, Deirdre L. Olynick, Scott D. Dhuey, Bethanie J. H. Stadler, Adam M. Schwartzberg   +7 more
openaire   +1 more source

Enhanced surface passivation of AlGaN/GaN HEMTs via GaON-engineered interface for improved performance [PDF]

AIP Advances
In this study, we report a novel multi-step surface passivation scheme for AlGaN/GaN high electron mobility transistors, integrating oxygen plasma treatment followed by high-temperature annealing (OPANT), Wet Buffered Oxide Etch (BOE) wet etching, remote
Xiao Wang, Yu-Min Zhang, Liang Wang, Xin-Yu Hao, Ke Xu   +4 more
doaj   +1 more source

An Experimental and Theoretical Study of the Impact of the Precursor Pulse Time on the Growth Per Cycle and Crystallinity Quality of TiO2 Thin Films Grown by ALD and PEALD Technique

Frontiers in Mechanical Engineering, 2020
In this paper, theoretical and experimental approaches were used to evaluate the impact of the precursor's pulse time on the growth per cycle and the crystallinity quality of atomic layer deposited TiO2 thin films on Si(100) and FTO substrates. We employ
William Chiappim, Mariana Amorim Fraga, Homero Santiago Maciel, Homero Santiago Maciel, Rodrigo Sávio Pessoa, Rodrigo Sávio Pessoa   +5 more
doaj   +1 more source

Low temperature plasma-enhanced atomic layer deposition of metal oxide thin films [PDF]

, 2010
Many reported atomic layer deposition (ALD) processes are carried out at elevated temperatures (>150°C), which can be problematic for temperature-sensitive substrates.
Sanden, MCM Richard van de, Potts, SE Stephen, Kessels, WMM Erwin, Langereis, E., Sanden, van de, M.C.M., Keuning, W Wytze, Potts, S.E., Langereis, E Erik, Dingemans, G., Kessels, W.M.M., Dingemans, G Gijs, Keuning, W.   +11 more
core   +1 more source

Novel Energetic Co-Reactant for Thermal Oxide Atomic Layer Deposition: The Impact of Plasma-Activated Water on Al₂O₃ Film Growth

Nanomaterials, 2023
In the presented study, a novel approach for thermal atomic layer deposition (ALD) of Al2O3 thin films using plasma-activated water (PAW) as a co-reactant, replacing traditionally employed deionized (DI) water, is introduced.
João Chaves, William Chiappim, Júlia Karnopp, Benedito Neto, Douglas Leite, Argemiro da Silva Sobrinho, Rodrigo Pessoa   +6 more
doaj   +1 more source