Results 301 to 310 of about 47,641 (356)

Cathodic arc deposition technology

Surface and Coatings Technology, 1986
Abstract Cathodic arc deposition is a unique technology. An arc spot on a cathode generates a plasma consisting of cathode material with a high degree of ionization. The high concentration of ions allows control of film morphology, high adhesion, efficient reactive deposition of compounds and uniform deposition over a variety of shapes.
Paul A. Lindfors, William M. Mularie, Gottfried K. Wehner   +2 more
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Cathodic-arc deposition with boron-alloyed titanium cathodes

Surface and Coatings Technology, 1999
Abstract Titanium cathodes containing low boron concentrations were recently found to be important for (1) the reduction of droplet emission and (2) the formation of a denser structure of reactively deposited Ti–B–N hard coatings. Based on these results, detailed studies on the cathode behaviour and the Ti–B–N coating properties were performed using ...
Martin Balzer, Herbert Kappl, Hermann A Jehn, Volker Güther   +3 more
openaire   +1 more source

Cathodically Deposited Birnessite as the Electrode Material

ECS Transactions, 2020
The data for birnessite deposited from alkaline permanganate solutions under two- and single step potentiostatic modes are reported. The analysis of capacity vs. scan rate dependences confirmed higher contribution of interfacial recharging to capacity of the compact nanoporous deposits as compared to more resistive ramified deposits with morphology ...
Leonid V. Pugolovkin, Eduard E. Levin, Natalya A Arkharova, Anton Orekhov, Denis E Presnov, Galina A. Tsirlina   +5 more
openaire   +1 more source

Cathodic deposition of paint

Electrochimica Acta, 1994
Abstract In the past 15 years, high transfer efficiency together with a high degree of automation and high environmental acceptability, combined with excellent film properties, have made cathodic electro-deposition (CED) of paint the most important priming method in car manufacturing.
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Plasma deposition of oxide cathodes

AIP Conference Proceedings, 1999
Vacuum arc deposition is employed to create a barium and/or strontium plasma which is subsequently deposited/implanted onto a nickel cathode substrate. The primary motivation for this work is the critical need for a reliable, repeatable, long-lived thermionic cathode for the production of high power, microsecond duration microwave pulses; such cathodes
R. Umstattd, T. Pi, N. Luhmann, G. Scheitrum, G. Caryotakis, G. Miram   +5 more
openaire   +1 more source

Hollow cathode etching and deposition

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1988
The hollow cathode has yielded high-rate low-pressure operation, with good etch selectivity and etched angle control. This paper shows that high SiO2 etch selectivity is most easily obtained at low pressure in the CF4/H2 process. The etched angle is controlled by metal film deposition which can be independent of the etch selectivity.
Chris M. Horwitz, S. Boronkay, M. Gross, K. Davies   +3 more
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Cathodic electrosynthesis of ceramic deposits

Journal of the European Ceramic Society, 1996
Abstract Cathodic electrosynthesis of TiO2, ZrO2 und ZrTiO4 deposits on platinum substrates was performed via hydrolysis of TiCl4 and ZrOCl2 salts dissolved in a mixed methanol-water solvent in presence of hydrogen peroxide by an electrogenerated base. The deposits were characterized by XRD, TG/DTA, SEM and EDS.
I. Zhitomirsky, L. Gal-Or
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ChemInform Abstract: CATHODIC DEPOSITION OF URANIUM

Chemischer Informationsdienst, 1978
AbstractDie Einflüsse verschiedener Faktoren wie die UO22+‐Konzentration, das Komplexierungsreagenz ( ;z.B. Fluorid, Tartrat oder Glycerin), pH, Stromdichte (20‐200 mA cm‐2) und der Zusatz von Additiven wie NH4Cl und NaCl auf die kathodische Abscheidung von U an einer Pt‐Elektrode werden zur Ermittlung der optimalen Abscheidungsbedingungen untersucht.
M. M. ELSEMONGY, Y. A. ELEWADY, M. M. GOUDA, A. ELASKLANY   +3 more
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Oxide cathodes produced by plasma deposition

IEEE Conference Record - Abstracts. 1997 IEEE International Conference on Plasma Science, 2002
Summary form only given. The best oxide cathodes have been capable of long life and high-current-density. The problem has been the ability to consistently reach maximum performance. The complex chemistry of the deposition and activation process have made consistent performance unrealizable.
G. Scheitrum, G. Caryotakis, T. Pi, R. Umstattd, I. Brown, O. Montiero   +5 more
openaire   +1 more source

Cathodic arc deposition of barium oxide for oxide-coated cathodes

25th Anniversary, IEEE Conference Record - Abstracts. 1998 IEEE International Conference on Plasma Science (Cat. No.98CH36221), 1998
Summary form only given. Cathodic arc deposition is used to create a barium oxide plasma which is then deposited/implanted onto a cathode nickel substrate. The primary motivation for this work is the critical need for a reliable, repeatable thermionic cathode for the production of high power, microsecond duration microwave pulses.
R. Umstattd, T. Pi, N. Luhmann, G. Scheitrum, O. Monteiro, L. Brown   +5 more
openaire   +1 more source