Atomic Layer Deposition (ALD) to Mitigate Tin Whisker Growth and Corrosion Issues on Printed Circuit Board Assemblies [PDF]
Journal of Electronic Materials, 2019 This paper presents the results of a research program set up to evaluate atomic layer deposition (ALD) conformal coatings as a method of mitigating the growth of tin whiskers from printed circuit board assemblies.
Mark A Ashworth
exaly +4 more sources
Recent Progress of Atomic Layer Technology in Spintronics: Mechanism, Materials and Prospects
Nanomaterials, 2022 The atomic layer technique is generating a lot of excitement and study due to its profound physics and enormous potential in device fabrication. This article reviews current developments in atomic layer technology for spintronics, including atomic layer ...
Yuanlu Tsai, Zhiteng Li, Shaojie Hu
doaj +1 more source
Investigations of CrN/TiO2 coatings obtained in a hybrid PVD/ALD method on Al-Si-Cu alloy substrate [PDF]
Bulletin of the Polish Academy of Sciences: Technical Sciences, 2023 The paper addresses an important scientific topic from the utilitarian point of view concerning the surface treatment of Al-Si-Cu aluminum alloys by PVD/ALD hybrid coating deposition. The influence of the conditions of deposition of titanium oxide in CrN/
Marcin Staszuk
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Material manufacturing from atomic layer
International Journal of Extreme Manufacturing, 2023 Atomic scale engineering of materials and interfaces has become increasingly important in material manufacturing. Atomic layer deposition (ALD) is a technology that can offer many unique properties to achieve atomic-scale material manufacturing ...
Xinwei Wang, Rong Chen, Shuhui Sun
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Nanomaterials, 2022 In this paper, we present a study on thermal conductivity and viscosity of nanofluids containing novel atomic layer deposition surface-modified carbon nanosphere (ALD-CNS) and carbon nanopowder (ALD-CNP) core-shell nanocomposites. The nanocomposites were
Marcell Bohus +8 more
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Special Issue “ALD Technique for Functional Coatings of Nanostructured Materials”
Nanomaterials, 2022 Atomic layer deposition (ALD) is a vapor-phase technique that consists of the alternation of separated self-limiting surface reactions, which enable film thickness to be accurately controlled at the angstrom level, based on the former atomic layer ...
Javier Garcia Fernández +2 more
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Epitaxy from a Periodic Y–O Monolayer: Growth of Single-Crystal Hexagonal YAlO3 Perovskite
Nanomaterials, 2020 The role of an atomic-layer thick periodic Y–O array in inducing the epitaxial growth of single-crystal hexagonal YAlO3 perovskite (H-YAP) films was studied using high-angle annular dark-field and annular bright-field scanning transmission electron ...
Minghwei Hong +7 more
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Journal of Information Display, 2023 Area-selective atomic layer deposition (AS-ALD) has been studied as an alternative method for metal oxide ALD film patterning in the microelectronics industry. To perform AS-ALD, area-deactivation or -activation processes should be implemented in advance
Jun Ho Yu +4 more
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Formation of Micro- and Nanostructures on the Nanotitanium Surface by Chemical Etching and Deposition of Titania Films by Atomic Layer Deposition (ALD) [PDF]
Materials, 2015 Denis Nazarov +2 more
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Cathodic Functional Layer via Sputtering and Atomic Layer Deposition for Thin-Film Solid Oxide Fuel Cells [PDF]
한국정밀공학회지, 2022 In this study, Yttria-stabilized zirconia (YSZ) functional layers were applied with different thin-film fabrication process such as sputtering and atomic layer deposition (ALD) to enhance oxygen reduction reaction (ORR) for solid oxide fuel cells.
Jaeyoon Lee +7 more
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