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Selective Chemical Vapor Deposition
2002Selective area deposition has received much attention in IC technology in the past forty years. Its advantage in IC technology is that one saves a mask and a full sequence of lithography, etching, resist removal and cleaning. In Selective Chemical Vapor Deposition (CVD) the selectivity is obtained by the different chemical behavior of reactants with ...
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Direct synthesis and chemical vapor deposition of 2D carbide and nitride MXenes
Science, 2023, Chenkun Zhou, Alexander S Filatov
exaly
Laser Chemical Vapor Deposition
1983Laser chemical vapor deposition (LCVD) is an adaptation of conventional CVD using a laser heat source. As shown in Fig. 1, the laser is focused through a transparent window and the transparent gaseous reactants onto an absorbing substrate, creating a localized hot spot at which the deposition reaction takes place.
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Global water use efficiency saturation due to increased vapor pressure deficit
Science, 2023Fei Li, Jingfeng Xiao, J Q Chen
exaly
Chemical vapor deposition apparatus and chemical vapor deposition
Metal Finishing, 2004openaire +1 more source