Assessing the Environmental Impact of Atomic Layer Deposition (ALD) Processes and Pathways to Lower It. [PDF]
Due to concerns on resources depletion, climate change, and overall pollution, the quest toward more sustainable processes is becoming crucial. Atomic layer deposition (ALD) is a versatile technology, allowing for the precise coating of challenging substrates with a nanometer control over thickness.
Weber M +7 more
europepmc +6 more sources
Atomic Layer Deposition (ALD) of Metal Gates for CMOS [PDF]
The continuous down-scaling of complementary metal oxide semiconductor (CMOS) field effect transistors (FETs) had been suffering two fateful technical issues, one relative to the thinning of gate dielectric and the other to the aggressive shortening of ...
Chao Zhao, Jinjuan Xiang
doaj +4 more sources
Ultrathin Sb2S3 solar cells processed by atomic-layer additive manufacturing [PDF]
The most conventional atomic layer processing method, atomic layer deposition (ALD), delivers ultrathin blanket coatings with sub-nanometer thickness precision. Lateral confinement underpins the direct atomic layer processing (DALP®) family of deposition
Micah Mc Naire +8 more
doaj +2 more sources
Optical properties of ZnO deposited by atomic layer deposition (ALD) on Si nanowires [PDF]
In this work, we report proof-of-concept results on the synthesis of Si core/ ZnO shell nanowires (SiNWs/ZnO) by combining nanosphere lithography (NSL), metal assisted chemical etching (MACE) and atomic layer deposition (ALD). The structural properties of the SiNWs/ZnO nanostructures prepared were investigated by X-ray diffraction, Raman spectroscopy ...
Igor Iatsunskyi +2 more
exaly +5 more sources
Structure and Properties of ZnO Coatings Obtained by Atomic Layer Deposition (ALD) Method on a Cr-Ni-Mo Steel Substrate Type. [PDF]
Staszuk M +6 more
europepmc +2 more sources
Recent Progress of Atomic Layer Technology in Spintronics: Mechanism, Materials and Prospects
The atomic layer technique is generating a lot of excitement and study due to its profound physics and enormous potential in device fabrication. This article reviews current developments in atomic layer technology for spintronics, including atomic layer ...
Yuanlu Tsai, Zhiteng Li, Shaojie Hu
doaj +1 more source
Investigations of CrN/TiO2 coatings obtained in a hybrid PVD/ALD method on Al-Si-Cu alloy substrate [PDF]
The paper addresses an important scientific topic from the utilitarian point of view concerning the surface treatment of Al-Si-Cu aluminum alloys by PVD/ALD hybrid coating deposition. The influence of the conditions of deposition of titanium oxide in CrN/
Marcin Staszuk
doaj +1 more source
Material manufacturing from atomic layer
Atomic scale engineering of materials and interfaces has become increasingly important in material manufacturing. Atomic layer deposition (ALD) is a technology that can offer many unique properties to achieve atomic-scale material manufacturing ...
Xinwei Wang, Rong Chen, Shuhui Sun
doaj +1 more source
In this paper, we present a study on thermal conductivity and viscosity of nanofluids containing novel atomic layer deposition surface-modified carbon nanosphere (ALD-CNS) and carbon nanopowder (ALD-CNP) core-shell nanocomposites. The nanocomposites were
Marcell Bohus +8 more
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Special Issue “ALD Technique for Functional Coatings of Nanostructured Materials”
Atomic layer deposition (ALD) is a vapor-phase technique that consists of the alternation of separated self-limiting surface reactions, which enable film thickness to be accurately controlled at the angstrom level, based on the former atomic layer ...
Javier Garcia Fernández +2 more
doaj +1 more source

