Results 201 to 210 of about 53,458 (260)
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2007
Chemical vapor deposition reactors provide a controlled environment for the reactants activation, proper distribution, and delivery; in addition, the environment on and around the substrates. Chemical vapor deposition Al integrated W/physical vapor deposition Al reflow for dynamic random access memory application also at the start of implementing into ...
Li-Qun Xia, Mei Chang
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Chemical vapor deposition reactors provide a controlled environment for the reactants activation, proper distribution, and delivery; in addition, the environment on and around the substrates. Chemical vapor deposition Al integrated W/physical vapor deposition Al reflow for dynamic random access memory application also at the start of implementing into ...
Li-Qun Xia, Mei Chang
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2020
The coating of various types of materials, i.e., metals, ceramics, polymers, and composites, with ceramic layers and films is one of the key technologies employed for prolonging the lifetime of infrastructural materials by protecting them from harsh environments. This process also enhances properties and adds multi-functionalities to materials. Thermal
Hirokazu Katsui, Takashi Goto
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The coating of various types of materials, i.e., metals, ceramics, polymers, and composites, with ceramic layers and films is one of the key technologies employed for prolonging the lifetime of infrastructural materials by protecting them from harsh environments. This process also enhances properties and adds multi-functionalities to materials. Thermal
Hirokazu Katsui, Takashi Goto
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Photocatalytic TiO2 deposition by chemical vapor deposition
Journal of Hazardous Materials, 2000Dip-coating, spray-coating or spin-coating methods for crystalline thin film deposition require post-annealing process at high temperature. Since chemical vapor deposition (CVD) process is capable of depositing high-quality thin films without post-annealing process for crystallization, CVD method was employed for the deposition of TiO(2) films on ...
D, Byun +4 more
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1989
Chemical vapor deposition (CVD) is one of the most important methods of film formation used in the fabrication of very large scale integrated (VLSI) silicon circuits, as well as of microelectronic solid state devices in general. In this process, chemicals in the gas or vapor phase are reacted at the surface of a substrate where they form a solid ...
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Chemical vapor deposition (CVD) is one of the most important methods of film formation used in the fabrication of very large scale integrated (VLSI) silicon circuits, as well as of microelectronic solid state devices in general. In this process, chemicals in the gas or vapor phase are reacted at the surface of a substrate where they form a solid ...
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Chemically vapor deposited Ti3SiC2
Materials Research Bulletin, 1987Monolithic Ti3SiC2 poly-crystalline plates 40 mm by 12 mm by 0.4 mm in size were prepared by chemical vapor deposition (CVD) using SiCl4, TiCl4, CCl4 and H2 as source gases at a deposition rate of 200 μm/h. The lattice parameters of the CVD-Ti3SiC2 were a = 3.064 A and c = 17.650 A.
T. Goto, T. Hirai
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Chemical vapor deposition membranes
2000This chapter is divided into four sections the first of which treats issues of general relevance to Chemical Vapor Deposition (CVD) of membranes, the second reviews work on dense silica membranes, the third is devoted to Y_2O_3-stabilized ZrO_2 (YSZ) membranes, and the fourth treats CVD of Pd membranes.
Tsapatsis, M. +2 more
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Chemical Vapor Deposition Techniques
MRS Bulletin, 1988Chemical vapor deposition (CVD) is one of the few deposition processes in which the deposited phase is produced in situ via chemical reaction(s). Thus the vapor source for CVD can consist of high vapor pressure species at moderate temperatures and yet deposit very high-melting phases.
T.M. Besmann, D.P. Stinton, R.A. Lowden
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Chemical Vapor Deposition; Epitaxy
1990The fabrication of semiconductor devices and integrated circuits requires the laying down of relatively thin layers or films of semiconductors, insulators, and metals. One method of accomplishing this is chemical vapor deposition (CVD), in which appropriate source materials in gas phase are furnished near the substrate.
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Chemical Vapor Deposited Diamond
1991Abstract : There is considerable interest in using diamond for numerous applications because of the development of methods that allow for the deposition of diamond by chemical vapor deposition (CVD) techniques over large areas. The interest in new applications for diamond rests on combinations of superior properties that diamond possesses.
Lawrence H. Robins +2 more
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