Results 181 to 190 of about 2,760 (214)
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Corrosion inhibitors for Cu chemical mechanical planarization (CMP)
2022Baimei Tan +6 more
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ECS Meeting Abstracts
As global efforts toward circular economies and sustainable manufacturing processes intensify, water conservation, remediation, and reuse have become increasingly critical. Chemical Mechanical Planarization (CMP) is a crucial process to ensure defect-free planarization of complex device architectures.
Angelina Sofia Martinez +2 more
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As global efforts toward circular economies and sustainable manufacturing processes intensify, water conservation, remediation, and reuse have become increasingly critical. Chemical Mechanical Planarization (CMP) is a crucial process to ensure defect-free planarization of complex device architectures.
Angelina Sofia Martinez +2 more
openaire +1 more source
Integrative oncology: Addressing the global challenges of cancer prevention and treatment
Ca-A Cancer Journal for Clinicians, 2022Jun J Mao,, Msce +2 more
exaly
ECS Meeting Abstracts
As semiconductor technologies continue to advance in areas such as autonomous driving, artificial intelligence, 5G communications, the Internet of Things, and large-scale data processing, the demand for a reliable semiconductor industry is on the rise.(1) This growing demand necessitates the use of advanced device architectures, which heavily rely ...
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As semiconductor technologies continue to advance in areas such as autonomous driving, artificial intelligence, 5G communications, the Internet of Things, and large-scale data processing, the demand for a reliable semiconductor industry is on the rise.(1) This growing demand necessitates the use of advanced device architectures, which heavily rely ...
openaire +1 more source
Towards Digital Twin Standards in Chemical Mechanical Planarization (CMP) for Advanced Packaging
ECS Meeting AbstractsA digital twin is an integrated multi-physics, multiscale, probabilistic simulation of a system that uses the best available physical models, sensor updates, process history, etc., to mimic and to predict the performance of the system. In the semiconductor industry, there is a need to establish such fundamental, mechanism-based, correlations between
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Microreplicated Conditioners for Cu Barrier Chemical-Mechanical Planarization (CMP)
ECS Journal of Solid State Science and Technology, 2015Wei-Tsu Tseng +9 more
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Multiscale modeling of chemical mechanical planarization (CMP)
2016W. Fan, D. Boning
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Ultra-low-k materials and chemical mechanical planarization (CMP)
2016J. Nalaskowski, S.S. Papa Rao
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Dishing Study on Chemical Mechanical Planarization (CMP)
2024 Conference of Science and Technology for Integrated Circuits (CSTIC)Huize DU +6 more
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