Results 11 to 20 of about 7,248 (265)

Area-selective atomic layer deposition of Al2O3 using inkjet-printed inhibition patterns and lift-off process

Journal of Information Display, 2023
Area-selective atomic layer deposition (AS-ALD) has been studied as an alternative method for metal oxide ALD film patterning in the microelectronics industry. To perform AS-ALD, area-deactivation or -activation processes should be implemented in advance
Jun Ho Yu, Young–In Cho, Jae–Wook Lee, Kyung Hyun Choi, Sang–Ho Lee   +4 more
doaj   +1 more source

Cathodic Functional Layer via Sputtering and Atomic Layer Deposition for Thin-Film Solid Oxide Fuel Cells [PDF]

한국정밀공학회지, 2022
In this study, Yttria-stabilized zirconia (YSZ) functional layers were applied with different thin-film fabrication process such as sputtering and atomic layer deposition (ALD) to enhance oxygen reduction reaction (ORR) for solid oxide fuel cells.
Jaeyoon Lee, Sanghyeok Lee, Hyeontaek Kim, Yongchan Park, Geunjin Lee, Changheon Lee, Sunggyu Choi, Soonwook Hong   +7 more
doaj   +1 more source

Monitoring Surface Stoichiometry, Work Function and Valance Band of Tungsten Oxide (WO₃), Molybdenum Oxide (MoO₃) and Tin Oxide (SnO₂) Thin Films as a Function of Temperature and Oxygen Partial Pressure with Advanced Surface Sensitive Techniques for Chemical Sensing Applications

Proceedings, 2019
Atomic layer deposition (ALD) is a chemical vapor deposition (CVD) deposition method inwhich high-quality [...]
Engin Ciftyurek, Martin Wilken, David Zanders, Lukas Mai, Anjana Devi, Klaus D. Schierbaum   +5 more
doaj   +1 more source

Atomic Layer Deposition of ZnO on Mesoporous Silica: Insights into Growth Behavior of ZnO via In-Situ Thermogravimetric Analysis

Nanomaterials, 2020
ZnO is a remarkable material with many applications in electronics and catalysis. Atomic layer deposition (ALD) of ZnO on flat substrates is an industrially applied and well-known process.
Piyush Ingale, Kristian Knemeyer, Mar Piernavieja Hermida, Raoul Naumann d’Alnoncourt, Arne Thomas, Frank Rosowski   +5 more
doaj   +1 more source

Monocyte Differentiation on Atomic Layer-Deposited (ALD) Hydroxyapatite Coating on Titanium Substrate

Molecules, 2023
Hydroxyapatite (HA; Ca10(PO4)6(OH)2) coating of bone implants has many beneficial properties as it improves osseointegration and eventually becomes degraded and replaced with new bone. We prepared HA coating on a titanium substrate with atomic layer deposition (ALD) and compared monocyte differentiation and material resorption between ALD-HA and bone ...
Elina Kylmäoja, Faleh Abushahba, Jani Holopainen, Mikko Ritala, Juha Tuukkanen   +4 more
openaire   +5 more sources

Atomic layer deposition to heterostructures for application in gas sensors

International Journal of Extreme Manufacturing, 2023
Atomic layer deposition (ALD) is a versatile technique to deposit metals and metal oxide sensing materials at the atomic scale to achieve improved sensor functions.
Hongyin Pan, Lihao Zhou, Wei Zheng, Xianghong Liu, Jun Zhang, Nicola Pinna   +5 more
doaj   +1 more source

Atomic layer deposition of thin films: from a chemistry perspective

International Journal of Extreme Manufacturing, 2023
Atomic layer deposition (ALD) has become an indispensable thin-film technology in the contemporary microelectronics industry. The unique self-limited layer-by-layer growth feature of ALD has outstood this technology to deposit highly uniform conformal ...
Jinxiong Li, Gaoda Chai, Xinwei Wang
doaj   +1 more source

Molecular Dynamics of Atomic Layer Deposition: Sticking Coefficient Investigation

Applied Sciences, 2022
This study focused on the atomic scale growth dynamics of amorphous Al2O3 films microscale structural relaxation. Classical Molecular Dynamics (MD) can not entirely model the challenging ALD dynamics due to the large timescales. The all-atom approach has
Thokozane Justin Kunene, Lagouge Kwanda Tartibu, Sina Karimzadeh, Peter Ozaveshe Oviroh, Kingsley Ukoba, Tien-Chien Jen   +5 more
doaj   +1 more source

Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction

Electrochemistry Communications, 2019
Electrodeposited cobalt phosphate has been reported as a valid alternative to noble metals as an electrocatalyst for the Oxygen Evolution Reaction (OER).
V. Di Palma, G. Zafeiropoulos, T. Goldsweer, W.M.M. Kessels, M.C.M. van de Sanden, M. Creatore, M.N. Tsampas   +6 more
doaj   +1 more source

Surface smoothing effect of an amorphous thin film deposited by atomic layer deposition on a surface with nano-sized roughness

AIP Advances, 2014
Previously, Lau (one of the authors) pointed out that the deposition of an amorphous thin film by atomic layer deposition (ALD) on a substrate with nano-sized roughness probably has a surface smoothing effect.
W. S. Lau, J. Zhang, X. Wan, J. K. Luo, Y. Xu, H. Wong   +5 more
doaj   +1 more source