Results 31 to 40 of about 2,787,827 (292)
Area‐selective atomic layer deposition on HOPG enabled by writable electron beam functionalization
Nano Select, 2022 Area‐selective atomic layer deposition (AS‐ALD) techniques are an emerging class of bottom‐up nanofabrication techniques that selectively deposit patterned ALD films without the need for conventional top‐down lithography. To achieve this patterning, most
Gordon Koerner +5 more
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Improved Monolayer MoS Performance With Two-Step Atomic Layer Deposited High- Dielectrics
IEEE Journal of the Electron Devices Society, 2022 Gate dielectric engineering is crucial to enable two-dimensional (2D) transition metal dichalcogenides (TMDs) for logic transistor applications. In this work, we demonstrate a uniform and pinhole-free bilayer high-κ fabricated on monolayer (1L ...
Bo-Jhih Chou +3 more
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Tuning the Electrical Properties of Titanium Oxide Bilayers Prepared by Atomic Layer Deposition at Different Temperatures [PDF]
, 2019 Carrier‐selective contacts prepared by atomic layer deposition (ALD) have received significant attention for developing high‐efficiency solar cells. Herein, the electrical properties of titanium oxide (TiOx) prepared by ALD are manipulated by modulating ...
Noritaka Usami +7 more
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PbI2 nanocrystal growth by atomic layer deposition of Pb(tmhd)2 and HI [PDF]
, 2022 Atomic layer deposition (ALD) allows for a great level of control over the thickness and stoichiometry of materials. ALD provides a suitable route to deposit lead halides, which can further be converted to perovskite for photovoltaics, photoemission, and
Juan-Pablo, Correa-Baena +8 more
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ALD of Copper and Copper Oxide Thin Films for Applications in Metallization Systems of ULSI Devices
, 2022 17 FolienAs a possible alternative for growing seed layers required for electrochemical Cu deposition of metallization systems in ULSI circuits, the atomic layer deposition (ALD) of Cu is under consideration. To avoid drawbacks related to plasma-enhanced
Waechtler, T. +5 more
core +1 more source
Beilstein Journal of Nanotechnology, 2013 We report on results on the preparation of thin (
Jörg Haeberle +7 more
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Modelling water vapor permeability through atomic layer deposition coated photovoltaic barrier defects [PDF]
, 2014 Transparent barrier films such as Al2O3 used for prevention of oxygen and/or water vapour permeation are the subject of increasing research interest when used for the encapsulation of flexible photovoltaic modules.
Robbins, David +5 more
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, 2022 2038The atomic layer deposition (ALD) of copper oxide films from [(nBu3P)2Cu(acac)] and wet oxygen on SiO2 and TaN has been studied in detail by spectroscopic ellipsometry and atomic force microscopy. The results suggest island growth on SiO2, along with
Waechtler, T. +9 more
core +1 more source
Highly Material Selective and Self‐Aligned Photo‐assisted Atomic Layer Deposition of Copper on Oxide Materials [PDF]
, 2021 There is a growing need for bottom-up fabrication methods in microelectronic industry as top-down, lithography-based methods face increasing challenges.
Mizohata, Kenichiro +9 more
core +1 more source
Electrochemistry Communications, 2019 Trichloroethylene (TCE) is a toxic carcinogen. Electrocatalytic hydrodechlorination is a very effective and safe method for degrading TCE and does not produce any secondary pollution.
Jueming Lu +4 more
doaj +1 more source