Results 31 to 40 of about 7,248 (265)

From atomic interfaces to scalable nanocrystal light-emitting diodes

Journal of Information Display
Atomic layer deposition (ALD) heralds a paradigm-shifting revolution in atomic-scale interface engineering for semiconductor nanocrystal light-emitting diodes (SNC-LEDs), elegantly unifying colloidal quantum dots (cQDs) and metal-halide perovskite ...
Rakesh Kumar Jha, Min Seok Kim, Eun A Kim, Seong-Yong Cho   +3 more
doaj   +1 more source

High‐Performance Graphene‐Dielectric Interface by UV‐Assisted Atomic Layer Deposition for Graphene Field Effect Transistor

Advanced Electronic Materials, 2023
The deposition of high‐quality dielectric films on graphene surfaces is crucial in fabricating high‐performance graphene‐based electronics. In this study, the first application of UV‐assisted atomic layer deposition (UV‐ALD) to graphene surfaces and the ...
Geonwoo Park, Dohyun Go, Sungchan Jo, Tae Hoon Lee, Jeong Woo Shin, Jihwan An   +5 more
doaj   +1 more source

Investigation of the initial deposition steps and the interfacial layer of Atomic Layer Deposited (ALD) Al2O3 on Si [PDF]

Applied Surface Science, 2019
During the first stages of Atomic Layer Deposition (ALD) of Al 2 O 3 on silicon (Si), the substrate nature affects the surface chemistry, leading to an initial island growth mode. Furthermore, an interfacial zone develops between the Si surface and the dielectric, thus damaging the physical properties of the deposited structure. In this work, these two
Gakis, Giorgos, Vahlas, Constantin, Vergnes, Hugues, Dourdain, Sandrine, Tison, Yann, Martinez, Hervé, Bour, Jerôme, Ruch, David, Boudouvis, Andreas, Caussat, Brigitte, Scheid, Emmanuel   +10 more
openaire   +4 more sources

Electrode and Microstructure Dependence of Oxygen Diffusion in Ferroelectric Hafnium Zirconium Oxide Thin Films

Advanced Functional Materials, EarlyView.
Significant nanoscale oxygen diffusion coefficient variations are measured in ferroelectric hafnium zirconium oxide films with grain boundaries and electrode interfaces exhibiting values 104 times larger than the grain cores. Overall coefficients are 10X larger for films prepared with metal nitride electrodes compared to refractory metals. New insights
Liron Shvilberg, Thomas W. Pfeifer, Chuanzhen Zhou, Yong Kyu Choi, Duk‐Hyun Choe, Patrick E. Hopkins, Jon F. Ihlefeld   +6 more
wiley   +1 more source

High‐Index, Low‐Loss Optical Material Platforms for Ultra‐Broadband Ultraviolet‐to‐Visible Achromatic Metalenses

Advanced Functional Materials, EarlyView.
An integrated material platform combining engineered SiNx thin films and printable ZrO2 nanoparticle‐embedded resin enables broadband achromatic metalenses from the ultraviolet to visible range. The demonstrated meta‐optics achieve near‐diffraction‐limited focusing with minimal chromatic aberration.
Hyunjung Kang, Dongmin Jeon, Eunji Lee, Junsuk Rho   +3 more
wiley   +1 more source

Thermal stability of interface dipole modulation in atomic layer-deposited HfO2/SiO2 multi-stack structures

AIP Advances, 2020
In this paper, we report on an interface dipole modulation (IDM) loss occurring in HfO2/atomically thin TiO2/SiO2 stack structures prepared by atomic layer deposition (ALD).
Shutaro Asanuma, Kyoko Sumita, Yusuke Miyaguchi, Kazumasa Horita, Takehito Jimbo, Kazuya Saito, Noriyuki Miyata   +6 more
doaj   +1 more source

Atomic layer deposition: A versatile technique for plasmonics and nanobiotechnology [PDF]

Journal of Materials Research, 2012
Abstract
Hyungsoon, Im, Nathan J, Wittenberg, Nathan C, Lindquist, Sang-Hyun, Oh   +3 more
openaire   +2 more sources

Designed Lewis Acid–Base Passivation for High Performance Perovskite Solar Cells

Advanced Functional Materials, EarlyView.
ABSTRACT Silicon's high cost and long energy payback time remain major barriers to the global expansion of solar power. In contrast, metal–halide perovskites offer abundant, solution‐processable absorbers, and have achieved efficiencies of 25%–30%, positioning them as strong competitors to silicon.
Afna Manaf, Hiba Shahulhameed, Bhabani Sankar Swain, Shengzhong (Frank) Liu, Adel Najar   +4 more
wiley   +1 more source

Blood Biomarkers and Surface‐Enhanced Raman Spectroscopy for Gout: A Comprehensive Review

Advanced Functional Materials, EarlyView.
Schematic illustrating gout disease progression from asymptomatic hyperuricemia to chronic tophaceous disease, highlighting the limitations of conventional imaging and biochemical diagnostics and the potential of engineered SERS platforms for ultrasensitive blood‐based detection of urate‐related biomarkers across disease stages, with the color gradient
Isuri Perera, Chiranjeevi Kanike, Appurva Tiwari, Hongyan Wu, Larry D. Unsworth, Ben Bin Xu, Xuehua Zhang   +6 more
wiley   +1 more source

A Review on Performance Improvement of Solid Oxide Cells via Atomic Layer Deposition [PDF]

한국정밀공학회지
Atomic Layer Deposition (ALD) has emerged as a promising technique for fabricating thin films that enhance the performance of solid oxide fuel cells and solid oxide electrolysis cells. ALD allows for precise control over film thickness and composition at
Min Seong Gwon, Kyoungjae Ju, Jihwan An
doaj   +1 more source