Results 21 to 30 of about 2,787,827 (292)
Atomic layer deposition to heterostructures for application in gas sensors
International Journal of Extreme Manufacturing, 2023 Atomic layer deposition (ALD) is a versatile technique to deposit metals and metal oxide sensing materials at the atomic scale to achieve improved sensor functions.
Hongyin Pan +5 more
doaj +1 more source
Molecules, 2023 Hydroxyapatite (HA; Ca10(PO4)6(OH)2) coating of bone implants has many beneficial properties as it improves osseointegration and eventually becomes degraded and replaced with new bone. We prepared HA coating on a titanium substrate with atomic layer deposition (ALD) and compared monocyte differentiation and material resorption between ALD-HA and bone ...
Elina Kylmäoja +4 more
openaire +5 more sources
Further Development of Surface Metrology Methods for Predicting the Functional Performance of Flexible PV Barrier Films [PDF]
, 2013 Surface topography analysis plays a very significant role in determining the functional performance for many engineering surfaces. In this paper, feature characterisation techniques, based on the ‘Wolf pruning’ method are implemented to characterise ...
Sweeney, Francis +7 more
core +1 more source
Detailed study of copper oxide ALD on SiO2, TaN, and Ru
, 2022 1 S.Copper films with a thickness in the nanometer range are required as seed layers for the electrochemical Cu deposition to form multilevel interconnects in ultralarge-scale integrated (ULSI) electronic devices. Continuously shrinking device dimensions
Roth, N. +8 more
core +1 more source
AIP Advances, 2014 Previously, Lau (one of the authors) pointed out that the deposition of an amorphous thin film by atomic layer deposition (ALD) on a substrate with nano-sized roughness probably has a surface smoothing effect.
W. S. Lau +5 more
doaj +1 more source
Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
Electrochemistry Communications, 2019 Electrodeposited cobalt phosphate has been reported as a valid alternative to noble metals as an electrocatalyst for the Oxygen Evolution Reaction (OER).
V. Di Palma +6 more
doaj +1 more source
Atomic layer deposition of thin films: from a chemistry perspective
International Journal of Extreme Manufacturing, 2023 Atomic layer deposition (ALD) has become an indispensable thin-film technology in the contemporary microelectronics industry. The unique self-limited layer-by-layer growth feature of ALD has outstood this technology to deposit highly uniform conformal ...
Jinxiong Li, Gaoda Chai, Xinwei Wang
doaj +1 more source
Implementation of in Process Surface Metrology for R2R Flexible PV Barrier Films [PDF]
, 2015 Thin functional barrier layers of aluminum oxide (Al2O3) that are used particularly in photovoltaic (PV) modules to prevent the possibility of water vapor ingress should be applied over the entire PV surface without any defects.
Gao, F. +4 more
core +4 more sources
Molecular Dynamics of Atomic Layer Deposition: Sticking Coefficient Investigation
Applied Sciences, 2022 This study focused on the atomic scale growth dynamics of amorphous Al2O3 films microscale structural relaxation. Classical Molecular Dynamics (MD) can not entirely model the challenging ALD dynamics due to the large timescales. The all-atom approach has
Thokozane Justin Kunene +5 more
doaj +1 more source
Monolayer MoS<sub>2</sub> With Ultrahigh Piezoelectricity: From ALD Dose Control to Device Performance. [PDF]
Adv Sci (Weinh)This study demonstrates that controlling precursor dosages in atomic layer deposition (ALD) serves to regulate ultrathin oxide quality, which in turn determines sulfurization behavior and MoS2 monolayer continuity. The resulting continuous, low‐defect monolayers enable improved piezoelectric performance and support a flexible slippage sensor, linking ...
Li Y +16 more
europepmc +2 more sources