Results 11 to 20 of about 30,611 (305)

Atomic Layer Deposition (ALD) of Metal Gates for CMOS [PDF]

open access: yesApplied Sciences, 2019
The continuous down-scaling of complementary metal oxide semiconductor (CMOS) field effect transistors (FETs) had been suffering two fateful technical issues, one relative to the thinning of gate dielectric and the other to the aggressive shortening of ...
Chao Zhao, Jinjuan Xiang
doaj   +2 more sources

Assessing the Environmental Impact of Atomic Layer Deposition (ALD) Processes and Pathways to Lower It. [PDF]

open access: yesACS Mater Au, 2023
Due to concerns on resources depletion, climate change, and overall pollution, the quest toward more sustainable processes is becoming crucial. Atomic layer deposition (ALD) is a versatile technology, allowing for the precise coating of challenging substrates with a nanometer control over thickness.
Weber M   +7 more
europepmc   +4 more sources

Atomic layer deposition (ALD) on inorganic or polymeric membranes [PDF]

open access: yesJournal of Applied Physics, 2019
Membranes can be defined as physical barriers allowing the selective transport of species. This tutorial aims to provide the basics of membrane technologies and materials, the fundamentals of the atomic layer deposition (ALD) technique, and, most importantly, to describe how to efficiently perform ALD on different membrane substrates.
Matthieu Weber   +3 more
openaire   +1 more source

Monitoring Surface Stoichiometry, Work Function and Valance Band of Tungsten Oxide (WO3), Molybdenum Oxide (MoO3) and Tin Oxide (SnO2) Thin Films as a Function of Temperature and Oxygen Partial Pressure with Advanced Surface Sensitive Techniques for Chemical Sensing Applications

open access: yesProceedings, 2019
Atomic layer deposition (ALD) is a chemical vapor deposition (CVD) deposition method inwhich high-quality [...]
Engin Ciftyurek   +5 more
doaj   +1 more source

Bifunctional earth-abundant phosphate/phosphide catalysts prepared via atomic layer deposition for electrocatalytic water splitting [PDF]

open access: yes, 2019
The development of active and stable earth-abundant catalysts for hydrogen and oxygen evolution is one of the requirements for successful production of solar fuels.
Dendooven, Jolien   +7 more
core   +2 more sources

Atomic Layer Deposition of ZnO on Mesoporous Silica: Insights into Growth Behavior of ZnO via In-Situ Thermogravimetric Analysis

open access: yesNanomaterials, 2020
ZnO is a remarkable material with many applications in electronics and catalysis. Atomic layer deposition (ALD) of ZnO on flat substrates is an industrially applied and well-known process.
Piyush Ingale   +5 more
doaj   +1 more source

Chemical vapour deposition and atomic layer deposition of amorphous and nanocrystalline metallic coatings: towards deposition of multimetallic films [PDF]

open access: yes, 2009
This paper provides a prospective insight on chemical vapour deposition (CVD) and atomic layer deposition (ALD) as dry techniques for the processing of amorphous and nanocrystalline metallic thin films.
Blanquet, Elisabeth   +3 more
core   +5 more sources

GaAs interfacial self-cleaning by atomic layer deposition [PDF]

open access: yes, 2008
The reduction and removal of surface oxides from GaAs substrates by atomic layer deposition (ALD) of Al2O3 and HfO2 are studied using in situ monochromatic x-ray photoelectron spectroscopy.
A. M. Sonnet   +12 more
core   +1 more source

Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition [PDF]

open access: yes, 2016
We report the design of a mobile setup for synchrotron based in situ studies during atomic layer processing. The system was designed to facilitate in situ grazing incidence small angle x-ray scattering (GISAXS), x-ray fluorescence (XRF), and x-ray ...
Alessandro Coati   +10 more
core   +2 more sources

Atomic layer deposition to heterostructures for application in gas sensors

open access: yesInternational Journal of Extreme Manufacturing, 2023
Atomic layer deposition (ALD) is a versatile technique to deposit metals and metal oxide sensing materials at the atomic scale to achieve improved sensor functions.
Hongyin Pan   +5 more
doaj   +1 more source

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