Results 31 to 40 of about 30,611 (305)

Monocyte Differentiation on Atomic Layer-Deposited (ALD) Hydroxyapatite Coating on Titanium Substrate

Molecules, 2023
Hydroxyapatite (HA; Ca10(PO4)6(OH)2) coating of bone implants has many beneficial properties as it improves osseointegration and eventually becomes degraded and replaced with new bone. We prepared HA coating on a titanium substrate with atomic layer deposition (ALD) and compared monocyte differentiation and material resorption between ALD-HA and bone ...
Elina Kylmäoja, Faleh Abushahba, Jani Holopainen, Mikko Ritala, Juha Tuukkanen   +4 more
openaire   +5 more sources

Ultrathin Amorphous Silica Membrane Enhances Proton Transfer across Solid-to-Solid Interfaces of Stacked Metal Oxide Nanolayers while Blocking Oxygen [PDF]

, 2020
A large jump of proton transfer rates across solid-to-solid interfaces by inserting an ultrathin amorphous silica layer into stacked metal oxide nanolayers is discovered using electrochemical impedance spectroscopy and Fourier-transform infrared ...
Frei, H, Jo, WJ, Katsoukis, G
core   +2 more sources

Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films

Beilstein Journal of Nanotechnology, 2013
We report on results on the preparation of thin (
Jörg Haeberle, Karsten Henkel, Hassan Gargouri, Franziska Naumann, Bernd Gruska, Michael Arens, Massimo Tallarida, Dieter Schmeißer   +7 more
doaj   +1 more source

Fabrication of Nb/Al2O3/Nb Josephson Junctions using in situ Magnetron Sputtering and Atomic Layer Deposition

, 2013
Atomic layer deposition (ALD) provides a promising approach for deposition of ultrathin low-defect-density tunnel barriers, and it has been implemented in a high-vacuum magnetron sputtering system for in situ deposition of ALD-Al2O3 tunnel barriers in ...
Elliot, Alan J., Ewing, Daniel J., Han, Siyuan, Lewis, Rupert M., Lu, Rongtao, Mao, Bo, Schulze, Heidi M., Talvacchio, John, Wille, Logan, Wu, Judy Z., Xue, G. M., Yu, H. F., Zhao, S. P.   +12 more
core   +1 more source

Application of a Pd-TiO2 nanotube/Ti electrode prepared by atomic layer deposition to reductive dechlorination of trichloroethylene

Electrochemistry Communications, 2019
Trichloroethylene (TCE) is a toxic carcinogen. Electrocatalytic hydrodechlorination is a very effective and safe method for degrading TCE and does not produce any secondary pollution.
Jueming Lu, JianGuo Bao, Xueshi Lu, Dan Zheng, Xiaobin Li   +4 more
doaj   +1 more source

Structure and Dielectric Property of High-k ZrO2 Films Grown by Atomic Layer Deposition Using Tetrakis(Dimethylamido)Zirconium and Ozone

Nanoscale Research Letters, 2019
s High-k metal oxide films are vital for the future development of microelectronics technology. In this work, ZrO2 films were grown on silicon by atomic layer deposition (ALD) using tetrakis(dimethylamido)zirconium and ozone as precursors. The relatively
Junqing Liu, Junpeng Li, Jianzhuo Wu, Jiaming Sun   +3 more
doaj   +1 more source

The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology

Nanomaterials, 2021
With the development of industrial civilization, advanced manufacturing technology has attracted widespread concern, including in the aerospace industry.
Guibai Xie, Hongwu Bai, Guanghui Miao, Guobao Feng, Jing Yang, Yun He, Xiaojun Li, Yun Li   +7 more
doaj   +1 more source

Efficient Planar Perovskite Solar Cells Using Passivated Tin Oxide as an Electron Transport Layer

Advanced Science, 2018
Planar perovskite solar cells using low‐temperature atomic layer deposition (ALD) of the SnO2 electron transporting layer (ETL), with excellent electron extraction and hole‐blocking ability, offer significant advantages compared with high‐temperature ...
Yonghui Lee, Seunghwan Lee, Gabseok Seo, Sanghyun Paek, Kyung Taek Cho, Aron J. Huckaba, Marco Calizzi, Dong‐won Choi, Jin‐Seong Park, Dongwook Lee, Hyo Joong Lee, Abdullah M. Asiri, Mohammad Khaja Nazeeruddin   +12 more
doaj   +1 more source

(Invited) Vacuum Ultraviolet Photochemical Atomic Layer Deposition of Alumina and Titania Films [PDF]

, 2015
Conventional atomic layer deposition (ALD) is a thermo-chemical process where co-reagents are sequentially pulsed in cycles onto a heated substrate. As an alternative to substrate heating, various forms of other “non-thermal” ALD processes are being ...
Brunell, Ian F, Chalker, Paul Raymond, Dawson, Karl, Hall, Stephen, Marshall, Paul A, Potter, Richard J, Sedghi, Naser, Sutcliffe, Christopher J   +7 more
core   +1 more source

Advances in the application of atomic layer deposition in gas sensors

Gongneng cailiao yu qijian xuebao
Atomic layer deposition (ALD) represents a high-precision thin film deposition technique, distinguished by its sub-nanometer thickness control, superior uniformity, and unique three-dimensional conformality.
Fayu SONG, Jingyuan ZHANG, Weijin LI, Min TU   +3 more
doaj   +1 more source