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High performance 22/20nm FinFET CMOS devices with advanced high-K/metal gate scheme
International Electron Devices Meeting, 2010C. C. Wu +62 more
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FinFET With High- $\kappa $ Spacers for Improved Drive Current
IEEE Electron Device Letters, 2016A. Sachid, Min-Cheng Chen, C. Hu
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Fast Thermal Simulation of FinFET Circuits Based on a Multiblock Reduced-Order Model
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 2016Wangkun Jia, B. Helenbrook, M. Cheng
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