Research on the Application of Diamond Film in Chemical Mechanical Polishing. [PDF]
Wang Y +10 more
europepmc +1 more source
CMOS-Compatible Fabrication Module for Sub-100 nm TiN and TaN Pillar Electrodes for Carbon Nanotube Test Structures. [PDF]
Chen G, Fujii T, Yamada T, Hata K.
europepmc +1 more source
The Effects of Friction and Temperature in the Chemical-Mechanical Planarization Process. [PDF]
Ilie F +3 more
europepmc +1 more source
Polymer Nanoparticles Applied in the CMP (Chemical Mechanical Polishing) Process of Chip Wafers for Defect Improvement and Polishing Removal Rate Response. [PDF]
Chiu WL, Huang CI.
europepmc +1 more source
Fusion of Physical Mechanism and Data-Driven Methods for Online Thickness Measurement and Error Compensation in SiC CMP. [PDF]
Lin J +6 more
europepmc +1 more source
Tapered Cladding Design for Monolithic Waveguide-Photodetector Coupling in Si-Based Integrated Photonics. [PDF]
Gonzalez-Fernandez AA +3 more
europepmc +1 more source
Raised or recessed? Finding the optimal gate architecture for improving the static performance of graphene transistors. [PDF]
Huang TJ +4 more
europepmc +1 more source
A Comprehensive Review of the Nano-Abrasives Key Parameters Influencing the Performance in Chemical Mechanical Polishing. [PDF]
Bellahsene H +5 more
europepmc +1 more source
Controllable Synthesis of Monodisperse CeO<sub>2</sub> Nanoparticles with Tunable Sizes for Chemical-Mechanical Polishing. [PDF]
Ma Y +6 more
europepmc +1 more source
Post-Bonding Crack-Induced Di-Cantilever Bending (PBC-DCB): A Novel Method for Quantitative Evaluation of Bonding Strength for Wafer-to-Wafer and Die-to-Wafer Hybrid Bonding. [PDF]
Zheng T +10 more
europepmc +1 more source

