Copper reduction and atomic layer deposition by oxidative decomposition of formate by hydrazine [PDF]
, 2014 We have used density functional theory (DFT) to study the mechanism of three step atomic layer deposition (ALD) of copper via formate and hydrazine.
Dey, Gangotri, Elliott, Simon D.
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Atomic layer deposition of thin films: from a chemistry perspective
International Journal of Extreme Manufacturing, 2023 Atomic layer deposition (ALD) has become an indispensable thin-film technology in the contemporary microelectronics industry. The unique self-limited layer-by-layer growth feature of ALD has outstood this technology to deposit highly uniform conformal ...
Jinxiong Li, Gaoda Chai, Xinwei Wang
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Molecular Dynamics of Atomic Layer Deposition: Sticking Coefficient Investigation
Applied Sciences, 2022 This study focused on the atomic scale growth dynamics of amorphous Al2O3 films microscale structural relaxation. Classical Molecular Dynamics (MD) can not entirely model the challenging ALD dynamics due to the large timescales. The all-atom approach has
Thokozane Justin Kunene +5 more
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Design and characterisation of titanium nitride sub-arrays of kinetic inductance detectors for passive terahertz imaging [PDF]
, 2018 We report on the investigation of titanium nitride (TiN) thin films deposited via atomic layer deposition (ALD) for microwave kinetic inductance detectors (MKID).
Banerjee, Archan +7 more
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AIP Advances, 2014 Previously, Lau (one of the authors) pointed out that the deposition of an amorphous thin film by atomic layer deposition (ALD) on a substrate with nano-sized roughness probably has a surface smoothing effect.
W. S. Lau +5 more
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Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
Electrochemistry Communications, 2019 Electrodeposited cobalt phosphate has been reported as a valid alternative to noble metals as an electrocatalyst for the Oxygen Evolution Reaction (OER).
V. Di Palma +6 more
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Area‐selective atomic layer deposition on HOPG enabled by writable electron beam functionalization
Nano Select, 2022 Area‐selective atomic layer deposition (AS‐ALD) techniques are an emerging class of bottom‐up nanofabrication techniques that selectively deposit patterned ALD films without the need for conventional top‐down lithography. To achieve this patterning, most
Gordon Koerner +5 more
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Improved Monolayer MoS Performance With Two-Step Atomic Layer Deposited High- Dielectrics
IEEE Journal of the Electron Devices Society, 2022 Gate dielectric engineering is crucial to enable two-dimensional (2D) transition metal dichalcogenides (TMDs) for logic transistor applications. In this work, we demonstrate a uniform and pinhole-free bilayer high-κ fabricated on monolayer (1L ...
Bo-Jhih Chou +3 more
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Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor [PDF]
, 2013 Two novel N-heterocyclic carbene (NHC)-containing copper(I) amides are reported as atomic layer deposition (ALD) precursors. 1,3-Diisopropyl-imidazolin-2-ylidene copper hexamethyldisilazide (1) and 4,5-dimethyl-1,3-diisopropyl-imidazol-2-ylidene copper ...
Barry, Seán T. +8 more
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Nanoscale Au-ZnO heterostructure developed by atomic layer deposition towards amperometric H2O2 detection [PDF]
, 2020 Nanoscale Au-ZnO heterostructures were fabricated on 4-in. SiO2/Si wafers by the atomic layer deposition (ALD) technique. Developed Au-ZnO heterostructures after post-deposition annealing at 250 degrees C were tested for amperometric hydrogen peroxide ...
Hu, Jie +4 more
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