Results 151 to 160 of about 54,913 (297)

Dynamic Interfacial Redox Mediation for Sustainable Electrocatalysis

open access: yes
Rare Metals, EarlyView.
Kun Wang   +3 more
wiley   +1 more source

THE STRUCTURE OF THIN SILICON LAYERS WITH CONCENTRATION OF IMPLANTED CARBON NC/NSI=0.12

open access: yesВестник. Серия физическая, 2008
The structure, phase and elemental composition of implanted Si layer with carbon concentration NC/NSi = 0.12 were studied by transmission electron microscopy, X-ray diffraction, Auger spectroscopy, IR spectroscopy and atom force microscopy.
N.B. Beisenkhanov
doaj  

Depth profile measurements of an anodizing aluminium oxide film by Auger electron spectroscopy.

open access: diamond, 1991
Isao Kojima   +5 more
openalex   +2 more sources

Using In Situ TEM to Understand the Surfaces of Electrocatalysts at Reaction Conditions: Single‐Atoms to Nanoparticles

open access: yesAdvanced Functional Materials, Volume 36, Issue 11, 5 February 2026.
This review summarizes recent advances in closed‐cell in situ TEM strategies for accurate determination of the activity and stability of single‐atom catalyst systems during operation. Operando conditions causing dynamic changes of SAC systems are highlighted and we explain why ensemble average‐based optical techniques may benefit from the technological
Martin Ek   +4 more
wiley   +1 more source

Applications of New Hyper Spectral Map Method by Auger Electron Spectroscopy [PDF]

open access: bronze
Kenichi Tsutsumi   +7 more
openalex   +1 more source

Universal and Nondestructive Direct Photolithography of Colloidal Quantum Dots Using Photocrosslinkable Polymer Blends

open access: yesAdvanced Functional Materials, Volume 36, Issue 10, 2 February 2026.
A universal and nondestructive direct photolithography method enables high‐resolution quantum dot (QD) patterning without ligand exchange. By blending QDs with a photocrosslinkable polymer, this approach preserves the optical properties and enhances the QD‐LED efficiency and lifetime.
Jaeyeop Lee   +15 more
wiley   +1 more source

Ultrathin Monatomic Antimony Films by Sacrificial Atomic Layer Deposition for Phase Change Memory

open access: yesAdvanced Materials, Volume 38, Issue 8, 6 February 2026.
A three‐step sacrificial atomic layer deposition (s‐ALD) process enables wafer‐scale growth of ultrathin and uniform antimony (Sb) thin films. An ultrathin (≈4 nm) Sb film is uniformly deposited with its characteristic bilayer structure (Sb‐Sb) aligned along the substrate.
Gwangsik Jeon   +9 more
wiley   +1 more source

Using Auger Transitions as a Route to Determine the Oxidation State of Copper in High-Pressure Electron Spectroscopy

open access: green
Markus Soldemo   +8 more
openalex   +1 more source

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