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Potential of a cerium hexaboride electron gun as a monochromatic and high current beam via a virtual source mode. [PDF]

Sci Rep
Lee HR, Haam Y, Ogawa T, Hwang J, Lee JW, Jung H, Kim J, Yun DJ, Seo I, Park S, Lee S, Park IY.   +11 more
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A beam source model for scanned proton beams

Physics in Medicine and Biology, 2007
A beam source model, i.e. a model for the initial phase space of the beam, for scanned proton beams has been developed. The beam source model is based on parameterized particle sources with characteristics found by fitting towards measured data per individual beam line.
Peter, Kimstrand, Erik, Traneus, Anders, Ahnesjö, Erik, Grusell, Bengt, Glimelius, Nina, Tilly   +5 more
openaire   +2 more sources

Virtual source for an Airy beam

Optics Letters, 2012
We identify a virtual source for generating an Airy wave. A spectral integral expression is derived to describe the Airy wave, which, in the paraxial limit, yields the freely accelerating, nondiffracting, and finite energy Airy beam. From the spectral representation of the Airy wave, the first two orders of nonparaxial corrections to the paraxial Airy ...
Yan, Shaohui, Yao, Baoli, Lei, Ming, Dan, Dan, Yang, Yanlong, Gao, Peng   +5 more
openaire   +2 more sources

Virtual source of a Pearcey beam

Optics Letters, 2014
A virtual source that yields a family of a Pearcey wave is demonstrated. A closed-form expression is derived for the Pearcey wave that simplifies to the paraxial Pearcey beam (PB) in the appropriate limit. From the perturbative series representation of a complex-source-point spherical wave, an infinite series nonparaxial correction expression for a PB ...
Dongmei, Deng, Chidao, Chen, Xin, Zhao, Bo, Chen, Xi, Peng, Yushan, Zheng   +5 more
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A beam transport system for an intense He− beam source

Review of Scientific Instruments, 2008
We have been developing a test stand for fast He0 beam production. One of the major issues is how to transport effectively the He+ and He− beams from which the He0 beam is produced. The beam should be focused in two transverse focal points, the center of the charge exchange cell and the electrostatic accelerator.
N, Tanaka, M, Kikuchi, T, Nagamura, H, Sugawara, S, Takeuchi, T, Kobuchi, A, Okamoto, K, Shinto, S, Kitajima, M, Sasao, M, Wada   +10 more
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Atomic Beam Sources

2023
LHCspin kick-off meeting, CERN, Switzerland, 18 Dec 2023 - 18 Dec ...
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Atom beam source

Vacuum, 1984
Abstract Ion beam V etching may give rise to undesirable effects such as uneven erosion and ion migration in dielectrics, even when the surface is neutralized by electron flooding. The effects appear due to a remaining charge imbalance on a microscopic scale, which is absent when bombarding with an uncharged beam.
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Beam saturation in the Munich atomic-beam-source

AIP Conference Proceedings, 1998
A Stern-Gerlach atomic beam ion source (ABS) with ECR ionizer and cesium gas-target as charge exchange units is under construction. The goal is to achieve intense negative beams of polarized H− and D− of high brightness for injection into the 14 MV MP tandem accelerator with beam intensity of about 2 μA on target. At the entrance of the ECR ionizer the
R. Hertenberger, Y. Eisermann, A. Hofmann, A. Metz, P. Schiemenz, S. Trieb, G. Graw   +6 more
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Studies on Beam Formation in an Atomic Beam Source

AIP Conference Proceedings, 2009
Atomic beam sources (ABS) are widely used workhorses producing polarized atomic beams for polarized gas targets and polarized ion sources. Although they have been used for decades the understanding of the beam formation processes is crude. Models were used more or less successfully to describe the measured intensity and beam parameters.
A. Nass, M. Stancari, E. Steffens, Donald G. Crabb, Yelena Prok, Matt Poelker, Simonetta Liuti, Donal B. Day, Xiaochao Zheng   +8 more
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Multiple beam and wide beam ion sources

Journal of Physics E: Scientific Instruments, 1972
Two modified forms of a new type of electrostatic ion source are described. The one produces multiple beams of positive ions and in the other a wide ion beam is produced. The sources can be used for ion etching either a large number of small specimens or a large area specimen.
R K Fitch, K R O'Shea, G J Rushton
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